Giga interposer integration through Chip-On-Wafer-On-Substrate

1. A method of forming a semiconductor structure, the method comprising:

placing a first interposer laterally adjacent to a second interposer;

embedding the first interposer and the second interposer in a first molding material;

bonding a first die to the first interposer and the second interposer, wherein a first die connector of the first die is bonded with a first conductive bump at a first side of the first interposer, and a second die connector of the first die is bonded with a second conductive bump at a first side of the second interposer;

forming an underfill material between the first die and the first interposer; and

forming a second molding material around the first die, wherein the first molding material contacts and extends along the second molding material.

2. The method of claim 1 , further comprising, forming a redistribution structure at an opposing second side of the first interposer and at an opposing second side of the second interposer, wherein a conductive line of the redistribution structure extends continuously from the first interposer to the second interposer.

3. The method of claim 1 , further comprising bonding a second die to the second interposer, wherein after the second die is bonded, the second die is disposed within lateral extents of the second interposer.

4. The method of claim 1 , wherein a first sidewall of the first interposer distal from the second interposer is covered by the first molding material, and a second sidewall of the second interposer distal from the first interposer is covered by the first molding material.

5. The method of claim 1 , wherein a first sidewall of the first interposer distal from the second interposer is flush with a first sidewall of the first molding material, and a second sidewall of the second interposer distal from the first interposer is flush with a second sidewall of the first molding material.

6. The method of claim 1 , wherein the second molding material contacts and extends along the underfill material.

7. The method of claim 1 , wherein the first molding material contacts and extends along sidewalls of the underfill material.

8. The method of claim 1 , further comprising, after bonding the first die, bonding a substrate to a second side of the first interposer and to a second side of the second interposer.

9. A method of forming a semiconductor structure, the method comprising:

embedding a first interposer and a second interposer in a first molding material, wherein the first interposer is laterally adjacent to the second interposer;

forming a redistribution structure at a backside of the first interposer and at a backside of the second interposer, wherein a conductive line of the redistribution structure extends continuously from the first interposer to the second interposer;

bonding a first die to a front side of the first interposer and to a front side of the second interposer, wherein after boding the first die, a first portion of the first die is disposed within lateral extents of the first interposer, and a second portion of the first die is disposed within lateral extents of the second interposer;

forming an underfill material between the first die and the first interposer; and

forming a second molding material around the first die, wherein the redistribution structure is formed after embedding the first interposer and the second interposer and before bonding the first die, wherein the underfill material is formed after bonding the first die, and wherein the second molding material is formed after forming the underfill material.

10. The method of claim 9 , further comprising, before forming the second molding material, bonding a second die to the front side of the second interposer, wherein after bonding the second die, the second die is disposed laterally between opposing sidewalls of the second interposer.

11. The method of claim 9 , wherein the second molding material is formed to be spaced apart from the first molding material, wherein the second molding material contacts and extends along sidewalls of the underfill material.

12. A method of forming a semiconductor structure, the method comprising:

attaching a first die and a second die to a carrier;

forming a first molding material on the carrier around the first die and the second die;

bonding a first interposer to the first die and the second die, wherein the first die and the second die are interposed between the first interposer and the carrier;

bonding a second interposer to the second die;

forming an underfill material between the first die and the first interposer, and between the second die and the second interposer;

forming a second molding material over the first molding material around the first interposer, the second interposer, and the underfill material, wherein the second molding material contacts and extends along sidewall of the underfill material, wherein the second molding material contacts and extends along an upper surface of the first molding material distal from the carrier; and

forming a redistribution structure over the second molding material, the first interposer, and the second interposer, wherein a conductive line of the redistribution structure extends continuously from the first interposer to the second interposer.

13. The method of claim 12 , further comprising:

forming conductive bumps over the redistribution structure; and

bonding the conductive bumps to a substrate.

14. The method of claim 12 , wherein bonding the first interposer is performed after forming the first molding material.

15. The method of claim 14 , wherein forming the underfill material is performed after bonding the first interposer and after bonding the second interposer.

16. The method of claim 15 , wherein forming the second molding material is performed after forming the underfill material.

17. The method of claim 16 , wherein forming the redistribution structure is performed after forming the second molding material.

18. The method of claim 12 , further comprising removing the carrier after forming the redistribution structure.

19. The method of claim 13 , further comprising forming another underfill material between the redistribution structure and the substrate, wherein the another underfill material extends along the first molding material and the second molding material.

20. The method of claim 12 , wherein the first die is disposed within lateral extents of the first interposer.