Apparatus and method for processing substrate
The present disclosure provides a substrate processing apparatus capable of stabilizing the particle level when re-supplying a chemical solution. The substrate processing apparatus includes a circulation line connected to a chemical supply unit to circulate a chemical solution, a filter installed in the circulation line to filter particles in the chemical solution, a supply line connected to a first node of the circulation line and configured to supply the chemical solution to the chamber, and a drain line connected, in the circulation line, to a second node located between the filter and the first node, and configured to drain the chemical solution, the apparatus being configured to operate, during a first duration, from when a pump of the chemical supply unit is restarted after the pump had stopped, to drain the chemical solution that passes through the filter.
1 . An apparatus for processing a substrate, comprising: a circulation line connected to a chemical supply unit to circulate a chemical solution; a membrane filter installed in the circulation line to filter particles in the chemical solution; a supply line connected to a first node of the circulation line and configured to supply the chemical solution to a chamber; and a drain line connected, in the circulation line, to a second node located between the membrane filter and the first node, and configured to drain the chemical solution; a return line connecting an upstream of the first node at the circulation line and a downstream of the first node at the supply line to return the chemical solution from the supply line to the circulation line; and wherein the apparatus is programmed configured to operate in multiple durations and during a third duration from when a pump of the chemical supply unit is restarted after the pump had stopped, to wait until a cake is formed with particles on a membrane of the membrane filter.
2 . The apparatus of claim 1 , wherein the chemical solution that is supplied to the chamber during the second duration is used for nozzle flushing.
3 . The apparatus of claim 1 , wherein the apparatus is configured to operate, during a third duration after the second duration, to not drain the chemical solution that passes through the filter but to supply the chemical solution through the supply line to the chamber.
4 . The apparatus of claim 1 , wherein the apparatus is configured to operate, during a third duration, from when the chemical supply unit is operated after an initial setup of the chemical supply unit, to drain the chemical solution that passes through the filter.
5 . The apparatus of claim 1 , wherein the chemical supply unit supplies the chemical solution at a first flow rate, the drain line drains the chemical solution at a second flow rate, the supply line transfers the chemical solution to the chamber at a third flow rate, the first flow rate being equal to or greater than a sum of the second flow rate and the third flow rate.
6 . The apparatus of claim 1 , further comprising:
an on-off valve positioned between the first node and the second node and configured to further determine whether to supply the chemical solution to the supply line.
7 . The apparatus of claim 1 , further comprising:
an on-off valve installed on the drain line and configured to determine whether to drain the chemical solution.
8 . The apparatus of claim 7 , further comprising:
a flow control valve installed on the drain line and configured to control a flow rate of the chemical solution that is drained.
9 . The apparatus of claim 1 , further comprising:
a back pressure valve positioned downstream of the first node in the circulation line and configured to maintain a front-end pressure of the back pressure valve to be constant.
10 . The apparatus of claim 9 , further comprising:
a positive pressure valve positioned in the supply line and configured to maintain a constant flow rate of the chemical solution discharged to the chamber by maintaining a rear-end pressure of the positive pressure valve to be constant.
11 . An apparatus for processing a substrate, comprising: a circulation line connected to a chemical supply unit to circulate a chemical solution; a membrane filter installed in the circulation line to filter particles in the chemical solution; a supply line connected to a first node of the circulation line and configured to supply the chemical solution to a chamber; a drain line connected, in the circulation line, to a second node located between the membrane filter and the first node, and configured to drain the chemical solution; a first on-off valve positioned in the circulation line between the first node and the second node; and a second on-off valve installed in the drain line; and a return line connecting an upstream of the first node at the circulation line and a downstream of the first node at the supply line to return the chemical solution from the supply line to the circulation line; and wherein the apparatus is programmed configured to operate in multiple durations and a membrane of the membrane filter has no complete formation of a cake due to the particles during a fourth duration, from when a pump of the chemical supply unit is restarted after the pump had stopped.
12 . The apparatus of claim 11 , wherein the apparatus is configured to operate to drain the chemical solution that passes through the filter, during the first duration, from when a pump of the chemical supply unit is restarted after the pump had stopped, or during the first duration, from when the chemical supply unit is operated after an initial setup of the chemical supply unit.
13 . The apparatus of claim 1 , further comprising at least two valves provided on the supply line, wherein the return line configured to return the chemical solution from the supply line to the circulation line is connected to between the at least two valves provided on the supply line.
14 . The apparatus of claim 11 , further comprising at least two valves provided on the supply line, wherein the return line configured to return the chemical solution from the supply line to the circulation line is connected to between the at least two valves provided on the supply line.
15 . The apparatus of claim 1 , wherein the apparatus is configured to operate, during a first duration, from when a pump of the chemical supply unit is restarted after the pump had stopped, to drain the chemical solution that passes through the filter, and to operate, during a second duration after the first duration, to drain a portion of the chemical solution that passes through the filter and to supply some other portion of the chemical solution through the supply line to the chamber.
16 . The apparatus of claim 11 , wherein the apparatus is configured to:
operate, during a first duration, to turn off the first on-off valve and turn on the second on-off valve,
operate, during a second duration after the first duration, to turn on the first on-off valve and maintain the second on-off valve turned on, and
operate, during a third duration after the second duration, to turn on the second on-off valve and maintain the first on-off valve turned on.