Transistor gate structures and methods of forming thereof
View Patent ↗A device includes a semiconductor substrate; a vertically stacked set of nanostructures over the semiconductor substrate; a first source/drain region; and a second source/drain region, wherein the vertically stacked set of nanostructures extends between the first source/drain region and the second source/drain region along a first cross-section. The device further includes a gate structure encasing the vertically stacked set of nanostructures along a second cross-section. The second cross-section is along a longitudinal axis of the gate structure. The gate structure comprises: a gate dielectric encasing each of the vertically stacked set of nanostructures; a first metal carbide layer over the gate dielectric; and a gate fill material over the first metal carbide layer. The first metal carbide layer comprises Ce, Hf, V, Nb, Sc, Y, or Mo.
1. A device comprising:
a semiconductor substrate;
a vertically stacked set of nanostructures over the semiconductor substrate;
a first source/drain region;
a second source/drain region, wherein the vertically stacked set of nanostructures extends between the first source/drain region and the second source/drain region along a first cross-section;
a gate structure encasing the vertically stacked set of nanostructures along a second cross-section, wherein the second cross-section is along a longitudinal axis of the gate structure, and wherein the gate structure comprises:
a gate dielectric encasing each of the vertically stacked set of nanostructures;
a first metal carbide layer over the gate dielectric, wherein the first metal carbide layer comprises Ce, Hf, V, Nb, Sc, Y, or Mo;
a second metal carbide layer between the first metal carbide layer and the gate dielectric, wherein the second metal carbide layer comprises a different metal element than the first metal carbide layer; and
a gate fill material over the first metal carbide layer.
2. The device of claim 1 further comprising a first metal nitride layer between the first metal carbide layer and the gate dielectric.
3. The device of claim 2 , wherein the first metal nitride layer comprises titanium nitride.
4. The device of claim 2 further comprising a second metal nitride layer over the first metal carbide layer.
5. The device of claim 1 , wherein the second metal carbide layer comprises titanium carbide or tantalum carbide.
6. The device of claim 1 further comprising:
a third metal nitride layer over the first metal carbide layer; and
a third metal carbide layer over the third metal nitride layer, wherein the gate fill material is disposed over the first metal carbide layer.
7. The device of claim 6 , wherein the third metal carbide layer comprises Ti, Ta, Ce, Hf, V, Nb, Sc, Y, or Mo.
8. A semiconductor device comprising:
a plurality of channel regions;
a first source/drain region comprising a first semiconductor material layer and a second semiconductor material over the first semiconductor material layer, wherein a surface of the first semiconductor material layer is curved;
a second source/drain region, wherein the plurality of channel regions extends between the first source/drain region and the second source/drain region;
a gate structure surrounding each of the plurality of channel regions, wherein the gate structure comprises:
a gate dielectric;
a first metal nitride layer over the gate dielectric;
a first metal carbide layer over the first metal nitride layer, wherein a metal element of the first metal carbide layer is Ce, Hf, V, Nb, Sc, Y, or Mo;
a second metal carbide layer between the first metal carbide layer and the first metal nitride layer, wherein the metal element of the first metal carbide layer is different than a metal element of the second metal carbide layer; and
a gate fill material over the first metal carbide layer.
9. The semiconductor device of claim 8 further comprising a second metal nitride layer over the first metal carbide layer.
10. The semiconductor device of claim 8 , wherein the first metal nitride layer has a thickness in a range of 5 Å to 15 Å.
11. The semiconductor device of claim 8 , wherein the gate dielectric, the first metal nitride layer, and the first metal carbide layer completely fill a first region, the first region spanning from a first channel region of the plurality of channel regions to a second channel region of the plurality of channel regions.
12. The semiconductor device of claim 8 , wherein the gate dielectric comprises:
an interfacial layer; and
a high-k dielectric over the interfacial layer.
13. A method of manufacturing a semiconductor device, the method comprising:
depositing a high-k gate dielectric layer over and along sidewalls of a semiconductor fin;
depositing a first work function metal over the high-k gate dielectric layer, wherein depositing the first work function metal comprises flowing a first carbon-comprising precursor and a first metal-comprising precursor, wherein the first metal-comprising precursor comprises Ce, Hf, V, Nb, Sc, Y, or Mo;
depositing a second work function metal over the high-k gate dielectric layer prior to depositing the first work function metal, wherein depositing the second work function metal comprises flowing a second carbon-comprising precursor and a second metal-comprising precursor, the second metal-comprising precursor comprising a different metal element than the first metal-comprising precursor; and
depositing fill metal over the first work function metal.
14. The method according to claim 13 , wherein the second metal-comprising precursor comprises titanium or tantalum.
15. The method according to claim 13 further comprising depositing a third work function metal over the high-k gate dielectric layer prior to depositing the first work function metal, wherein depositing the third work function metal comprises flowing a nitrogen-comprising precursor and a third metal-comprising precursor.
16. The method according to claim 15 , wherein the third metal-comprising precursor comprises titanium.
17. The method according to claim 13 , wherein the first metal-comprising precursor comprises TaCl 5 , CeC l4 , HfC l4 , VC l3 , NbC l5 , ScC l4 , YCl x , or MoCl x .
18. The method according to claim 13 further comprising depositing a fourth work function metal over the first work function metal, wherein depositing the fourth work function metal comprises flowing a nitrogen-comprising precursor and a fourth metal-comprising precursor.
19. The semiconductor device of claim 8 , wherein the first metal nitride layer has a thickness in a range of 5 Å to 15 Å.
20. The semiconductor device of claim 8 , wherein the first metal nitride layer comprises the metal element of the second metal carbide layer.