Ionization device and ionization method
In an ionization device for an ionization chamber ( 11 ) separated from an analysis chamber ( 12 - 14 ) by a partition wall having an ion introduction port ( 113 ), an ionization probe ( 111 ) sprays a liquid sample. A heated-gas supply mechanism ( 112 ), which includes a gas supply source and a heating section ( 1122 ) for heating a gas supplied from the gas supply source, expels the gas in a direction intersecting with the direction in which the liquid sample is sprayed from the ionization probe. A controller ( 32 ) controls an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of the presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe. The continuous expulsion of the gas from the heated-gas supply mechanism prevents this mechanism from being contaminated by the sprayed liquid.
1 . An ionization device to be installed for an ionization chamber separated from an analysis chamber by a partition wall in which an ion introduction port is provided, the ionization device comprising:
an ionization probe configured to spray a liquid sample;
a heated-gas supply mechanism including a gas supply source and a heating section for heating a gas supplied from the gas supply source, the heated-gas supply mechanism configured to expel the gas in a direction intersecting with a direction in which the liquid sample is sprayed from the ionization probe; and
a controller configured to control an operation of the heated-gas supply mechanism so that the gas is continuously expelled from the heated-gas supply mechanism regardless of presence or absence of an operation by a user while the liquid sample is sprayed from the ionization probe;
the controller configured to control a gas-expelling operation by the heated-gas supply mechanism to be automatically initiated simultaneously with or earlier than a point in time where spraying of the liquid sample is initiated, and to control a gas-expelling operation by the heated-gas supply mechanism to be continued to a point in time simultaneous with or later than a completion of the spraying of the liquid sample.
2 . The ionization device according to claim 1 , wherein the heated-gas supply mechanism is capable of performing a heating operation in which the gas supplied from the gas supply source is expelled after being heated by the heating section, and a non-heating operation in which the gas supplied from the gas supply source is expelled without being heated by the heating section.
3 . The ionization device according to claim 1 , wherein:
the ionization probe includes a nebulizer-gas supply mechanism configured to supply a nebulizer gas for spraying the liquid sample; and
the controller is configured to control the operation of the heated-gas supply mechanism synchronously with an operation of the nebulizer-gas supply mechanism.
4 . The ionization device according to claim 1 , wherein the controller is further configured to control the operation of the heated-gas supply mechanism so that the gas is expelled from the heated-gas supply mechanism at a predetermined flow rate for measurement time during a measurement period in which a measurement of the liquid sample is performed, while the gas is expelled from the heated-gas supply mechanism at a flow rate for standby time during a standby period in which no measurement of the liquid sample is performed, where the flow rate for standby time is lower than the flow rate for measurement time.
5 . The ionization device according to claim 1 , further comprising a drying-gas supply mechanism configured to expel a gas in an opposite direction to an ion current flowing into the ion introduction port.
6 . The ionization device according to claim 5 , wherein the controller is further configured to control the operation of the heated-gas supply mechanism so that the gas is expelled from the heated-gas supply mechanism at a predetermined first flow rate when there is the gas being expelled from the drying-gas supply mechanism, while the gas is expelled from the heated-gas supply mechanism at a second flow rate which is lower than the first flow rate, when there is no gas being expelled from the drying-gas supply mechanism.
7 . A method for ionizing a liquid sample within an ionization chamber separated from an analysis chamber by a partition wall in which an ion introduction port is provided, the method comprising steps of:
introducing the liquid sample into an ionization probe to spray the liquid sample into the ionization chamber; and
continuously expelling a gas from a heated-gas supply mechanism in a direction intersecting with a direction in which the liquid sample is sprayed from the ionization probe, regardless of presence or absence of an operation by a user, where the heated-gas supply mechanism, which is provided apart from the ionization probe, includes a gas supply source and a heating section for heating the gas supplied from the gas supply source;
wherein a gas-expelling operation by the heated-gas supply mechanism is automatically initiated simultaneously with or earlier than a point in time where spraying of the liquid sample is initiated, and the gas-expelling operation by the heated-gas supply mechanism is continued to a point in time simultaneous with or later than a completion of the spraying of the liquid sample.