Dark-field microscopy imaging apparatus
An apparatus includes a main body, circuit assembly, lens, and clamping assembly. The main body includes an aperture that receives a wafer configured to receive a sample under study. The main body is configured to support the circuit assembly, which includes illumination sources that emit light of different colors such that total internal reflection is generated in the wafer. The main body is configured to provide support for the lens, and the clamping assembly mechanically coupled to the main body such that the lens is selectively positionable with respect to a camera lens. A microscopy imaging apparatus includes an illumination source, wafer, and charge-coupled device. The illumination source is configured to emit white light such that total internal reflection is generated in the wafer. The sample under study is disposed between the wafer and the charge coupled device, and the charge coupled device is configured to obtain an image of the sample under study upon illumination of the wafer by the illumination source.
1. A dark-field microscopy imaging apparatus comprising:
a main body, the main body comprising an aperture, the aperture configured to receive a wafer, the wafer configured to receive a sample under study;
a circuit assembly, the main body configured to support the circuit assembly, the circuit assembly comprising illumination sources that emit light of different colors such that a total internal reflection is generated in the wafer;
a lens, the main body configured to provide support for the lens; and
a clamping assembly, the clamping assembly mechanically coupled to the main body such that the lens is selectively positionable with respect to a camera lens;
wherein emitted light is configured to enter the wafer from at least one side thereof, and to propagate and homogenize throughout the wafer.
2. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the circuit assembly further comprises a processing device configured to control at least one of (a) illumination intensity associated with the illumination sources, (b) illumination timing associated with the illumination sources, (c) focusing the lens to enhance spectral resolution of the sample under study.
3. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the circuit assembly further comprises a blocking structure, the blocking structure directing illumination from the illumination sources, the blocking structure being at least one of (a) disposed on a side of the wafer opposing at least one of the illumination sources, (b) disposed between the at least one of the illumination sources and the side of the wafer, the blocking structure being at least one of (a) statically positionable, (b) manually positionable, (c) remotely positionable.
4. The dark-field microscopy imaging apparatus, as defined by claim 3 , wherein the blocking structure comprises at least one of a (a) baffling structure, (b) prism, (c) lens, (d) mirror, (e) light guide.
5. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the apparatus locates a feature of interest associated with the sample under study based on a spectral characteristic, areas of interest being defined based on the spectral characteristic within the areas of interest, the defined areas of interest being ranked based on the spectral characteristic, a center of a field-of-view associated with the camera lens being repositioned at a center of a defined area of interest having a highest ranking, a digital zoom associated with a smart device being adjusted to fill the field-of-view with the defined area of interest having the highest ranking.
6. The dark-field microscopy imaging apparatus, as defined by claim 5 , wherein the spectral characteristic comprises at least one of (a) object density, (b) size, (c) shape associated with a feature of interest.
7. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the clamping assembly comprises a slider assembly, the clamping assembly and slider assembly configured to enable selective positioning of the lens with respect to the camera lens in at least two dimensions.
8. The dark-field microscopy imaging apparatus, as defined by claim 7 , wherein the clamping assembly and slider assembly are configured to enable selective positioning of the lens with respect to the camera lens in a third dimension.
9. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the wafer comprises at least one slanted side forming an angle other than 90 degrees with respect to at least one of a (a) top of the wafer, (b) bottom of the wafer.
10. The dark-field microscopy imaging apparatus, as defined by claim 1 , wherein the camera lens is associated with at least one of a (a) smart device, (b) printed circuit board camera.
11. A method of dark-field microscopy imaging comprising:
receiving a wafer in an aperture of a main body, the wafer configured to receive a sample under study;
supporting a circuit assembly using the main body;
emitting light of different colors by illumination sources such that a total internal reflection is generated in the wafer;
supporting a lens using the main body; and
mechanically coupling a clamping assembly to the main body such that the lens is selectively positionable with respect to a camera lens,
wherein emitted light enters the wafer from at least one side thereof, and propagates and homogenizes throughout the wafer.
12. The method, as defined by claim 11 , further comprising controlling at least one of (a) illumination intensity associated with the illumination sources, (b) illumination timing associated with the illumination sources, (c) focusing the lens to enhance spectral resolution of the sample under study.
13. The method, as defined by claim 11 , further comprising directing illumination from the illumination sources using a blocking structure at least one of (a) disposed on a side of the wafer opposing at least one of the illumination sources, (b) disposed between the at least one of the illumination sources and the side of the wafer, the blocking structure being at least one of (a) statically positionable, (b) manually positionable, (c) remotely positionable.
14. The method, as defined by claim 13 , wherein the blocking structure comprises at least one of a (a) baffling structure, (b) prism, (c) lens, (d) mirror, (e) light guide.
15. The method, as defined by claim 11 , further comprising:
locating a feature of interest associated with the sample under study based on a spectral characteristic;
illuminating at least one of the illumination sources;
defining areas of interest based on the spectral characteristic within the areas of interest;
ranking the defined areas of interest based on the spectral characteristic;
repositioning a center of a field-of-view associated with the camera lens at a center of a defined area of interest having a highest ranking; and
adjusting a digital zoom associated with a smart device to fill the field-of-view with the defined area of interest having the highest ranking.
16. The method, as defined by claim 15 , wherein the spectral characteristic comprises at least one of (a) object density, (b) size, (c) shape associated with a feature of interest.
17. The method, as defined by claim 11 , further comprising selectively positioning the lens with respect to the camera lens in at least two dimensions using the clamping assembly and a slider assembly.
18. The method, as defined by claim 17 , further comprising selectively positioning the lens with respect to the camera lens in a third dimension using the clamping assembly and slider assembly.
19. The method, as defined by claim 11 , wherein the wafer comprises at least one slanted side forming an angle other than 90 degrees with respect to at least one of a (a) top of the wafer, (b) bottom of the wafer.
20. The method, as defined by claim 11 , wherein the camera lens is associated with at least one of a (a) smart device, (b) printed circuit board camera.