Granted Patent B2

US 12,733,725 · App. 17/772,986 · Granted Sep 15, 2026

Inventors: Alexander Shashou (New York, NY); Justin Effron (New York, NY); Gabe Greeley (Somerville, MA); Marcus R. Williams (Watertown, MA); Margaret Mathieu (Arlington, MA); Lucile Driscoll (Boston, MA); Lu Lyu (Medford, MA); Charles C. Shortlidge (Boston, MA); Peter Duerst (Cambridge, MA); Douglas Stewart (Quincy, MA); Chris Casey (Lexington, MA); Ndungu Muturi (Oakland, CA); Ryan Wood (Sausalito, CA); Zhi Teoh (Somerville, MA); Harald Quintus-Bosz (Newton, MA); Jesse Gray (Somerville, MA); Matt Berlin (Somerville, MA); Juhi Kalra (San Francisco, CA); Christine Noh (Cambridge, MA); Oliver Zhang (San Francisco, CA); Will Burke (San Francisco, CA); Chris Evans (Amherst, NH); Allison Tse (San Francisco, CA); Anthony Parker (New Ipswich, NH); Eric Maxwell (Charlestown, MA); Genevieve Laing (San Francisco, CA)

Assignee: 10Beauty, Inc.

A45D29/20A45D29/007A45D44/00B25J9/026B25J9/1697B25J11/00B25J15/0057B25J15/0061B25J15/0066B41J3/4073B41M1/40G06T7/70H04N1/409A45D29/06A45D29/14A45D29/22G06T2207/30196Y10S901/02Y10S901/14Y10S901/30

Abstract

Claims (30)

1 . A nail care system comprising:

one or more of a shaping system, a polish removal system and a cuticle system;

a nail polish application system;

a mobility system; and

a vision system comprising an image acquisition system, an illumination system, and a machine vision processing system comprising a computing device having at least one processor and non-transitory memory storing at least one program for execution by the at least one processor, the at least one program including instructions that cause the processor to:

determine a nail extent and a nail height profile based on analysis of pre-processed images, and

output operating instructions for the mobility system based on the determined nail extent and the determined nail height profile.

2 . The nail care system of claim 1 , wherein the shaping system is configured for one or more of rotary motion, linear reciprocating motion, and rotational oscillation, and wherein the shaping system comprises an abrasive element.

3 . The nail care system of claim 1 , wherein the polish removal system comprises a polish removal tool comprising one or more of a sponge, a semi-circular groove or a groove pattern on a surface thereof, and a brush or one or more bristles.

4 . The nail care system of claim 1 , wherein the cuticle system comprises a burnishing tool.

5 . The nail care system of claim 1 , wherein the at least one program further including instructions, which, when executed by the at least one processor cause the at least one processor to perform operations comprising: determining finger and nail placement based on analysis of the pre-processed images; outputting operating instructions for one or more of the shaping system, the polish removal system, the cuticle system, the vision system, the nail polish application system, and the mobility system based on the determined nail extent, the determined nail height profile, and the determined finger and nail placement.

6 . The nail care system of claim 1 , wherein the nail polish application system comprises a reservoir or vial in fluid communication with a nozzle.

7 . The nail care system of claim 6 , wherein the reservoir or vial includes a cap, wherein the cap is configured to remain stationary relative to the nozzle, and wherein the reservoir or vial is configured to be moved relative to the nozzle, and cause fluid in the reservoir or vial to flow out of the nozzle.

8 . The nail care system of claim 1 , wherein the mobility system is configured to move one or more of the shaping system, the polish removal system, the cuticle system, and the nail polish application system in at least three directions and rotationally about at least two axes.

9 . The nail care system of claim 1 , further comprising an accelerated drying system.

10 . The nail care system of claim 1 , further comprising a hand massage system.

11 . The nail care system of claim 1 , further comprising a nail identification, diagnosis and estimation of conditions system.

12 . The nail care system of claim 1 , further comprising: an enclosure system configured to enclose the mobility system, one or more of the shaping system, the polish removal system, the cuticle system, and the nail polish application system, and configured to permit movement of the same in at least three directions and rotationally about at least two axes.

13 . The nail care system of claim 1 , further comprising: a hand rest or foot rest system comprising one or more of fiducials, and at least one finger guide having bilateral symmetry.

14 . The nail care system of claim 1 , further comprising: a cartridge or pod system including one or more components of the nail polish application system, and the polish removal system.

15 . The nail care system of claim 1 , further comprising: a multi-tool system configured for movement by the mobility system and configured to engage with one or more of the cuticle system, the shaping system, the application system, and the removal system.

16 . A non-transitory computer-readable storage medium storing at least one program for nail care, the at least one program for execution by at least one processor and a non-transitory memory storing the at least one program, the at least one program including instructions, when, executed by the at least one processor cause the at least one processor to perform operations comprising:

coordinated operation of one or more of a shaping system, a polish removal system, a cuticle management system, a vision system, a nail polish application system, and a mobility system;

receiving image information from the vision system;

pre-processing the received images;

determining nail extent and a nail height profile based on analysis of the pre-processed images; and

determining finger and nail placement based on analysis of the pre-processed images; outputting operating instructions for one or more of the shaping system, the polish removal system, the cuticle management system, the vision system, the nail polish application system, and the mobility system based on the determined nail extent, the determined nail height profile, and the determined finger and nail placement.

17 . The non-transitory computer-readable storage medium of claim 16 , further comprising: a computer implemented tool movement method comprising: driving one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system to a starting point relative to the nail; driving a center of the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system to a lateral fold of the nail; moving the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system in any suitable direction relative to the nail; lifting the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system; and driving the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system to another point relative to the nail.

18 . The non-transitory computer-readable storage medium of claim 16 , further comprising: a computer implemented tool movement method comprising: driving the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system according to a predetermined pattern in order to place the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system in a predetermined position proximate to one or more anatomical features of the nail in order to perform an operation of the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system.

19 . The non-transitory computer-readable storage medium of claim 16 , further comprising a computer implemented path planning method for a single nail, a plurality of nails, and/or a full hand including the plurality of nails and for generating instructions for driving and operating the one or more of the shaping system, the polish removal system, the cuticle management system, and the nail polish application system.

Assignments (3)

Continuity (3)

References Cited (225)