Sensor systems and methods of measuring infrastructure displacement
View Patent ↗Interstory drift measurement systems and methods of using the same can include a laser beam source configured to emit a beam having at least a first width in a first direction and a sensor system comprising a plurality of diodes spaced apart from one another in the first direction. The plurality of diodes can include a first diode and a diode spacing width in the first direction as measured between a centerline of the first diode and a centerline of an adjacent diode of the plurality of diodes in the first direction. The beam width in the first direction is at least two times the diode spacing width.
1. An interstory drift measurement system comprising:
a laser beam source configured to emit a beam having a first beam width in a first direction and a second beam width in a second direction, the second direction being perpendicular to the first direction; and
a sensor system configured to obtain a drift measurement in the first direction, the sensor system comprising a plurality of diodes arranged in at least two rows with at least four diodes in each of the at least two rows,
wherein the diodes in each row are spaced apart from one another in the first direction, the plurality of diodes including a first diode and having a diode spacing width in the first direction as measured between a centerline of the first diode and a centerline of an adjacent diode of the plurality of diodes in the first direction, and
wherein the first beam width is at least two times the diode spacing width.
2. The interstory drift measurement system of claim 1 , wherein the first beam width is two to fifteen times greater than the diode spacing width.
3. The interstory drift measurement system of claim 1 , wherein the first beam width is two to ten times greater than the diode spacing width.
4. The interstory drift measurement system of claim 1 , wherein the first beam width is three to eight times greater than the diode spacing width.
5. The interstory drift measurement system of claim 1 , wherein the laser beam source is secured to a first surface of a first floor of a building and the sensor system is secured to a facing surface of a second floor of the building,
wherein the laser beam source and sensor system are positioned so that the beam impinges on at least some of the plurality of diodes of the sensor system.
6. The interstory drift measurement system of claim 5 , wherein the first floor is above the second floor.
7. The interstory drift measurement system of claim 1 , further comprising a processor configured to:
receive a plurality of measured electrical responses from the plurality of diodes, the plurality of measured electrical responses being provided when the beam impinges on respective ones of the plurality of diodes; and
calculate a centroid of the beam based on the measured electrical responses from the plurality of diodes.
8. The interstory drift measurement system of claim 7 , wherein the measured electrical responses received by the processor are voltages.
9. The interstory drift measurement system of claim 7 , wherein the measured electrical responses received by the processor are induced currents.
10. The interstory drift measurement system of claim 1 , wherein the at least two rows of diodes comprise four to twenty rows of diodes.
11. The interstory drift measurement system of claim 1 , wherein the at least two rows of diodes comprise six to fifteen rows of diodes.
12. The interstory drift measurement system of claim 1 , wherein the at least two rows of diodes comprise six to ten rows of diodes.
13. The interstory drift measurement system of claim 1 , wherein at least some of the diodes in the at least two rows are in a staggered arrangement.
14. The interstory drift measurement system of claim 1 , wherein the laser beam source is configured to measure biaxial displacement,
wherein the plurality of diodes include diodes spaced apart from one another in the second direction to obtain a second drift measurement in the second direction, the plurality of diodes including a second diode and having a diode spacing width in the second direction as measured between a centerline of the second diode and a centerline of an adjacent diode in the second direction of the plurality of diodes, and
wherein the second beam width is at least two times the diode spacing width in the second direction.
15. The interstory drift measurement system of claim 14 , wherein the second beam width is two to fifteen times greater than the diode spacing width in the second direction.
16. The interstory drift measurement system of claim 14 , wherein the second beam width is two to ten times greater than the diode spacing width in the second direction.
17. The interstory drift measurement system of claim 14 , wherein the second beam width is three to eight times greater than the diode spacing width in the second direction.
18. The interstory drift measurement system of claim 1 wherein the sensor system further comprises a sensor cover with a plurality of openings, wherein the plurality of diodes are aligned with respective ones of the plurality of openings and recessed relative to the sensor cover.
19. The interstory drift measurement system of claim 1 , further comprising a wireless communication device operatively coupled to the sensor system to receive measurement information and transmit it to a remote location.
20. The interstory drift measurement system of claim 1 , further comprising a control system configured to identify an occurrence of a predetermined event trigger and instruct a collection of data from the sensor system when the occurrence is identified,
wherein the control system is configured to automatically generate and send event information based on the collected data to one or more predetermined remote locations; and
wherein the control system is configured to deliver one or more sensor status messages upon request and/or at predetermined intervals, the one or more sensor status messages including information about an operational status and health of the sensor system.
21. The interstory drift measurement system of claim 1 , wherein the at least two rows have a row spacing that is defined by a distance between a first row of the at least two rows and a last row of the at least two rows, and wherein the second beam width is greater than the row spacing.