IP Library Granted Patent US 12,590,366
Granted Patent B2
US 12,590,366 · App. 18/133,909 · Granted Mar 31, 2026

Canister, precursor transfer system having the same and method for measuring precursor remaining amount thereof

Inventors: Kyungrim Kim (Suwon-si, KR); Dowon Kim (Suwon-si, KR); Sunja Kim (Suwon-si, KR); Youngeun Kim (Suwon-si, KR)
Assignee: SAMSUNG ELECTRONICS CO., LTD.
C23C16/4481C23C16/45527C23C16/45544C23C16/45553C23C16/52
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Quick Facts
Patent No.
US 12,590,366
App. No.
18/133,909
Granted
Mar 31, 2026
Kind
B2
Abstract

A canister supplying a precursor to a processing chamber includes a body, a first valve introducing a carrier gas into the body, a second valve discharging a sublimated gas of a solid precursor into a processing chamber, a precursor accommodating tray accommodating the solid precursor, and at least one piezoelectric transducer at least one of vibrating the precursor accommodating tray or measuring a resonance frequency.

Claims (45)

1 . A method of forming a precursor transfer system, the method comprising:

providing a processing chamber; and

forming a canister configured to supply a sublimated gas of a solid precursor to the processing chamber,

wherein the precursor transfer system comprises:

a carrier gas supply device configured to discharge a carrier gas;

the canister configured to receive the carrier gas through a first pipe and to discharge a mixed gas comprising the sublimated gas of the solid precursor through a second pipe;

a reaction gas supply device configured to discharge at least one reaction gas through a third pipe; and

the processing chamber configured to provide the mixed gas and the at least one reaction gas to a substrate on a chuck,

wherein the canister comprises:

a body;

a first valve configured to introduce the carrier gas into the body;

a second valve configured to discharge the sublimated gas of the solid precursor into the processing chamber;

a precursor accommodating tray configured to accommodate the solid precursor; and

at least one piezoelectric transducer configured to at least one of vibrate the precursor accommodating tray or measure a resonance frequency of the canister.

2 . The method of claim 1 , wherein the canister further comprises a controller configured to control the at least one piezoelectric transducer.

3 . The method of claim 2 , wherein the controller is configured to calculate a change in mass of the solid precursor using the resonance frequency measured by the at least one piezoelectric transducer.

4 . The method of claim 2 , wherein the controller is configured to release vapor trapped between particles of the solid precursor at least in part by controlling the at least one piezoelectric transducer.

5 . The method of claim 2 , wherein the at least one piezoelectric transducer is configured to vibrate the precursor accommodating tray at the measured resonance frequency.

6 . The method of claim 1 , wherein the solid precursor comprises at least one of MoO 2 Cl 2 or MoCl 5 .

7 . The method of claim 1 , wherein the body comprises a heating unit.

8 . The method of claim 7 , wherein the heating unit is on an outer circumferential surface of the body.

9 . The method of claim 1 , wherein the at least one piezoelectric transducer is inside the precursor accommodating tray.

10 . The method of claim 1 , wherein the canister further comprises a monitor configured to calculate a remaining amount of the solid precursor based at least in part on the resonance frequency and to monitor the remaining amount of the solid precursor.

11 . A method of forming a precursor transfer system, the method comprising:

providing a processing chamber; and

forming a canister configured to supply a sublimated gas of a solid precursor to the processing chamber,

wherein the precursor transfer system comprises:

a carrier gas supply device configured to discharge a carrier gas;

the canister configured to receive the carrier gas through a first pipe and to discharge a mixed gas comprising the sublimated gas of the solid precursor through a second pipe;

a reaction gas supply device configured to discharge at least one reaction gas through a third pipe; and

the processing chamber configured to provide the mixed gas and the at least one reaction gas to a substrate on a chuck, and

wherein the canister comprises a piezoelectric transducer configured to vibrate a precursor accommodating tray to accommodate the solid precursor or measure a resonance frequency of the canister.

12 . The method of claim 11 , wherein the precursor transfer system further comprises:

a controller configured to control the piezoelectric transducer.

13 . The method of claim 12 , wherein the controller is configured to measure the resonance frequency at least in part by controlling the piezoelectric transducer, and wherein the controller is configured to calculate a remaining amount of the solid precursor in the canister using the measured resonance frequency.

14 . The method of claim 12 , wherein the controller is configured to vibrate the canister using the resonance frequency as a vibration frequency at least in part by controlling the piezoelectric transducer.

15 . The method of claim 11 , wherein the canister comprises the precursor accommodating tray configured to accommodate the solid precursor, and the precursor accommodating tray is configured to stack a plurality of support vessels.

16 . A method of operating a precursor transfer system configured to accommodate a solid precursor, the method comprising:

detecting a resonance frequency of a canister using a piezoelectric transducer; and

calculating a remaining amount of the solid precursor based at least in part on the detected resonance frequency,

wherein the piezoelectric transducer is configured to vibrate a precursor accommodating tray or measure the resonance frequency of the canister.

17 . The method of claim 16 , further comprising vibrating the canister at the measured resonance frequency.

18 . The method of claim 16 , further comprising introducing a carrier gas from a carrier gas supply device.

19 . The method of claim 16 , further comprising heating the solid precursor to sublimate the solid precursor.

20 . The method of claim 16 , further comprising displaying the remaining amount of the solid precursor calculated in the calculating.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2023
From: KIM, KYUNGRIM; KIM, DOWON; KIM, SUNJA; KIM, YOUNGEUN
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 063306/0517 →
Priority Claims (1)
KR 10-2022-0128036 · Oct 6, 2022 · national
Continuity (1)
Related Publication 20240124972A1 · Apr 18, 2024
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