Multi-stack susceptor reactor for high-throughput superconductor manufacturing
A vapor deposition reactor apparatus, systems and methods for deposition of thin films, particularly high-temperature superconducting (HTS) coated conductors, utilize multi-sided susceptors and susceptor pairs for increased production throughput. The reactors may also be configured in multi-stack arrangements of the susceptors within a single reactor chamber for additional throughput gains.
1. A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising:
a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor, and
wherein the susceptor comprises a heater element configured to heat both upper and lower surfaces of the susceptor; and
an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said elongated substrate tape slidably contacts both the upper and lower surfaces of the susceptor.
2. The apparatus of claim 1 , wherein the susceptor further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel.
3. The apparatus of claim 1 , wherein the elongated substrate tape winds around and contacts each side of the susceptor more than once.
4. The apparatus of claim 1 , wherein the elongated substrate tape is comprised of more than one parallel tape translating together.
5. The apparatus of claim 4 , wherein each elongated substrate tape winds around the susceptor more than once.
6. The apparatus of claim 1 , wherein the reactor chamber comprises at least two susceptors arranged in pairs such that the elongated substrate tape slidably contacts both the upper and lower surfaces of each pair of susceptors within the reactor chamber.
7. A vapor deposition apparatus for manufacturing superconductors on an elongated substrate tape, the apparatus comprising:
a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a two-piece substrate susceptor comprising an upper first substrate susceptor half and a lower second substrate susceptor half, and
wherein each susceptor half comprises a heater element; and
an elongated substrate tape continuously spooled between a payout reel and a take-up reel, wherein said elongated substrate tape slidably contacts both the upper surface of the first susceptor half and the lower surface of the second susceptor half.
8. The apparatus of claim 7 , wherein the substrate susceptor halves are coupled together.
9. The apparatus of claim 7 , wherein the substrate susceptor halves are separated by a vertical distance (d).
10. The apparatus of claim 7 , wherein the two-piece substrate susceptor further comprises a dividing plate located between the susceptor halves.
11. The apparatus of claim 7 , wherein each susceptor half further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel.
12. The apparatus of claim 7 , wherein the elongated substrate tape winds around the two-piece substrate susceptor more than once.
13. The apparatus of claim 7 , wherein the elongated substrate tape is comprised of more than one parallel tape translating together.
14. The apparatus of claim 13 , wherein each elongated substrate tape winds around the two-piece substrate susceptor more than once.
15. The apparatus of claim 7 , wherein the reactor chamber comprises more than one two-piece substrate susceptors and the elongated substrate tape slidably contacts both the upper surface of the first susceptor half and the lower surface of the second susceptor half of each two-piece substrate susceptor within the reactor chamber.
16. A vapor deposition system for manufacturing superconductors on an elongated substrate tape, the system comprising:
a vapor deposition apparatus including a deposition chamber maintained under vacuum and housing a precursor inlet showerhead, an outlet port, and a substrate susceptor with more than one susceptor surface, more than one heater element connected to the substrate susceptor, and an elongated substrate tape continuously spooled between a payout reel and a take-up reel, and wherein said substrate tape slidably contacts more than one susceptor surface of the substrate susceptor,
a measuring unit configured to measure a parameter (P) of the vapor deposition apparatus,
a master controller (MC) configured to receive the measured parameter (P) from the measuring unit; and
a second controller (SC) configured to receive a command from the master controller (MC) and adjust a second parameter (P 2 ) associated with the susceptor based on the measured parameter (P).
17. The system of claim 16 , wherein the measured parameter (P) is susceptor temperature and the second parameter (P 2 ) is heat input to at least one heater element.
18. The system of claim 16 , wherein the measured parameter (P) is substrate temperature and the second parameter (P 2 ) is heat input to at least one heater element.
19. The system of claim 16 , wherein the susceptor further comprises more than one raised section each with a width substantially the width of an elongated substrate tape and each raised section extends vertically from the upper surface of a main body of the susceptor and lengthwise along the length of the main body of the susceptor such that two adjacent raised sections form a channel.
20. The system of claim 16 , wherein the elongated substrate tape is comprised of more than one parallel tape translating together.