Protection interfaces for Li-ion battery anodes
Interfacial films, which are both electronic conducting and ion conducting, for anode films are provided. The one or more protective films described herein may be mixed conduction materials, which are both electronic conducting and ion-conducting. The one or more protective films described herein may include materials selected from lithium transition metal dichalcogenides, Li 9 Ti 5 O 12 , or a combination thereof. The lithium transition metal dichalcogenide includes a transition metal dichalcogenide having the formula MX 2 , wherein M is selected from Ti, Mo, or W and X is selected from S, Se, or Te. The transition metal dichalcogenide may be selected from TiS 2 , MoS 2 , WS 2 , or a combination thereof. The lithium transition metal dichalcogenide may be selected from lithium-titanium-disulfide (e.g., LiTiS 2 ), lithium-tungsten-disulfide (e.g., LiWS 2 ), lithium-molybdenum-disulfide (e.g., LiMoS 2 ), or a combination thereof.
1. A method, comprising:
forming a lithium metal film on a current collector, wherein the current collector comprises copper and/or stainless steel;
forming a protective film stack on the lithium metal film, comprising:
forming a first protective film on the lithium metal film, wherein the first protective film comprises a Li 9 Ti 5 O 12 film, and wherein forming the first protective film on the lithium metal film further comprises:
depositing a Li 4 Ti 5 O 12 film on the lithium metal film via a physical vapor deposition (PVD) process; and
exposing the Li 4 Ti 5 O 12 film to a lithiation process to form the Li 9 Ti 5 O 12 film; and
forming a second protective film on the first protective film, the second protective film comprising a lithium transition metal dichalcogenide, and wherein forming the lithium transition metal dichalcogenide comprises:
depositing a TiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film via a chemical vapor deposition process; and
exposing the TiS 2 film to the lithiation process to form a LiTiS 2 film on the Li 9 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film.
2. The method of claim 1 , wherein depositing the TiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film comprises:
(a) flowing TiCl 4 into a processing region;
(b) purging the processing region;
(c) flowing H 2 S into the processing region to form the TiS 2 film;
(d) purging the processing region; and
(e) repeating (a)-(d) until the TiS 2 film achieves a targeted thickness.
3. The method of claim 2 , wherein the first protective film has a thickness of 100 nanometers or less, and wherein the second protective film has a thickness of 100 nanometers or less.
4. A method, comprising:
forming a lithium metal film on a current collector comprising one or more metals;
forming a protective film stack on the lithium metal film, comprising:
forming a first protective film on the lithium metal film, wherein the first protective film comprises a Li 9 Ti 5 O 12 film, and wherein forming the first protective film on the lithium metal film further comprises:
depositing a Li 4 Ti 5 O 12 film on the lithium metal film via a physical vapor deposition (PVD) process; and
exposing the Li 4 Ti 5 O 12 film to a lithiation process to form the Li 9 Ti 5 O 12 film; and
forming a second protective film on the first protective film, the second protective film comprising a lithium transition metal dichalcogenide, and wherein forming the lithium transition metal dichalcogenide comprises:
depositing a TiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film via a chemical vapor deposition process; and
exposing the TiS 2 film to the lithiation process to form a LiTiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film.
5. The method of claim 4 , wherein the one or more metals comprise aluminum, copper, zinc, nickel, cobalt, manganese, chromium, stainless steel, clad materials, alloys thereof, or any combination thereof.
6. A method, comprising:
forming a lithium metal film on a current collector, wherein the current collector comprises copper and/or stainless steel; and
forming a protective film stack on the lithium metal film, comprising:
forming a first protective film on the lithium metal film, wherein the first protective film comprises a Li 9 Ti 5 O 12 film, and wherein forming the first protective film on the lithium metal film further comprises:
depositing a Li 4 Ti 5 O 12 film on the lithium metal film via a physical vapor deposition (PVD) process; and
reducing the Li 4 Ti 5 O 12 film to form the Li 9 Ti 5 O 12 film; and
forming a second protective film on the first protective film, the second protective film comprising a lithium transition metal dichalcogenide, and wherein forming the lithium transition metal dichalcogenide comprises:
depositing a TiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film via a chemical vapor deposition process; and
exposing the TiS 2 film to the lithiation process to form a LiTiS 2 film on the Li 4 Ti 5 O 12 film or the Li 9 Ti 5 O 12 film.