Semiconductor device comprising bonded a plurality of semiconductor structures along with conductive layers and bonding pads
A semiconductor device may include: a first semiconductor structure including a first conductive layer and four first bonding pads connected to the first conductive layer; and a second semiconductor structure including a second conductive layer and four second bonding pads connected to the second conductive layer, wherein the four first bonding pads are configured to be disposed to have respective centers each overlapping four intersections that are formed by two virtual first straight lines extending in parallel in a first direction and two virtual second straight lines extending in parallel in a second direction intersecting the first direction, where each of the four first bonding pads has four quadrants divided by the first straight line and the second straight line, and wherein, when the first semiconductor structure and the second semiconductor structure are normally aligned, the four second bonding pads are configured to be disposed to have respective centers that are displaced in directions from the respective centers of the four first bonding pads toward different quadrants.
1 . A semiconductor device comprising:
a first semiconductor structure including a first conductive layer and four first bonding pads connected to the first conductive layer; and
a second semiconductor structure including a second conductive layer and four second bonding pads connected to the second conductive layer,
wherein the four first bonding pads are configured to be disposed to have respective centers each overlapping four intersections that are formed by two virtual first straight lines extending in parallel in a first direction and two virtual second straight lines extending in parallel in a second direction intersecting the first direction, where each of the four first bonding pads has a first quadrant, a second quadrant, a third quadrant, and a fourth quadrant divided by a corresponding one of the two virtual first straight lines and a corresponding one of the two virtual second straight lines, and
wherein, when the first semiconductor structure and the second semiconductor structure are normally aligned, the four second bonding pads are configured to be disposed to have respective centers that are displaced in directions from the respective centers of the four first bonding pads toward different quadrants so that a first one of the four second bonding pads overlaps at least a portion of the first quadrant of a first one of the four first bonding pads corresponding thereto, a second one of the four second bonding pads overlaps at least a portion of the second quadrant of a second one of the four first bonding pads corresponding thereto, a third one of the four second bonding pads overlaps at least a portion of the third quadrant of a third one of the four first bonding pads corresponding thereto, and a fourth one of the four second bonding pads overlaps at least a portion of the fourth quadrant of a fourth one of the four first bonding pads corresponding thereto.
2 . The semiconductor device according to claim 1 , wherein overlapping areas between the four first bonding pads and the four second bonding pads are same as each other.
3 . The semiconductor device according to claim 1 , wherein the four first bonding pads and the four second bonding pads are configured to form a metal-to-metal bond.
4 . The semiconductor device according to claim 3 , wherein:
the first semiconductor structure further includes a first insulating layer filled between the four first bonding pads,
the second semiconductor structure further includes a second insulating layer filled between the four second bonding pads, and
the first insulating layer and the second insulating layer are configured to form an insulator-to-insulator bond.
5 . The semiconductor device according to claim 1 , wherein each of the four first bonding pads and each of the four second bonding pads are configured to have same area and shape in a plan view.
6 . The semiconductor device according to claim 5 , wherein an area of each first bonding pad overlapping a corresponding second bonding pad is configured to be substantially same as an area of the second bonding pad overlapping the first bonding pad.
7 . The semiconductor device according to claim 5 , wherein the four first bonding pads and the four second bonding pads are configured to have a square shape in a plan view,
wherein an area of each first bonding pad overlapping a corresponding second bonding pad correspond to ¼ of an area of each first bonding pad or each second bonding pad.
8 . The semiconductor device according to claim 1 , wherein the four first bonding pads and the four second bonding pads are configured to have different areas in a plan view.
9 . The semiconductor device according to claim 8 , wherein an area of the first bonding pad overlapping the second bonding pad and an area of the second bonding pad overlapping the first bonding pad are configured to be different from each other.
10 . The semiconductor device according to claim 1 , wherein the first bonding pad and the second bonding pad are configured to have different shapes in a plan view.
11 . The semiconductor device according to claim 10 , wherein an area of the first bonding pad overlapping the second bonding pad and an area of the second bonding pad overlapping the first bonding pad are configured to be different from each other.
12 . The semiconductor device according to claim 1 , wherein, when the first semiconductor structure and the second semiconductor structure are misaligned, a total overlapping area between the four first bonding pads and the four second bonding pads is maintained.
13 . The semiconductor device according to claim 1 , wherein the first semiconductor structure further includes one or more first conductive layers, and the four first bonding pads are configured to be connected to each of the one or more first conductive layers.
14 . The semiconductor device according to claim 1 , wherein, when the four first bonding pads form a bonding pad group, the first conductive layer is configured to be connected to one or more bonding pad groups.
15 . The semiconductor device according to claim 1 , wherein the first semiconductor structure and the second semiconductor structure include same type of memory.
16 . The semiconductor device according to claim 1 , wherein the first semiconductor structure and the second semiconductor structure include different types of memory.
17 . The semiconductor device according to claim 1 , wherein one of the first semiconductor structure and the second semiconductor structure includes a memory and the other of the first semiconductor structure and the second semiconductor structure includes a peripheral circuit for driving the memory.
18 . The semiconductor device according to claim 1 , when the first semiconductor structure and the second semiconductor structure are normally aligned, a center of the first conductive layer and a center of the second conductive layer overlap with each other.
19 . The semiconductor device according to claim 12 , when the first semiconductor structure and the second semiconductor structure are misaligned, one of the centers of the first conductive layer and the second conductive layer displaces within a predetermined limit from the other of the centers of the first conductive layer and the second conductive layer.
20 . The semiconductor device according to claim 1 , wherein
when the first semiconductor structure and the second semiconductor structure are normally aligned, respective vertices of the four second bonding pads contact the respective centers of the four first bonding pads.