Lithographic apparatus, metrology systems, illumination switches and methods thereof
View Patent ↗A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
1. A system comprising:
an illumination system, the illumination system including a broadband light source configured to generate a beam of radiation;
a dispersive optical element configured to receive the beam of radiation and generate a plurality of light beams having a narrower bandwidth than the broadband light source;
an optical switch configured to receive the plurality of light beams and transmit each one of the plurality of light beams to a respective one of a plurality of alignment sensors of a sensor array; and
processing circuitry configured to receive radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
2. The system of claim 1 , wherein each one of the plurality of light beams corresponds to a different wavelength band.
3. The system of claim 2 , wherein the processing circuitry is further configured to communicate, to the optical switch, a signal corresponding to a switching operation to re-route one or more of the plurality of light beams to a different one of the plurality of alignment sensors in the sensor array.
4. The system of claim 2 , wherein the optical switch is further configured to transmit each one of the plurality of light beams simultaneously.
5. The system of claim 2 , wherein a number of outputs of the optical switch correspond to a number of alignment sensors in the sensor array.
6. The system of claim 1 , wherein
the plurality of light beams comprises a first light beam having a first wavelength band and a second light beam having a second wavelength band, and
the first wavelength band and the second wavelength band comprise a shared wavelength.
7. The system of claim 1 , wherein the illumination system is further configured to operate within a broad wavelength range of between approximately 200-2000 nm and wherein the plurality of light beams is within the broad wavelength range.
8. The system of claim 1 , wherein at least one of the plurality of light beams has a wavelength band of approximately 20 nm wide or less.
9. The system of claim 1 , wherein at least one of the plurality of light beams has a wavelength band of approximately 1 nm wide or less.
10. The system of claim 1 , wherein the optical switch is a micro-electromechanical system (MEMS) optical switch.
11. The system of claim 1 , wherein the dispersive optical element comprises an optical ring resonator.
12. The system of claim 1 , wherein at least a portion of the illumination system comprises an integrated photonic device comprising at least the broadband light source, the dispersive optical element, and the optical switch.
13. The system of claim 1 , wherein the system has a footprint area less than approximately 2000 mm 2 , 1000 mm 2 , 500 mm 2 , 100 mm 2 , 50 mm 2 , 25 mm 2 , or 16 mm 2 .
14. The system of claim 1 , wherein the processing circuitry comprises an image capture device.
15. The system of claim 1 , further comprising:
a second illumination system, the second illumination system including a second broadband light source configured to generate a second beam of radiation;
a second dispersive optical element configured to receive the second beam of radiation and generate a second plurality of light beams having a narrower bandwidth than the second broadband light source;
a second optical switch configured to receive the second plurality of light beams and transmit each one of the second plurality of light beams to a respective one of a plurality of alignment sensors of a second sensor array; and
second processing circuitry configured to receive radiation returning from the second sensor array and to generate a measurement signal based on the received radiation.
16. A lithographic apparatus comprising:
an illumination apparatus configured to illuminate a pattern of a patterning device;
a projection system configured to project an image of the pattern onto a target substrate; and
a metrology system comprising:
an illumination system, the illumination system including a broadband light source configured to generate a beam of radiation;
a dispersive optical element configured to receive the beam of radiation and generate a plurality of light beams having a narrower bandwidth than the broadband light source;
an optical switch configured to receive the plurality of light beams and transmit each one of the plurality of light beams to a respective one of a plurality of alignment sensors of a sensor array; and
processing circuitry configured to receive radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
17. A method comprising:
generating a beam of radiation from a broadband light source of an illumination system;
dispersing the beam of radiation, using a dispersive optical element, to generate a plurality of light beams having a narrower bandwidth than the broadband light source;
transmitting, using an optical switch, each one of the plurality of light beams to a respective one of a plurality of alignment sensors of a sensor array; and
detecting, with processing circuitry, returning radiation from the sensor array and generating a measurement signal based on the received radiation.
18. The method of claim 17 , further comprising:
communicating, to the optical switch, a signal corresponding to a switching operation to re-route one or more of the plurality of light beams to a different one of the plurality of alignment sensors in the sensor array.
19. The method of claim 17 , further comprising:
transmitting each one of the plurality of light beams simultaneously.
20. The method of claim 17 , wherein a number of outputs of the optical switch corresponds to a number of alignment sensors in the sensor array.