IP Library › Granted Patent US 12,534,563
Granted Patent B2
US 12,534,563 · App. 17/784,097 · Granted Jan 27, 2026

Block copolymer, resin composition, stretch conductor, electronic device, and pressure-sensitive adhesive film

Inventors: Kazutoshi Oba (Tokyo, JP); Yukie Matsuda (Tokyo, JP); Yuki Mizuno (Tokyo, JP); Atsushi Nakazato (Tokyo, JP); Atsushi Goto (Singapore, SG)
Assignees: artience CO., LTD.; NANYANG TECHNOLOGICAL UNIVERSITY
C08F297/026C08F8/34C08F293/005C09J7/38H01B5/02
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Quick Facts
Patent No.
US 12,534,563
App. No.
17/784,097
Granted
Jan 27, 2026
Kind
B2
Abstract

A block copolymer consists mainly of structural units each derived from an ethylenically unsaturated monomer and has at least one mercapto group. The block copolymer has an Mn of 5,000-500,000 and has a block structure, which is an A-B-A triblock structure or a star-shaped block structure of [A-B]qX. The q is an integer of 2-6. The polymer block (A) has a glass transition temperature of 20° C. or higher. The polymer block (B) of the triblock structure has a glass transition temperature lower than 20° C., and the [polymer block (B)]qX of the star-shaped block structure has a glass transition temperature lower than 20° C. The X is an initiator residue or/and a coupling-agent residue or is a derivative thereof.

Claims (38)

1 . A block copolymer mainly composed of a structural unit derived from an ethylenically unsaturated monomer, which has at least one mercapto group, a number average molecular weight of 5,000 to 500,000, wherein the block copolymer contains an organic iodine-based living radical polymerization initiator residue and has any structure of the following General Formulae (2) to (4), and the polymerization unit in the General Formulae (2) to (4) is a block structure that is a triblock structure of polymer block (A)-polymer block (B)-polymer block (A) or a star-shaped block structure of [polymer block (A)-polymer block (B)] q X,

wherein q represents an integer of 2 or more and 6 or less,

the glass transition temperature of the polymer block (A) is 20° C. or higher,

the glass transition temperature of the polymer block (B) in the case of the triblock structure and the glass transition temperature of [polymer block (B)] q X in the case of the star-shaped block structure are lower than 20° C., and

X represents an initiator residue and/or a coupling agent residue, or its derivatives,

where the polymerization unit is a polymer unit mainly composed of a structural unit derived from an ethylenically unsaturated monomer independently for each branch from Y in the case of General Formula (4),

Z 1 each independently represents a divalent group selected from the group consisting of an ester group, a ketone group and an amide group, or a direct bond for each branch from Y,

Q represents a monovalent molecular terminal group, and the molecular terminal group is a functional group, a hydrocarbon group which may have a functional group, or an iodine group independently for each branch from Y,

Y represents a p-valent hydrocarbon group which may have a substituent,

p represents an integer of 2 to 6,

R 2 , R 5 and R 6 each independently represent a hydrogen atom or a monovalent hydrocarbon group which may have a substituent independently for each branch from Y in the case of General Formula (4),

R 3 and R 7 each independently represent a hydrogen atom, a monovalent hydrocarbon group which may have a substituent or —COR 8 independently for each branch from Y in the case of General Formula (4),

R 4 represents a monovalent hydrocarbon group which may have a substituent, —COR 8 , a cyano group or a nitro group,

R 2 and R 3 , R 3 and R 4 , R 2 and R 4 and R 6 and R 7 each independently may be bonded to each other to form a ring independently for each branch from Y in the case of General Formula (4),

R 8 each independently represents a hydrogen atom, a hydroxy group, an alkoxy group, an amino group or a monovalent hydrocarbon group which may have a substituent,

R 11 represents a divalent hydrocarbon group, which may have a substituent,

R 12 represents a divalent hydrocarbon group selected from the group consisting of an alkylene group, an arylene group and an alkylene oxide group or a direct bond, and

the hydrocarbon group may have a heterocycle, and each independently include at least one of a chain hydrocarbon group, an alicyclic hydrocarbon group and an aromatic hydrocarbon group.

2 . The block copolymer according to claim 1 ,

wherein at least some of the mercapto groups are introduced by a thiol-ene reaction between an alkenyl group of a precursor of the block copolymer and a compound represented by General Formula (1):

HS—R 1 —SH  General Formula (1)

where R 1 each independently represents a divalent organic group having at least one selected from among an alkylene group, an arylene group, a heterocyclic group and an alkylene oxide group, which may have a substituent.

3 . The block copolymer according to claim 1 , which is obtained by a living radical polymerization method.

