IP Library Granted Patent US 12,595,582
Granted Patent B2
US 12,595,582 · App. 17/853,047 · Granted Apr 7, 2026

Anode plate for film plating machine and film plating machine

Inventors: Xichong Zhang (Xiamen, CN); Yuyuan Wu (Xiamen, CN); Qian Zhao (Xiamen, CN); Qin Zhang (Xiamen, CN); Jinhua Lan (Xiamen, CN)
Assignee: HITHIUM TECH HK LIMITED
C25D17/12C25D17/28H01M4/0452H01M10/0525
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Quick Facts
Patent No.
US 12,595,582
App. No.
17/853,047
Granted
Apr 7, 2026
Kind
B2
Abstract

An anode plate for a film plating machine and a film plating machine are provided. The anode plate is formed by splicing a plurality of anode plate splicing units, and two adjacent anode plate splicing units are separated by an insulating medium. Each anode plate splicing unit is connected with a power supply. The anode plate is applicable to film plating machines of different breadth.

Claims (26)

1 . An anode plate for a film plating machine, wherein the anode plate is formed by splicing a plurality of anode plate splicing units, any two adjacent anode plate splicing units of the plurality of anode plate splicing units are separated by an insulating medium, and each of the plurality of anode plate splicing units is configured to be connected with a power supply, wherein

each of the plurality of anode plate splicing units is connected with one conductive metal strip, the conductive metal strip extends along a direction perpendicular to the anode plate, and the conductive metal strip is configured to be connected with the power supply;

a conductive metal frame is attached to the surface of each of the plurality of anode plate splicing units, and the conductive metal frame is electrically connected to the conductive metal strip;

the conductive metal frame is a cross-shaped metal frame, the cross-shaped metal frame comprises a first metal strip and a second metal strip which are cross-fixed, and both the first metal strip and the second metal strip are attached to the surface of each of the plurality of anode plate splicing units, wherein the first metal strip is located on a connection line between a midpoint of an upper line and a midpoint of a lower line of each of the plurality of anode plate splicing units, and the second metal strip is located on a connection line between midpoints of non-parallel sides of each of the plurality of anode plate splicing units, wherein

the plurality of anode plate splicing units are a plurality of trapezoidal plates, a middle part of the upper line and a middle part of the lower line of each of the plurality of trapezoidal plates are configured to be connected with the power supply, respectively.

2 . The anode plate for a film plating machine according to claim 1 , wherein the plurality of the anode plate splicing units are sequentially spliced along a first linear direction.

3 . The anode plate for a film plating machine according to claim 2 , wherein the anode plate is a rectangular plate, and the first linear direction is a length direction of the rectangular plate.

4 . The anode plate for a film plating machine according to claim 2 , wherein a splicing seam between any two adjacent anode plate splicing units of the plurality of anode plate splicing units is inclined with respect to the first linear direction.

5 . The anode plate for a film plating machine according to claim 3 , wherein the plurality of the trapezoidal plates have equal heights, and any two adjacent trapezoidal plates of the plurality of trapezoidal plates are spliced together with one of non-parallel sides of one trapezoidal plate adjacent to one of non-parallel sides of the other trapezoidal plate.

6 . The anode plate for a film plating machine according to claim 2 , wherein a maximum length value of each of the plurality of anode plate splicing units in the first linear direction is in a range of 300 mm to 350 mm.

7 . The anode plate for a film plating machine according to claim 1 , wherein each of the plurality of anode plate splicing units is provided with a through hole.

8 . The anode plate for a film plating machine according to claim 1 , further comprising a supporting frame,

wherein the supporting frame comprises a border and a plurality of separating ribs arranged within the border, the border and the separating ribs are both made of insulating materials, and wherein a space enclosed by the border is divided into a plurality of subspaces by the plurality of the separating ribs, and in each subspace, an anode plate splicing unit which has a shape matching the shape of the subspace is fixed therein.

9 . A film plating machine comprising:

a power supply,

a plating solution tank, and

a conductive substrate film conveying device arranged on both sides of the plating solution tank,

wherein:

the conductive substrate film conveying device is configured to drive the horizontally arranged conductive substrate film to move along a film feeding direction, and the plating solution tank is sequentially provided therein with a plurality of anode plate groups at intervals along the film feeding direction,

each of the plurality of anode plate groups comprises an upper anode plate and a lower anode plate located on upper and lower sides of the conductive substrate film respectively,

each of the upper anode plate and the lower anode plate is an anode plate according to claim 1 , and each anode plate splicing unit in each of the upper anode plate and the lower anode plate is connected to the power supply.

10 . The film plating machine according to claim 9 , wherein the power supply of the film plating machine comprises a plurality of power supplies, and the plurality of anode plate splicing units are connected to the plurality of power supplies in one-to-one correspondence.

11 . The film plating machine according to claim 9 , wherein:

the upper anode plate and the lower anode plate are both rectangular plates, and the upper anode plate and the lower anode plate are respectively formed by splicing the plurality of anode plate splicing units along a length direction of the rectangular plate,

a width direction of the rectangular plate is parallel to the film feeding direction, a splicing seam between any two adjacent anode plate splicing units of the plurality of anode plate splicing units extends along the film feeding direction, and

the splicing seams in the upper anode plates in any two adjacent anode plate groups of the plurality of anode plate groups are staggered in the film feeding direction, and the splicing seams in the lower anode plates in any two adjacent anode plate groups of the plurality of anode plate groups are staggered in the film feeding direction.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 4, 2025
From: XIAMEN HITHIUM ENERGY STORAGE TECHNOLOGY CO., LTD.
To: HITHIUM TECH HK LIMITED
Reel/Frame 070396/0022 →
CHANGE OF NAME Recorded Oct 14, 2022
From: XIAMEN HITHIUM NEW ENERGY TECHNOLOGY CO., LTD.
To: XIAMEN HITHIUM ENERGY STORAGE TECHNOLOGY CO., LTD.
Reel/Frame 061684/0594 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2022
From: ZHANG, XICHONG; WU, YUYUAN; ZHAO, QIAN; ZHANG, QIN; LAN, JINHUA
To: XIAMEN HITHIUM NEW ENERGY TECHNOLOGY CO., LTD.
Reel/Frame 060355/0459 →
Priority Claims (1)
CN 202121477988.2 · Jun 30, 2021 · national
Continuity (1)
Related Publication 20230002925A1 · Jan 5, 2023
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