IP Library Granted Patent US 12,559,627
Granted Patent B2
US 12,559,627 · App. 17/934,406 · Granted Feb 24, 2026

Curable resin compositions

Inventors: Alexandra Szemjonov (Cambridge, GB); Phillippa K. Edge (Cambridge, GB); Alexandre Richez (Cambourne, GB)
Assignee: Illumina, Inc.
C08L83/06
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,559,627
App. No.
17/934,406
Granted
Feb 24, 2026
Kind
B2
Abstract

An example of an ultraviolet light curable resin composition includes a predetermined mass ratio of a first epoxy substituted polyhedral oligomeric silsesquioxane monomer and a second substituted polyhedral oligomeric silsesquioxane monomer, wherein the first and second epoxy substituted polyhedral oligomeric silsesquioxane monomers are different, and wherein the predetermined mass ratio ranges from about 3:7 to about 7:3; bis-(4-methylphenyl)iodonium hexafluorophosphate as a first initiator; a second initiator selected from the group consisting of a free radical initiator and a cationic initiator other than bis-(4-methylphenyl)iodonium hexafluorophosphate; a surface additive; and a solvent.

Claims (38)

1 . An ultraviolet light curable resin composition, comprising:

a predetermined mass ratio of a first epoxy substituted polyhedral oligomeric silsesquioxane monomer and a second substituted polyhedral oligomeric silsesquioxane monomer, wherein the first and second epoxy substituted polyhedral oligomeric silsesquioxane monomers are different, and wherein the predetermined mass ratio ranges from about 3:7 to about 7:3;

bis-(4-methylphenyl)iodonium hexafluorophosphate as a first initiator;

a second initiator selected from the group consisting of a free radical initiator and a cationic initiator other than bis-(4-methylphenyl)iodonium hexafluorophosphate;

a surface additive; and

a solvent.

2 . The ultraviolet light curable resin composition as defined in claim 1 , wherein:

the first epoxy substituted polyhedral oligomeric silsesquioxane monomer is epoxycyclohexylethyl polysilsesquioxane; and

the second epoxy substituted polyhedral oligomeric silsesquioxane monomer is glycidyl polysilsesquioxane.

3 . The ultraviolet light curable resin composition as defined in claim 2 , wherein the predetermined mass ratio is 1.5:1.

4 . The ultraviolet light curable resin composition as defined in claim 1 , wherein:

the second initiator is the free radical initiator; and

the free radical initiator is selected from the group consisting of 1,1,2,2-tetraphenyl-1,2-ethanediol; ethyl pyruvate; 4-cyano-4-(phenylcarbonothioylthio)pentanoic acid; and ethyl-3-methyl-2-oxobutanoate.

5 . The ultraviolet light curable resin composition as defined in claim 1 , wherein:

the second initiator is the cationic initiator; and

the cationic initiator is selected from the group consisting of bis[4-(tert-butyl)phenyl]iodonium tetra(nonafluoro-tert-butoxy)aluminate; and tris(4-((4-acetylphenyl)thio)phenyl)-sulfonium tetrakis(perfluoro-phenyl)borate.

6 . The ultraviolet light curable resin composition as defined in claim 1 , wherein:

the bis-(4-methylphenyl)iodonium hexafluorophosphate is present in an amount ranging from about 3 mass % to about 10 mass %, based on a total solids content of the resin composition; and

the second initiator is present in an amount ranging from about 1 mass % to about 26 mass %, based on the total solids content of the resin composition.

7 . A flow cell, comprising:

a substrate; and

a cured, patterned resin on the substrate, the cured, patterned resin including depressions separated by interstitial regions, and the cured, patterned resin including a cured form of a resin composition including:

a predetermined mass ratio of a first epoxy substituted polyhedral oligomeric silsesquioxane monomer and a second substituted polyhedral oligomeric silsesquioxane monomer, wherein the first and second epoxy substituted polyhedral oligomeric silsesquioxane monomers are different, and wherein the predetermined mass ratio ranges from about 3:7 to about 7:3;

bis-(4-methylphenyl)iodonium hexafluorophosphate as a first initiator;

a second initiator selected from the group consisting of a free radical initiator and a cationic initiator other than bis-(4-methylphenyl)iodonium hexafluorophosphate;

a surface additive; and

a solvent;

wherein the cured, patterned resin has low or no autofluorescence when exposed to violet or blue excitation wavelengths ranging from about 375 nm to about 500 nm.

8 . The flow cell as defined in claim 7 , wherein:

the first epoxy substituted polyhedral oligomeric silsesquioxane monomer is epoxycyclohexylethyl polysilsesquioxane; and

the second epoxy substituted polyhedral oligomeric silsesquioxane monomer is glycidyl polysilsesquioxane.

9 . The flow cell as defined in claim 8 , wherein the predetermined mass ratio is 1.5:1.

10 . The flow cell as defined in claim 7 , wherein:

the second initiator is the free radical initiator; and

the free radical initiator is selected from the group consisting of 1,1,2,2-tetraphenyl-1,2-ethanediol; ethyl pyruvate; 4-cyano-4-(phenylcarbonothioylthio)pentanoic acid; and ethyl-3-methyl-2-oxobutanoate.

11 . The flow cell as defined in claim 7 , wherein:

the second initiator is the cationic initiator; and

the cationic initiator is selected from the group consisting of bis[4-(tert-butyl)phenyl]iodonium tetra(nonafluoro-tert-butoxy)aluminate; and tris(4-((4-acetylphenyl)thio)phenyl)-sulfonium tetrakis(perfluoro-phenyl)borate.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 16, 2023
From: ILLUMINA CAMBRIDGE LIMITED
To: ILLUMINA, INC.
Reel/Frame 065611/0296 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 17, 2023
From: SZEMJONOV, ALEXANDRA; EDGE, PHILLIPPA K.; RICHEZ, ALEXANDRE
To: ILLUMINA CAMBRIDGE LIMITED
Reel/Frame 063018/0958 →
Continuity (2)
Provisional Application 63248182 · Sep 24, 2021
Related Publication 20230100285A1 · Mar 30, 2023
References Cited (13)
US 6106999A · Ogiso et al. · 2000 [cited by applicant]
US 9255922B2 · Ho et al. · 2016 [cited by applicant]
US 11884976B2 · Merkel · 2024 [cited by examiner]
US 11975478B2 · Richez · 2024 [cited by examiner]
US 12013330B2 · Merkel · 2024 [cited by examiner]
US 20170354971A1 · Taniguchi · 2017 [cited by applicant]
US 20200024661A1 · Merkel · 2020 [cited by examiner]
US 20200025670A1 · Merkel et al. · 2020 [cited by applicant]
EP 1794655B1 · 2011 [cited by applicant]
EP 2717097A1 · 2014 [cited by applicant]
WO 2021133735A1 · 2021 [cited by applicant]
Pai et al., “A Photoresist with Low Fluorescence for Bioanalytical Applications”, Anal Chem., 79(22); pp. 8774-8780, Nov. 15, 2007. [cited by applicant]
Daikos et al., “Peculiarities of the photoinitiator-free photopolymerization of pentabrominated and pentafluorinated aromatic acrylates and methacrylates”, Phys. Chem. Chem. Phys., 2016,18, 32369-32377, Nov. 7, 2016. [cited by applicant]