IP Library › Granted Patent US 12,400,838
Granted Patent B2
US 12,400,838 · App. 17/875,524 · Granted Aug 26, 2025

Temperature-controlled plasma generation system

Inventor: Li-Shi Liu (Taipei, TW)
Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
H01J37/32522H01J37/3211H01J37/32119H01J37/32449H01L21/67069H01J2237/002H01J2237/24585H01J2237/332H01J2237/334
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Quick Facts
Patent No.
US 12,400,838
App. No.
17/875,524
Granted
Aug 26, 2025
Kind
B2
Abstract

The present disclosure relates to a plasma generation system with a dielectric window, an inductive coil disposed on the dielectric window, a gas distribution element disposed on the dielectric window, and a gas conditioning system coupled to the gas distribution element. The gas distribution element is configured to discharge a thermally conditioned gas on the dielectric window and regulate a temperature across the dielectric window. The gas conditioning system is configured to supply the thermally conditioned gas to the gas distribution element.

Claims (50)

1. A method for regulating a temperature across a dielectric window of a plasma generation system, the method comprising:

thermal conditioning, using a gas conditioner, a gas supplied to the plasma generation system to form a thermally conditioned gas;

discharging, using a gas distributor, the thermally conditioned gas on the dielectric window;

determining, using a controller, a difference between a temperature across the dielectric window and a predetermined temperature value; and

adjusting, using the controller, a parameter of the plasma generation system in response to the difference being greater than a baseline level.

2. The method of claim 1 , wherein thermally conditioning the gas comprises:

receiving the gas through a gas tube of the gas conditioner;

directing the gas through the gas tube using a gas circulator; and

heating or cooling the gas using a thermal conditioner.

3. The method of claim 1 , wherein discharging the thermally conditioned gas comprises directing the thermally conditioned gas to a gas distributor using a gas circulator.

4. The method of claim 1 , wherein discharging the thermally conditioned gas comprises discharging the thermally conditioned gas through gas distribution holes in the gas distributor.

5. The method of claim 1 , wherein discharging the thermally conditioned gas comprises discharging the thermally conditioned gas through first and second sets of gas distribution holes in the gas distributor, and

wherein a number of the gas distribution holes in the first set is greater than a number of the gas distribution holes in the second set.

6. The method of claim 5 , wherein a diameter of the gas distribution holes in the first set is smaller than a diameter of the gas distribution holes in the second set.

7. The method of claim 1 , wherein adjusting the parameter of the plasma generation system comprises dynamically adjusting a parameter of a heating coil or a cooling fan of a thermal conditioner.

8. The method of claim 1 , wherein determining the difference comprises:

activating, using the controller, sensors disposed on the dielectric window; and

measuring the temperature across the dielectric window using the sensors.

9. The method of claim 1 , further comprising extracting a portion of the thermally conditioned gas after discharging on the dielectric window in response to the difference being equal to or less than the baseline level.

10. The method of claim 1 , further comprising:

extracting, using a gas circulator, a portion of the thermally conditioned gas after discharging on the dielectric window; and

thermally reconditioning, using the gas conditioner, the portion of the thermally conditioned gas.

11. A method, comprising:

conditioning, using a gas conditioner, a gas supplied to a processing chamber to form a conditioned gas;

discharging, using a gas distributor, the conditioned gas on a dielectric window of the processing chamber;

determining, using a controller, a difference between a temperature across the dielectric window and a predetermined temperature value;

extracting, using a gas circulator, a portion of the conditioned gas after discharging on the dielectric window in response to the difference being equal to or less than a baseline level; and

reconditioning, using the gas conditioner, the portion of the conditioned gas.

12. The method of claim 11 , wherein discharging the conditioned gas comprises discharging different volumes of the conditioned gas on different regions of the dielectric window using the gas distributor.

13. The method of claim 11 , wherein discharging the conditioned gas comprises:

discharging a first volume of the conditioned gas through a first set of openings in the gas distributor and on a first region of the dielectric window; and

discharging a second volume of the conditioned gas through a second set of openings in the gas distributor and on a second region of the dielectric window.

14. The method of claim 13 , wherein a diameter of the openings in the first set of openings is smaller than a diameter of the openings in the second set of openings.

15. The method of claim 11 , further comprising adjusting, using the gas conditioner, a temperature of the conditioned gas prior to discharging the conditioned gas in response to the difference being greater than the baseline level.

16. The method of claim 11 , wherein determining the difference comprises:

activating, using the controller, sensors disposed on the dielectric window; and

measuring the temperature across the dielectric window using the sensors.

17. A method, comprising:

supplying, using a gas conditioner, a thermally conditioned gas to a gas distributor;

discharging, using the gas distributor, the thermally conditioned gas on a window of a processing chamber;

activating, using a controller, sensors disposed on the window and under the gas distributor;

measuring, using the sensors, a temperature across the window; and

adjusting, using the gas conditioner, a temperature of the thermally conditioned gas prior to discharging the thermally conditioned gas on the window.

18. The method of claim 17 , wherein discharging the thermally conditioned gas comprises discharging different volumes of the thermally conditioned gas on different regions of the window.

19. The method of claim 17 , wherein discharging the thermally conditioned gas comprises:

discharging a first volume of the thermally conditioned gas on a first region of the window; and

discharging a second volume of the thermally conditioned gas on a second region of the window.

20. The method of claim 17 , wherein supplying the thermally conditioned gas comprises:

receiving a gas through a gas tube of the gas conditioner; and

heating or cooling the gas using a thermal conditioner.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 28, 2022
From: LIU, LI-SHI
To: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Reel/Frame 060653/0510 →
Continuity (3)
Division 16437591 · Jun 11, 2019
Provisional Application 62691916 · Jun 29, 2018
Related Publication 20220367153A1 · Nov 17, 2022
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