IP Library Granted Patent US 12,649,854
Granted Patent B2
US 12,649,854 · App. 18/080,176 · Granted Jun 9, 2026

Method of preparing laminate and laminate for optical use

Inventors: Taewan Kim (Seoul, KR); GeonGon Lee (Seoul, KR); Suk Young Choi (Seoul, KR); Hyung-joo Lee (Seoul, KR); Suhyeon Kim (Seoul, KR); Sung Hoon Son (Seoul, KR); Seong Yoon Kim (Seoul, KR); Min Gyo Jeong (Seoul, KR); HaHyeon Cho (Seoul, KR); Inkyun Shin (Seoul, KR)
Assignee: LuminaMask Co., Ltd.
C09D1/00C23C14/0036C23C14/022C23C14/18G03F1/54
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Quick Facts
Patent No.
US 12,649,854
App. No.
18/080,176
Granted
Jun 9, 2026
Kind
B2
Abstract

The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.

Claims (11)

1 . A laminate where a light-shielding film is disposed,

wherein the light-shielding film comprises a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon, and

wherein a reflectance of the light-shielding film is 35% or less with respect to a light having a wavelength of 193 nm,

wherein the laminate comprises residual ions measured by ion chromatography, and wherein the residual ions comprise sulfur-based ions and nitric acid-based ions, and

wherein the residual ions comprise sodium ions, phosphoric acid ions, potassium ions, magnesium ions and calcium ions, and a sum of an amount of the sodium ions, an amount of the phosphoric acid ions, an amount of the potassium ions, an amount of the magnesium ions, and an amount of the calcium ions is equal to or more than 0 ng/cm 2 and less than or equal to 0.01 ng/cm 2 .

2 . The laminate of claim 1 , wherein an amount of the sulfur-based ions is more than 0 ng/cm 2 and less than or equal to 0.1 ng/cm 2 and an amount of the nitric acid-based ions is more than 0 ng/cm 2 and less than or equal to 0.1 ng/cm 2 .

3 . The laminate of claim 1 , wherein the residual ions comprise halogen ions, and wherein an amount of the halogen ions is more than 0 ng/cm 2 and less than or equal to 0.1 ng/cm 2 .

4 . The laminate of claim 3 , wherein the transition metal comprises chrome and the halogen ions comprise fluorine ions or chlorine ions.

5 . The laminate of claim 1 , wherein the residual ions comprise ammonia ions and an amount of the ammonia ions is more than 0 ng/cm 2 and less than or equal to 1.0 ng/cm 2 .

6 . The laminate of claim 1 , wherein the residual ions comprise ionic impurities including sulfur-based ions, nitric acid-based ions, halogen ions, and ammonia ions, and an amount of the ionic impurities is more than 0 ng/cm 2 and less than or equal to 1.5 ng/cm 2 .

7 . The laminate of claim 1 , wherein the laminate is a photomask blank or a photomask.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 5, 2026
From: SK ENPULSE CO., LTD.
To: LUMINAMASK CO., LTD.
Reel/Frame 074478/0876 →
CHANGE OF NAME Recorded Nov 9, 2023
From: SKC SOLMICS CO., LTD.
To: SK ENPULSE CO., LTD.
Reel/Frame 065509/0991 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2023
From: KIM, TAEWAN; LEE, GEONGON; CHOI, SUK YOUNG; LEE, HYUNG-JOO; KIM, SUHYEON; SON, SUNG HOON; KIM, SEONG YOON; JEONG, MIN GYO; CHO, HAHYEON; SHIN, INKYUN
To: SKC SOLMICS CO., LTD.
Reel/Frame 062395/0402 →
Priority Claims (1)
KR 10-2021-0182720 · Dec 20, 2021 · national
Continuity (1)
Related Publication 20230193043A1 · Jun 22, 2023
References Cited (29)
US 20050006266A1 · Kurikawa · 2005 [cited by examiner]
US 20050250018A1 · Ushida · 2005 [cited by examiner]
US 20130273738A1 · Sakai et al. · 2013 [cited by applicant]
US 20150111134A1 · Suzuki · 2015 [cited by examiner]
US 20170031241A1 · Shen et al. · 2017 [cited by applicant]
US 20180335693A1 · Hiromatsu · 2018 [cited by examiner]
US 20200150523A1 · Chou et al. · 2020 [cited by applicant]
CN 1958177A · 2007 [cited by applicant]
CN 106391542A · 2017 [cited by applicant]
CN 108292100A · 2018 [cited by applicant]
JP 2001293443A · 2001 [cited by applicant]
JP 2002336804A · 2002 [cited by applicant]
JP 200453817A · 2004 [cited by applicant]
JP 2007118002A · 2007 [cited by applicant]
JP 2010117403A · 2010 [cited by applicant]
JP 2011221063A · 2011 [cited by applicant]
JP 2015022150A · 2015 [cited by applicant]
JP 2018534608A · 2018 [cited by applicant]
JP 2019179813A · 2019 [cited by applicant]
KR 100316374B · 2001 [cited by applicant]
KR 100745065B · 2007 [cited by applicant]
KR 1020090016210A · 2009 [cited by applicant]
KR 1020110016737A · 2011 [cited by applicant]
KR 1020120101427A · 2012 [cited by applicant]
KR 1020170015067A · 2017 [cited by applicant]
KR 1020180057697A · 2018 [cited by applicant]
KR 101913431B · 2018 [cited by applicant]
TW 201815694A · 2018 [cited by applicant]
WO WO2012086744A1 · 2012 [cited by applicant]