IP Library › Granted Patent US 12,505,978
Granted Patent B2
US 12,505,978 · App. 17/891,983 · Granted Dec 23, 2025

Charged particle assessment tool, inspection method

Inventor: Marco Jan-Jaco Wieland (Delft, NL)
Assignee: ASML Netherlands B.V.
H01J37/28H01J37/12H01J37/3177
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Quick Facts
Patent No.
US 12,505,978
App. No.
17/891,983
Granted
Dec 23, 2025
Kind
B2
Abstract

A charged-particle assessment tool comprising: a condenser lens array, a collimator, a plurality of objective lenses and an electric power source. The condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus. The collimator being at each intermediate focus and configured to deflect a respective sub-beam so that it is incident on the sample substantially normally. The plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. Each objective lens comprises: a first electrode; and a second electrode that is between the first electrode and the sample. The electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective charged-particle beam is decelerated to be incident on the sample with a desired landing energy.

Claims (33)

1 . A charged-particle assessment tool comprising:

a condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus;

a collimator at each intermediate focus, the collimators being configured to deflect a respective sub-beam so that it is incident on a sample substantially normally;

a plurality of objective lenses, each configured to project one of the plurality of sub-beams onto the sample, wherein:

each objective lens comprises:

a first electrode; and

a second electrode that is between the first electrode and the sample;

an electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective sub-beam is decelerated to be incident on the sample with a desired landing energy, and

a detector configured to detect charged particles emitted from the sample, the detector being between the plurality of objective lenses and the sample.

2 . The charged-particle assessment tool of claim 1 , wherein the first potential is more positive than the second potential.

3 . The charged-particle assessment tool of claim 1 , wherein the second potential is positive relative to the sample.

4 . The charged-particle assessment tool of claim 3 , wherein the second potential is positive relative to the sample in a range of from +50 V to +200 V relative to the sample.

5 . The charged-particle assessment tool of claim 1 , wherein the second potential is positive relative to the sample, in a range of +500 to +1,500 V relative to the sample.

6 . The charged-particle assessment tool of claim 1 , wherein each objective lens further comprises a third electrode, the third electrode being between the first electrode and the condenser lens array; and the electric power source is configured to apply a third potential to the third electrode.

7 . The charged-particle assessment tool of claim 6 , wherein the electric power source is configured to apply different potentials to at least some of the first and second electrodes.

8 . The charged-particle assessment tool of claim 1 , wherein the electric power source is configured to apply the same first potential to all the first electrodes and the same second potential to all the second electrodes.

9 . The charged-particle assessment tool of claim 1 , further comprising one or more aberration correctors configured to reduce one or more aberrations in the sub-beams.

10 . The charged-particle assessment tool of claim 9 , wherein each of at least a subset of the aberration correctors is positioned in, or directly adjacent to, a respective one of the intermediate foci.

11 . The charged-particle assessment tool of claim 1 , further comprising one or more scanning deflectors for scanning the sub-beams over the sample.

12 . The charged-particle assessment tool of claim 11 , wherein the one or more scanning deflectors are integrated with, or are directly adjacent to, one or more of the objective lenses.

13 . The charged-particle assessment tool of claim 1 , wherein the collimator is one or more collimator deflectors.

14 . The charged-particle assessment tool of claim 13 , wherein the one or more collimator deflectors are configured to bend a respective beamlet by an amount effective to ensure that a principal ray of the sub-beam is incident on the sample substantially normally.

15 . The charged-particle assessment tool of claim 1 , wherein the collimator at each intermediate focus comprises the collimators positioned in diverging paths of the sub-beams substantially at the position of the corresponding focus points of the sub-beam paths.

16 . The charged-particle assessment tool of claim 1 , wherein the plurality of sub-beams comprises a plurality of diverging sub-beams, and the collimator is configured to operate on the plurality of diverging sub-beams to collimate the plurality of diverging sub-beams with respect to each other to produce a plurality of collimated sub-beams.

