Stacked semiconductor method and apparatus
A manufacturing method of a chip package, performing a coupling of first and second interconnecting layers between one or more top dies and one or more bottom dies via hybrid copper bonding; depositing a material to at least partially cover the second interconnecting layer; thinning a second surface of the one or more top dies, wherein both the one or more top dies and the material define a continuous surface; coupling a first surface of a support die to the second surface of at least one of the one or more top dies; thinning a second surface of at least one of the one or more bottom dies; and coupling the second surface of at least one of the one or more bottom dies to a plurality of microbumps.
1 . A chip package, comprising:
one or more top dies;
one or more bottom dies;
a first interconnecting layer;
a second interconnecting layer, wherein a first surface of each of the one or more top dies is coupled to the first interconnecting layer, wherein a first surface of each of the one or more bottom dies is coupled to the second interconnecting layer, wherein the first and second interconnecting layers each comprise:
a layer comprising copper pads and a dielectric layer, wherein the first and second interconnecting layers between the one or more top dies and the one or more bottom dies are coupled via hybrid copper bonding;
a material comprising silicon, wherein the material is deposited to at least partially cover the second interconnecting layer, wherein the one or more top dies and the material define a continuous surface;
a support die, wherein a first surface of the support die is coupled to a second surface of the one or more top dies; and
a plurality of microbumps, wherein the plurality of microbumps are coupled to a second surface of at least one of the one or more bottom dies, the one or more bottom dies comprising through-silicon vias exposed at the second surface, the microbumps coupled to the through-silicon vias and to an interposer.
2 . The chip package of claim 1 , wherein one or more additional top dies of the one or more top dies are coupled to the second surface of the one or more top dies via the hybrid copper bonding, wherein a second surface of at least one of the one or more additional top dies is coupled to the first surface of the support die via a bonding film.
3 . The chip package of claim 1 , wherein the support die comprises one or more of the following:
aluminum nitride, graphene on silicon, diamond on silicon, or silicon.
4 . The chip package of claim 1 , wherein the dielectric layer comprises silicon oxide (SiOx).
5 . The chip package of claim 1 , wherein the second surface of the one or more top dies and the first surface of the support die are coupled via a bonding film.
6 . The chip package of claim 5 , wherein the bonding film comprises a filler material and a resin material, wherein the filler material comprises one or more of the following:
silver, aluminum flakes, silver coated copper spheres, silver-diamond, or copper-diamond particles; and
wherein the resin material comprises one or more of the following:
polyimide, benzocyclobutane, epoxy, phenolic, lyurethane, or silicon.
7 . The chip package of claim 5 , wherein the bonding film comprises a dielectric material, wherein the dielectric material comprises one or more of the following:
silicon and oxygen molecules;
silicon, oxygen, and nitrogen molecules; or
silicon, carbon, and nitrogen molecules.
8 . The chip package of claim 1 , wherein at least one of the one or more top dies and the one or more bottom dies further comprises one or more of the following:
one or more through-silicon-vias (TSV);
one or more deep trench capacitors; or
one or more integrated voltage regulators.
9 . The chip package of claim 1 , wherein at least one of the one or more top dies and the one or more bottom dies comprises an active die.
10 . The chip package of claim 1 , wherein the support die comprises microfluidic channels.
11 . The chip package of claim 1 , wherein the material comprises one or more of the following:
silicon and oxygen molecules;
silicon, oxygen, and nitrogen molecules; or
silicon, carbon, and nitrogen molecules.