Display substrate and manufacturing method therefor, and display apparatus
Display substrate, manufacturing method therefor and display apparatus are provided. The display substrate includes a display area, the display area including a pixel region, a light transmissive region, and an isolation region between the pixel region and the light transmissive region and at least partially surrounding the light transmissive region; the isolation region includes an isolation component, a barrier wall structure, and a groove structure located therebetween; the pixel region includes a light-emitting functional layer and an organic encapsulation layer; a portion of the light-emitting functional layer extending to the isolation region is disconnected at a side face of the isolation component; and the organic encapsulation layer extends from the pixel region to the isolation region, and the groove structure and the barrier wall structure is configured for limiting an extension of the organic encapsulation layer to the light transmissive region.
1. A display substrate, comprising a display area, the display area comprising a pixel region, a light transmissive region, and an isolation region located between the pixel region and the light transmissive region, the isolation region at least partially surrounding the light transmissive region;
wherein the isolation region comprises an isolation component, a barrier wall structure, and a groove structure located between the isolation component and the barrier wall structure;
the pixel region comprises a light-emitting functional layer and an organic encapsulation layer; a portion of the light-emitting functional layer extending to the isolation region is disconnected at a side face of the isolation component; and the organic encapsulation layer extends from the pixel region to the isolation region, and the groove structure and the barrier wall structure are configured for limiting an extension of the organic encapsulation layer towards the light transmissive region;
wherein the isolation region is provided with a first gate insulating layer, a second gate insulating layer and an interlayer insulating layer which are sequentially arranged in a direction away from a base of the display substrate, and the interlayer insulating layer is located between the isolation component and the base of the display substrate;
wherein the isolation component comprises at least two inner isolation components, the at least two inner isolation components are arranged at an interval in a direction from the pixel region towards the light transmissive region, and the at least two inner isolation components are located between the pixel region and the barrier wall structure; a channel is arranged between two adjacent inner isolation components, and the channel penetrates the interlayer insulating layer; and
the groove structure comprises a first groove structure located between the at least two inner isolation components and the barrier wall structure, the first groove structure penetrates the interlayer insulating layer, and the organic encapsulation layer is filled in the first groove structure.
2. The display substrate according to claim 1 , wherein the isolation component includes at least two outer isolation components, the at least two outer isolation components are arranged at an interval in a direction from the pixel region towards the light transmissive region, and the at least two outer isolation components are located between the light transmissive region and the barrier wall structure; and
the groove structure includes a second groove structure located between the at least two outer isolation components and the barrier wall structure.
3. The display substrate according to claim 2 , wherein a side face of an inner isolation component included in the isolation component has a recess.
4. The display substrate according to claim 2 , wherein the interlayer insulating layer is provided with a second channel, and an orthographic projection of the second channel onto the base is located between orthographic projections of two adjacent outer isolation components onto the base.
5. The display substrate according to claim 2 , wherein a side face of the outer isolation component has a recess.
6. The display substrate according to claim 1 , wherein the barrier wall structure comprises a first barrier wall component and a second barrier wall component arranged sequentially along a direction from the pixel region towards the light transmissive region, a height of a surface of the first barrier wall component facing away from a base of the display substrate is lower than a height of a surface of the second barrier wall component facing away from the base.
7. The display substrate according to claim 6 , wherein the pixel region is provided with a planarization layer, a pixel definition layer and a spacer layer which are sequentially arranged in a stack in a direction away from the base;
the first barrier wall component comprises a first barrier wall pattern and a second barrier wall pattern which are sequentially arranged in a stack in the direction away from the base, the first barrier wall pattern is arranged in the same layer and made of the same material as the pixel definition layer, and the second barrier wall pattern is arranged in the same layer and made of the same material as the spacer layer; and
the second barrier wall component comprises a third barrier wall pattern, a fourth barrier wall pattern and a fifth barrier wall pattern which are sequentially arranged in a stack in the direction away from the base, the third barrier wall pattern is arranged in the same layer and made of the same material as the planarization layer, the fourth barrier wall pattern is arranged in the same layer and made of the same material as the pixel definition layer, and the fifth barrier wall pattern is arranged in the same layer and made of the same material as the spacer layer.
8. The display substrate according to claim 1 , wherein the pixel region is provided with a planarization layer, a pixel definition layer and a spacer layer which are sequentially arranged in a stack in a direction away from a base of the display substrate; and
the barrier wall structure comprises a second barrier wall component, the second barrier wall component comprises a third barrier wall pattern, a fourth barrier wall pattern and a fifth barrier wall pattern which are sequentially arranged in a stack in the direction away from the base, the third barrier wall pattern is arranged in the same layer and made of the same material as the planarization layer, the fourth barrier wall pattern is arranged in the same layer and made of the same material as the pixel definition layer, and the fifth barrier wall pattern is arranged in the same layer and made of the same material as the spacer layer.
9. The display substrate according to claim 1 , wherein the groove structure encloses the light transmissive region.
10. The display substrate according to claim 1 , wherein in a direction perpendicular to a base of the display substrate, a ratio of a depth of the groove structure to a height of the isolation component is in a range between 0.5 and 1.
11. A display device, comprising the display substrate according to claim 1 .
12. A method for manufacturing a display substrate, the display substrate comprising a display area, the display area comprising a pixel region, a light transmissive region, and an isolation region located between the pixel region and the light transmissive region, the isolation region at least partially surrounding the light transmissive region; the method comprising:
fabricating, in the isolation region, an isolation component, a barrier wall structure, and a groove structure which is located between the isolation component and the barrier wall structure;
fabricating a light-emitting functional layer and an organic encapsulation layer in the pixel region; wherein a portion of the light-emitting functional layer extending to the isolation region is disconnected at a side face of the isolation component; the organic encapsulation layer extends from the pixel region to the isolation region, and the groove structure and the barrier wall structure are configured for limiting an extension of the organic encapsulation layer towards the light transmissive region;
wherein the isolation region is provided with a first gate insulating layer, a second gate insulating layer and an interlayer insulating layer which are sequentially arranged in a direction away from a base of the display substrate, and the interlayer insulating layer is located between the isolation component and the base of the display substrate;
wherein the isolation component comprises at least two inner isolation components, the at least two inner isolation components are arranged at an interval in a direction from the pixel region towards the light transmissive region, and the at least two inner isolation components are located between the pixel region and the barrier wall structure; a channel is arranged between two adjacent inner isolation components, and the channel penetrates the interlayer insulating layer;
the groove structure comprises a first groove structure located between the at least two inner isolation components and the barrier wall structure, the first groove structure penetrates the interlayer insulating layer, and the organic encapsulation layer is filled in the first groove structure.
13. The method according to claim 12 , wherein the pixel region is provided with a planarization layer, a pixel definition layer and a spacer layer which are sequentially arranged in a stack in a direction away from a base of the display substrate; the barrier wall structure comprises a second barrier wall component, and the second barrier wall component comprises a third barrier wall pattern, a fourth barrier wall pattern and a fifth barrier wall pattern which are sequentially arranged in a stack in the direction away from the base; and the method comprises a step of fabricating the second barrier wall component, comprising:
forming, in a single patterning process, the third barrier wall pattern and the planarization layer simultaneously;
forming, in a single patterning process, the fourth barrier wall pattern and the pixel definition layer simultaneously; and
forming, in a single patterning process, the fifth barrier wall pattern and the spacer layer simultaneously.