17 . An inspection method comprising:

dividing a beam of charged particles into a plurality of sub-beams;

focusing each of the sub-beams to a respective intermediate focus;

using a collimator at each intermediate focus to deflect a respective sub-beam so that it is incident on a sample substantially normally;

using a plurality of objective lenses to project the plurality of sub-beams onto the sample, each objective lens comprising a first electrode and a second electrode that is between the first electrode and the sample;

controlling first and second electric potentials applied to the first and second electrodes respectively of each objective lens such that the respective sub-beam is decelerated to be incident on the sample with a desired landing energy, and

using a detector to detect charged particles emitted from the sample, the detector being between the plurality of objective lenses and the sample.

18 . The inspection method of claim 17 , wherein in controlling the first and second electric potentials, the first potential is more positive than the second potential.

19 . The inspection method of claim 17 , wherein in controlling the first and second electric potentials, the second potential is positive relative to the sample.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 4, 2025
From: WIELAND, MARCO JAN-JACO
To: ASML NETHERLANDS B.V.
Reel/Frame 072777/0943 →
Priority Claims (2)
EP 20158804 · Feb 21, 2020 · regional
EP 20206984 · Nov 11, 2020 · regional
Continuity (2)
Continuation PCTEP2021053326 · Feb 11, 2021
Related Publication 20220392743A1 · Dec 8, 2022
References Cited (36)
US 6703624B2 · Hamaguchi et al. · 2004 [cited by applicant]
US 7453075B2 · Kruit · 2008 [cited by applicant]
US 8785879B1 · Frosien · 2014 [cited by applicant]
US 9922796B1 · Frosien et al. · 2018 [cited by applicant]
US 10312052B2 · Kruit · 2019 [cited by applicant]
US 10453645B2 · Frosien et al. · 2019 [cited by applicant]
US 20060169898A1 · Muraki et al. · 2006 [cited by applicant]
US 20080283744A1 · Takada et al. · 2008 [cited by applicant]
US 20100133433A1 · Tanimoto et al. · 2010 [cited by applicant]
US 20100276606A1 · Baars et al. · 2010 [cited by applicant]
US 20130277554A1 · Ren · 2013 [cited by examiner]
US 20140014852A1 · Wieland · 2014 [cited by examiner]
US 20140264062A1 · Adamec · 2014 [cited by applicant]
US 20170243717A1 · Kruit · 2017 [cited by examiner]
US 20190013176A1 · Breuer · 2019 [cited by applicant]
US 20190259570A1 · Kruit et al. · 2019 [cited by applicant]
US 20200051779A1 · Ren · 2020 [cited by examiner]
CN 107112183A · 2017 [cited by applicant]
CN 109216143A · 2019 [cited by applicant]
EP 0422414A1 · 1991 [cited by applicant]
JP H03241650A · 1991 [cited by applicant]
JP 2004235062A · 2004 [cited by applicant]
JP 2005203464A · 2005 [cited by applicant]
JP 2008181786A · 2008 [cited by applicant]
JP 2013165234A · 2013 [cited by applicant]
JP 2014183047A · 2014 [cited by applicant]
JP 2014220241A · 2014 [cited by applicant]
JP 2017162590A · 2017 [cited by applicant]
WO WO2018099756A1 · 2018 [cited by applicant]
WO WO2019063559A1 · 2019 [cited by applicant]
WO WO2019147872A2 · 2019 [cited by applicant]
International Search Report received from the International Search Authority issued in related International Application No. PCT/EP2021/053326 mailed Jun. 18, 2021 (3 pgs.). [cited by applicant]
Office Action issued by the Intellectual Property Office (IPO), ROC (Taiwan) Patent Application No. 110105897, issued on Oct. 29, 2021 (15 pgs.). [cited by applicant]
H. M. P. van Himbergen, et al., “High through put defect detection with multiple parallel electron beams,” Journal of Vacuum Science & Technology B: vol. 25, No. 6, pp. 2521-2525. [cited by applicant]
Zhang Y. et al.: “Design of a high brightness multi-electron-beam source,” ScienceDirect Physics Procedia 1 (2008) 553-563 (11 pgs.). [cited by applicant]
Notice of Reasons for Rejection issued by the Japan Patent Office in related Japanese Patent Application No. 2022-545974; mailed Jul. 19, 2023 (17 pgs.). [cited by applicant]