4 . The block copolymer according to claim 1 , wherein the polymer block (A) has a mercapto group, and the polymer block (B) does not have a mercapto group.

5 . The block copolymer according to claim 1 , wherein the mercapto group is introduced into at least a part of the molecular terminal.

6 . The block copolymer according to claim 1 , wherein the polymer block (A) contains 50 mass % or more of a structural unit derived from a methacrylic acid ester, and the polymer block (B) contains 70 mass % or more of a structural unit derived from an acrylic acid ester.

7 . The block copolymer according to claim 1 , wherein the polymer block (A) contains 50 mass % or more of a structural unit derived from methyl methacrylate and the polymer block (B) contains 70 mass % or more of a structural unit derived from butyl acrylate.

8 . The block copolymer according to claim 1 , wherein 90 mass % or more of the ethylenically unsaturated monomer is a hydrophobic ethylenically unsaturated monomer.

9 . The block copolymer according to claim 1 , wherein the degree of polydispersity (Mw/Mn) is 2.5 or less.

10 . The block copolymer according to claim 1 , wherein the content of the polymer block (A) with respect to the polymer block (A) and the polymer block (B) of the block copolymer is in a range of 1 to 50 mass %.

11 . The block copolymer according to claim 1 , wherein the molar concentration of the mercapto group contained in 1 g of the block copolymer is in a range of 0.00001 to 1.0 mmol/g.

12 . A resin composition containing the block copolymer according to claim 1 .

13 . The resin composition according to claim 12 , wherein the content of iodine with respect to the block copolymer is in a range of 0.0001 to 10,000 ppm (by mass).

14 . The resin composition according to claim 12 , which contains a cross-linking agent that is able to crosslink with the block copolymer.

15 . The resin composition according to claim 12 , further containing at least one conductive material selected from the group consisting of conductive fine particles and conductive nanowires.

16 . A stretch conductor formed of the resin composition according to claim 15 .

17 . An electronic device having the stretch conductor according to claim 16 .

18 . A pressure-sensitive adhesive film having an adhesive layer formed of the resin composition according to claim 12 .

Assignments (2)
CHANGE OF NAME Recorded Feb 19, 2024
From: TOYO INK SC HOLDINGS CO., LTD.
To: ARTIENCE CO., LTD.
Reel/Frame 066625/0611 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 13, 2022
From: OBA, KAZUTOSHI; MATSUDA, YUKIE; MIZUNO, YUKI; NAKAZATO, ATSUSHI; GOTO, ATSUSHI
To: TOYO INK SC HOLDINGS CO., LTD.; NANYANG TECHNOLOGICAL UNIVERSITY
Reel/Frame 060187/0306 →
Priority Claims (2)
JP 2019-225478 · Dec 13, 2019 · national
JP 2020-060765 · Mar 30, 2020 · national
Continuity (1)
Related Publication 20230050336A1 · Feb 16, 2023
References Cited (19)
US 20170169914A1 · Sekitani et al. · 2017 [cited by applicant]
US 20180230287A1 · Shiozawa · 2018 [cited by applicant]
US 20190194368A1 · Fujii et al. · 2019 [cited by applicant]
CN 1615350A · 2005 [cited by examiner]
EP 2924695 · 2015 [cited by applicant]
JP 2003147312 · 2003 [cited by applicant]
JP 2017019974 · 2017 [cited by applicant]
JP 2019112591 · 2019 [cited by applicant]
WO WO9211332A1 · 1992 [cited by examiner]
WO 2014080470 · 2014 [cited by applicant]
WO 2015119217 · 2015 [cited by applicant]
WO 2016067406 · 2016 [cited by applicant]
WO 2017026420 · 2017 [cited by applicant]
WO 2018055890 · 2018 [cited by applicant]
“Notice of Reasons for Refusal of Japan Counterpart Application”, issued on Mar. 12, 2024, with English translation thereof, p. 1-p. 6. [cited by applicant]
“International Search Report (Form PCT/ISA/210) of PCT/JP2020/045680,” mailed on Feb. 2, 2021, with English translation thereof, pp. 1-4. [cited by applicant]
“Office Action of Japan Counterpart Application”, issued on Aug. 4, 2020, with English translation thereof, p. 1-p. 8. [cited by applicant]
“Request for the Submission of an Opinion of Korea Counterpart Application”, with English translation thereof, issued on Aug. 15, 2024, pp. 1-15. [cited by applicant]
“Notice of Reasons for Refusal of Japan Counterpart Application”, with English translation thereof, issued on Sep. 17, 2024, pp. 1-5. [cited by applicant]