Thermal management techniques for high power integrated circuits operating in dry cryogenic environments
Improved heat sinking of electronic and/or photonic integrated circuit chips is provided by including thermal-only contacts on unused parts of the chip. The resulting chip can be bonded to a cold plate with a process that ensures that only the thermal contacts of the chip touch the cold plate, thereby avoiding problems caused by the cold plate creating electrical shorts of the chip. For example, the thermal contacts can be higher features than any electrical features on that side of the chip. This approach is expected to be especially useful for applications requiring low temperature operation (e.g., operation at 100K or less, preferably operation at 10 K or less).
1 . A method of heat-sinking an electrical integrated circuit chip, the method comprising:
fabricating one or more first thermal contact pads on the electrical integrated circuit chip which are electrically isolated from functional circuitry of the electrical integrated circuit chip;
bonding the electrical integrated circuit chip to a first heat spreading substrate, wherein the one or more first thermal contact pads are bonded to the first heat spreading substrate via first thermally conductive bonds.
2 . The method of claim 1 , wherein the first heat spreading substrate is selected from the group consisting of:
molybdenum, tungsten, silicon, sapphire, and diamond.
3 . The method of claim 1 , further comprising surface treating the first heat spreading substrate to improve bonding of the first thermally conductive bonds to the first heat spreading substrate.
4 . The method of claim 3 , wherein the surface treating comprises surface coating the first heat spreading substrate with a metal.
5 . The method of claim 1 , wherein the first heat spreading substrate is thermally coupled to a cryogenic environment at 100 K or less.
6 . The method of claim 1 , further comprising bonding a photonic integrated circuit to the electrical integrated circuit on a side of the electrical integrated circuit opposite the first heat spreading substrate.
7 . The method of claim 6 , further comprising fabricating one or more second thermal contact pads on the photonic integrated circuit chip which are electrically isolated from functional circuitry of the photonic integrated circuit chip.
8 . The method of claim 7 , further comprising bonding the photonic integrated circuit chip to a second heat spreading substrate, wherein the one or more second thermal contact pads are bonded to the second heat spreading substrate via second thermally conductive bonds.
9 . The method of claim 8 , wherein the second heat spreading substrate is selected from the group consisting of: molybdenum, tungsten, silicon, sapphire, and diamond.
10 . The method of claim 9 , further comprising surface treating the second heat spreading substrate to improve bonding of the second thermally conductive bonds to the second heat spreading substrate.
11 . The method of claim 10 , wherein the surface treating comprises surface coating the second heat spreading substrate with a metal.
12 . The method of claim 7 , wherein the second heat spreading substrate is thermally coupled to a cryogenic environment at 100 K or less.