Resist composition and method for producing resist pattern
A resist composition includes (A1) a resin including a structural unit represented by formula (I) and a structural unit represented by formula (II), and no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: wherein R 1 and R 2 each represent a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom, X 1 and X 2 each represent a single bond or *—CO—O—, L 1 represents a single bond or a hydrocarbon group which may have a substituent, and —CH 2 — included in the group may be replaced by —O—, —S—, —SO 2 — or —CO—, ring W represents a hydrocarbon ring which may have a substituent, mi and mk represent an integer of 1 to 4, and L 2 represents a single bond or a hydrocarbon group which may have a substituent, and —CH 2 — included in the group may be replaced by —O—, —S—, —SO 2 — or —CO—.
1 . A resist composition comprising:
(A1) a resin which includes a structural unit represented by formula (I) and a structural unit represented by formula (II), and also has no acid-labile group,
(A2) a resin having an acid-labile group, and,
an acid generator:
wherein, in formula (I),
R 1 represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom,
X 1 represents a single bond or *—CO—O—, and * represents a bonding site to carbon atoms to which R 1 is bonded,
L 1 represents a single bond, or a hydrocarbon group having 1 to 28 carbon atoms which may have a substituent, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —S—, —SO 2 — or —CO—,
ring W represents a hydrocarbon ring having 3 to 18 carbon atoms which may have a substituent, and
mi represents an integer of 1 to 4, and
wherein, in formula (II),
R 2 represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom,
X 2 represents a single bond or *—CO—O—, and * represents a bonding site to carbon atoms to which R 2 is bonded,
L 2 represents a single bond, or a hydrocarbon group having 1 to 28 carbon atoms which may have a substituent other than a fluorine atom and an alkyl fluoride group, and —CH 2 — included in the hydrocarbon group may be replaced by —O—, —S—, —SO 2 — or —CO—, and
mk represents an integer of 1 to 4.
2 . The resist composition according to claim 1 , wherein the ring W is a ring represented by any one of formula (w1-1) to formula (w1-3), formula (w1-6), formula (w1-15), formula (w1-22) and formula (w1-23):
wherein, in formula (w1-1) to formula (w1-3), formula (w1-6), formula (w1-15), formula (w1-22) and formula (w1-23),
the ring may have a substituent, and the bonding site is any position.
3 . The resist composition according to claim 1 , wherein L 1 is a single bond, a chain hydrocarbon group having 1 to 6 carbon atoms which may have a substituent wherein —CH 2 — included in the chain hydrocarbon group may be replaced by —O— or —CO—, or a group obtained by combining a chain hydrocarbon group having 1 to 4 carbon atoms which may have a substituent with a cyclic hydrocarbon group having 3 to 18 carbon atoms which may have a substituent wherein —CH 2 — included in the chain hydrocarbon group may be replaced by —O— or —CO—, and —CH 2 — included in the cyclic hydrocarbon group may be replaced by —O— or —CO—.
4 . The resist composition according to claim 1 , wherein L 2 is a chain hydrocarbon group having 1 to 9 carbon atoms which may have a substituent wherein —CH 2 — included in the chain hydrocarbon group may be replaced by —O— or —CO— or a cyclic hydrocarbon group having 3 to 16 carbon atoms which may have a substituent wherein —CH 2 — included in the cyclic hydrocarbon group may be replaced by —O— or —CO—.
5 . The resist composition according to claim 1 , wherein the resin having an acid-labile group includes at least one selected from the group consisting of a structural unit represented by formula (a1-0), a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):
wherein, in formula (a1-0), formula (a1-1) and formula (a1-2),
L a01 , L a1 and L a2 each independently represent —O— or *—O—(CH 2 ) k1 —CO—O—, k1 represents an integer of 1 to 7, and * represents a bonding site to —CO—,
R a01 , R a4 and R a5 each independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom,
R a02 , R a03 and R a04 each independently represent an alkyl group having 1 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a group obtained by combining these groups,
R a6 and R a7 each independently represent an alkyl group having 1 to 8 carbon atoms, an alkenyl group having 2 to 8 carbon atoms, an alicyclic hydrocarbon group having 3 to 18 carbon atoms, an aromatic hydrocarbon group having 6 to 18 carbon atoms, or a group formed by combining these groups,
m1 represents an integer of 0 to 14,
n1 represents an integer of 0 to 10, and
n1′ represents an integer of 0 to 3.
6 . The resist composition according to claim 1 , wherein the resin having an acid-labile group includes a structural unit represented by formula (a2-A):
wherein, in formula (a2-A),
R a50 represents a hydrogen atom, a halogen atom, or an alkyl group having 1 to 6 carbon atoms which may have a halogen atom,
R a51 represents a halogen atom, a hydroxy group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkoxyalkyl group having 2 to 12 carbon atoms, an alkoxyalkoxy group having 2 to 12 carbon atoms, an alkylcarbonyl group having 2 to 4 carbon atoms, an alkylcarbonyloxy group having 2 to 4 carbon atoms, an acryloyloxy group or a methacryloyloxy group,
A a50 represents a single bond or *—X a51 -(A a52 -X a52 ) nb —, and * represents a bonding site to carbon atoms to which —R a50 is bonded,
A a52 represents an alkanediyl group having 1 to 6 carbon atoms,
X a51 and X a52 each independently represent —O—, —CO—O— or —O—CO—,
nb represents 0 or 1, and
mb represents an integer of 0 to 4, and when mb is an integer of 2 or more, a plurality of R a51 may be the same or different from each other.
7 . The resist composition according to claim 1 , wherein the acid generator comprises a salt represented by formula (B1):
wherein, in formula (B1),
Q b1 and Q b2 each independently represent a hydrogen atom, a fluorine atom, an alkyl group having 1 to 6 carbon atoms, or a perfluoroalkyl group having 1 to 6 carbon atoms,
L b1 represents a divalent saturated hydrocarbon group having 1 to 24 carbon atoms, —CH 2 — included in the divalent saturated hydrocarbon group may be replaced by —O— or —CO—, and a hydrogen atom included in the divalent saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group,
Y represents a methyl group which may have a substituent, or an alicyclic hydrocarbon group having 3 to 24 carbon atoms which may have a substituent, and —CH 2 — included in the alicyclic hydrocarbon group may be replaced by —O—, —S—, —SO 2 — or —CO—, and
Z1 + represents an organic cation.
8 . The resist composition according to claim 1 , further comprising a salt generating an acid having an acidity lower than that of an acid generated from the acid generator.
9 . A method for producing a resist pattern, which comprises:
(1) a step of applying the resist composition according to any one of claims 1 to 8 on a substrate,
(2) a step of drying the applied resist composition to form a composition layer,
(3) a step of exposing the composition layer,
(4) a step of heating the exposed composition layer, and
(5) a step of developing the heated composition layer.