IP Library › Granted Patent US 12,550,601
Granted Patent B2
US 12,550,601 · App. 17/939,360 · Granted Feb 10, 2026

Display apparatus and method of manufacturing the same

Inventors: Yungbin Chung (Yongin-si, KR); Eunjin Kwak (Yongin-si, KR); Jihye Han (Yongin-si, KR); Chulmin Bae (Yongin-si, KR); Sangwook Lee (Yongin-si, KR)
Assignee: Samsung Display Co., Ltd.
H10K71/80C23C16/401C23C16/50H10K59/12H10K71/00H10K77/111H10K59/1201H10K2102/311
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Quick Facts
Patent No.
US 12,550,601
App. No.
17/939,360
Granted
Feb 10, 2026
Kind
B2
Abstract

Provided are a display apparatus, which may be easily separated from a carrier substrate, and a method of manufacturing the same. The method of manufacturing a display apparatus includes: forming, on a carrier substrate, a first inorganic layer including silicon oxide; plasma-treating the first inorganic layer by using nitrous oxide gas; after the plasma-treating, forming a display substrate on the first inorganic layer; forming a display element layer above the display substrate; and separating the display substrate from the carrier substrate.

Claims (34)

1 . A method of manufacturing a display apparatus, the method comprising steps of:

forming, on a carrier substrate, a first inorganic layer including silicon oxide;

plasma-treating the first inorganic layer by using nitrous oxide gas (N 2 O) and varying a content of oxygen per unit volume in the first inorganic layer according to positions within the first inorganic layer;

after the plasma-treating, forming a display substrate on the first inorganic layer;

forming a display element layer disposed on the display substrate; and

separating the display substrate from the carrier substrate.

2 . The method of claim 1 , wherein the plasma-treating the first inorganic layer is accomplished by plasma-treating an upper surface of the first inorganic layer.

3 . The method of claim 1 , wherein the plasma-treating the first inorganic layer is accomplished by making the content of oxygen per unit volume in the first inorganic layer increase from a bottom surface of the first inorganic layer which faces the carrier substate to an upper surface of the first inorganic layer.

4 . The method of claim 1 , wherein the plasma-treating the first inorganic layer is accomplished by making a content of oxygen per unit volume in a first portion of the first inorganic layer facing away from the carrier substrate be higher than a content of oxygen per unit volume in a second portion of the first inorganic layer, the second portion being closer than the first portion to the carrier substrate.

5 . The method of claim 4 , wherein the plasma-treating the first inorganic layer is accomplished by making a content of oxygen per unit volume in a third portion of the first inorganic layer be higher from a bottom surface of the third portion facing the carrier substrate to an upper surface of the third portion, the third portion being located between the first portion and the second portion.

6 . The method of claim 1 , further comprising, between the forming of the display substrate and the forming of the display element layer, forming, on the display substrate, a first barrier layer including silicon oxide.

7 . The method of claim 6 , further comprising, between the forming of the first barrier layer and the forming of the display element layer, forming, on the display substrate, a second barrier layer including silicon oxide.

8 . The method of claim 7 , wherein the forming of the second barrier layer is accomplished by forming the second barrier layer such that a content of oxygen per unit volume of the second barrier layer is lower than a content of oxygen per unit volume of the first barrier layer.

9 . The method of claim 7 , wherein the forming of the second barrier layer is accomplished by forming the second barrier layer such that a content of hydrogen per unit volume of the second barrier layer is higher than a content of hydrogen per unit volume of the first barrier layer.

10 . The method of claim 1 , wherein the separating the display substrate from the carrier substrate is accomplished by separating the display substrate from the first inorganic layer.

11 . A method of manufacturing a display apparatus, the method comprising steps of:

forming, on a carrier substrate, a first inorganic layer including silicon oxide;

plasma-treating the first inorganic layer by using nitrous oxide gas (N 2 O) and varying a content of hydrogen per unit volume in the first inorganic layer according to positions within the first inorganic layer;

after the plasma-treating, forming a display substrate on the first inorganic layer;

forming a display element layer disposed on the display substrate; and

separating the display substrate from the carrier substrate.

12 . The method of claim 11 , wherein the plasma-treating the first inorganic layer is accomplished by making the content of hydrogen per unit volume of the first inorganic layer decrease from the bottom surface of the first inorganic layer which faces the carrier substrate to the upper surface of the first inorganic layer.

13 . The method of claim 11 , wherein the plasma-treating the first inorganic layer is accomplished by making a content of hydrogen per unit volume in a first portion of the first inorganic layer facing away from the carrier substrate be lower than a content of hydrogen per unit volume in a second portion of the first inorganic layer, the second portion being closer than the first portion to the carrier substrate.

14 . The method of claim 13 , wherein the plasma-treating the first inorganic layer is accomplished by making a content of hydrogen per unit volume in a third portion of the first inorganic layer be lower from a bottom surface of the third portion facing the carrier substrate to an upper surface of the third portion, the third portion being located between the first portion and the second portion.

15 . A display apparatus comprising:

a display substrate;

a display element layer disposed on one surface of the display substrate; and

a second inorganic layer disposed on an other surface of the display substrate and including silicon oxide, wherein a content of oxygen per unit volume of the second inorganic layer increases in a direction toward the display substrate.

16 . The display apparatus of claim 15 , wherein a content of hydrogen per unit volume of the second inorganic layer decreases from a bottom surface of the second inorganic layer to an upper surface of the second inorganic layer which faces the display substrate.

17 . The display apparatus of claim 15 , further comprising:

a first barrier layer arranged between the display substrate and the display element layer; and

a second barrier layer arranged between the first barrier layer and the display element layer.

18 . The display apparatus of claim 17 , wherein a content of oxygen per unit volume of the second barrier layer is lower than a content of oxygen per unit volume of the first barrier layer.

19 . The display apparatus of claim 17 , wherein a content of hydrogen per unit volume of the second barrier layer is higher than a content of hydrogen per unit volume of the first barrier layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 7, 2022
From: CHUNG, YUNGBIN; KWAK, EUNJIN; HAN, JIHYE; BAE, CHULMIN; LEE, SANGWOOK
To: SAMSUNG DISPLAY CO., LTD.
Reel/Frame 061014/0107 →
Priority Claims (1)
KR 10-2021-0167722 · Nov 29, 2021 · national
Continuity (1)
Related Publication 20230172040A1 · Jun 1, 2023
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