Light source apparatus
A light source apparatus, in which an energy beam transforms a liquid raw material into plasma to extract radiation, includes a rotation body, a raw material supply section, and a layer thickness adjustment section. The rotation body is disposed at a position onto which the energy beam is incident, and includes a groove overlapping with an incident area of the energy beam. The raw material supply section supplies the groove with the liquid raw material. The layer thickness adjustment section adjusts a layer thickness of the liquid raw material such that a front surface of the liquid raw material forms a concave surface in response to the groove in the incident area of the energy beam.
1. An x-ray or extreme ultraviolet light source apparatus, in which an electron beam or laser beam transforms a liquid raw material into plasma to extract x-ray or extreme ultraviolet radiation, the x-ray or extreme ultraviolet light source apparatus comprising:
a beam source for emitting an electron beam or laser beam;
a rotation body having a main surface perpendicular to a rotational axis and disposed at a position onto which the electron beam or laser beam is incident, and includes a V-shaped groove located in the main surface and overlapping with an incident area of the electron beam or laser beam;
a raw material supply section that supplies the groove with the liquid raw material; and
a layer thickness adjustment section configured to adjust a layer thickness of the liquid raw material such that a front surface of the liquid raw material forms a concave surface in response to the V-shaped groove in the incident area of the electron beam or laser beam.
2. The x-ray or extreme ultraviolet light source apparatus according to claim 1 , wherein the layer thickness adjustment section includes a skimmer that is fixed at a position directly above the V-shaped groove and independently of the rotation body, and that skims off part of the liquid raw material rotating with the rotation body.
3. The x-ray or extreme ultraviolet light source apparatus according to claim 2 , wherein the skimmer includes a member having a channel structure that sandwiches an outer edge of the rotation body.
4. The x-ray or extreme ultraviolet light source apparatus according to claim 2 , wherein the skimmer is disposed to be in contact with a front surface of the rotation body provided with the V-shaped groove.
5. The x-ray or extreme ultraviolet light source apparatus according to claim 1 , wherein the layer thickness adjustment section includes a rotation controller that controls a drive section that rotates the rotation body.
6. The x-ray or extreme ultraviolet light source apparatus according to claim 1 , wherein the rotation body includes a disk-shaped rotation main body and a cover that is disposed at a position with a predetermined spacing from the main surface of the rotation main body, and that includes an annular opening through which the electron beam or laser beam passes.
7. The x-ray or extreme ultraviolet light source apparatus according to claim 1 , wherein the rotation body includes an inner circumferential face surrounding a rotation axis thereof, and the V-shaped groove is provided on the inner circumferential face.
8. The x-ray or extreme ultraviolet light source apparatus according to claim 1 , further comprising a temperature adjustment mechanism for adjusting the temperature of the plasma raw material, wherein the layer thickness adjustment section includes the temperature adjustment mechanism.
9. An x-ray or extreme ultraviolet light source apparatus, comprising:
a beam source for emitting an electron beam or laser beam to an incident area;
a rotation body disposed at a position onto which the electron beam or laser beam is incident, and includes a groove overlapping with the incident area of the electron beam or laser beam;
a raw material supply section that supplies the rotation body with liquid raw material; and
a layer thickness adjustment section including a skimmer and a rotation controller configured to control a rotational speed of the rotation body for adjusting a layer thickness of the liquid raw material, the skimmer located near the raw material supply section removing an excessive amount of the liquid raw material on the rotation body and the rotation controller configured to adjust the rotational speed for causing centrifugal force to form a concave surface on the liquid raw material in the groove approaching the incident area.
10. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , wherein the skimmer includes a member having a channel structure that sandwiches an outer edge of the rotation body.
11. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , wherein the skimmer is disposed to be in contact with a front surface of the rotation body provided with the groove.
12. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , wherein the rotation body includes a disk-shaped rotation main body and a cover that is disposed at a position with a predetermined spacing from a main surface of the rotation main body, and that includes an annular opening through which the electron beam or laser beam passes.
13. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , wherein an opening width of the groove is set in a range from 1 to 10 times as large as a spot size of the electron beam or laser beam.
14. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , wherein the rotation body includes an inner circumferential face surrounding a rotation axis thereof, and the groove is provided on the inner circumferential face.
15. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , further comprising a case that accommodates the rotation body, and that includes an opening through which the electron beam or laser beam and the x-ray or extreme ultraviolet radiation pass.
16. The x-ray or extreme ultraviolet light source apparatus according to claim 9 , further comprising a temperature adjustment mechanism for adjusting the temperature of plasma raw material, wherein the layer thickness adjustment section includes the temperature adjustment mechanism.