IP Library Granted Patent US 12,037,307
Granted Patent B2
US 12,037,307 · App. 17/824,393 · Granted Jul 16, 2024

High purity 2-naphthylacetonitrile and method for producing same

Inventors: Masaki Nagahama (Chiyoda-ku, JP); Daiki Okado (Chiyoda-ku, JP); Hirotsugu Taniike (Chiyoda-ku, JP)
Assignee: API CORPORATION
C07C253/22C07C255/33
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Quick Facts
Patent No.
US 12,037,307
App. No.
17/824,393
Granted
Jul 16, 2024
Kind
B2
Abstract

The present invention provides high purity 2-naphthylacetonitrile with fewer impurities that is useful as a starting material or intermediate for the synthesis of various pharmaceutical products, agricultural chemicals, and chemical products, and a production method thereof. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, and containing naphthalene compounds represented by the formulas (a)-(j) at a content of a predetermined area % or below. A method for producing high purity 2-naphthylacetonitrile, including the following step 1 and step 2: step 1: a step of subjecting 2′-acetonaphthone to a Willgerodt reaction in the presence of an additive where necessary, and hydrolyzing the obtained amide compound to give 2-naphthylacetic acid; step 2: a step of reacting the 2-naphthylacetic acid obtained in step 1, a halogenating agent and sulfamide in the presence of a catalyst as necessary in an organic solvent to give 2-naphthylacetonitrile.

Claims (29)

1. A high purity 2-naphthylacetonitrile having an HPLC purity of 2-naphthylacetonitrile of not less than 95 area %, comprising one or more kinds selected from the naphthalene compounds represented by the following formulas (a)-(i) as impurities in an amount greater than zero and a content of each naphthalene compound is as follows:

(a)

 not more than 0.3 area %

(b)

 not more than 0.1 area %

(c)

 not more than 1 area %

(d)

 not more than 0.1 area %

(e)

 not more than 0.05 area %

(f)

 not more than 0.05 area %

(g)

 not more than 0.1 area %

(h)

 not more than 0.05 area %

(i)

 not more than 0.05 area %.

2. The high purity 2-naphthylacetonitrile according to claim 1 , comprising one or more kinds selected from the naphthalene compounds represented by the following formulas (a)-(d) as impurities, wherein the content of each naphthalene compound is as follows:

(a)

 not more than 0.3 area %

(b)

 not more than 0.1 area %

(c)

 not more than 1 area %

(d)

 not more than 0.1 area %.

3. The high purity 2-naphthylacetonitrile according to claim 1 , comprising the naphthalene compound represented by the following formula (c) as impurity, wherein the content of the naphthalene compound represented by the following formula (c) is not more than 1 area %:

Assignments (2)
MERGER Recorded Sep 23, 2025
From: API CORPORATION
To: UBE CORPORATION
Reel/Frame 072344/0161 →
ADDRESS CHANGE Recorded Apr 13, 2023
From: API CORPORATION
To: API CORPORATION
Reel/Frame 063325/0621 →
Priority Claims (1)
JP 2019-196782 · Oct 29, 2019 · national
Continuity (2)
Continuation 17295222
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