Self-densifying interconnection between a high-temperature semiconductor device selected from GaN or SiC and a substrate
A self-densifying interconnection is formed between a high-temperature semiconductor device selected from a GaN or SiC-based device and a substrate. The interconnection includes a matrix of micron-sized silver particles in an amount from approximately 10 to 60 weight percent; the micron-sized silver particles having a particle size ranging from approximately 0.1 microns to 15 microns. Bonding particles are used to chemically bind the matrix of micron-sized silver particles. The bonding particles are core silver nanoparticles with in-situ formed surface silver nanoparticles chemically bound to the surface of the core silver nanoparticles and, at the same time, chemically bound to the matrix of micron-sized silver particles. The bonding particles have a core particle size ranging from approximately 10 to approximately 100 nanometers while the in-situ formed surface silver nanoparticles have a particle size of approximately 3-9 nanometers.
1 . A self-densifying interconnection between a high-temperature semiconductor device selected from GaN or SiC and a substrate comprising:
a matrix of micron-sized silver particles in amount from approximately 10 to 60 weight percent, the micron-sized silver particles having a particle size ranging from approximately 0.1 microns to 15 microns;
bonding particles fused to the matrix of micron-sized silver particles comprising core silver nanoparticles with smaller in-situ formed surface silver nanoparticles chemically bound to the surface of the core silver nanoparticles and chemically bound to the matrix of micron-sized silver particles, the bonding particles having a core particle size ranging from approximately 10 to approximately 100 nanometers, the in-situ formed surface silver nanoparticles having a particle size of approximately 3-9 nanometers;
wherein the self-densifying interconnection has a porosity below 25%.
2 . The self-densifying interconnection of claim 1 , wherein the micron-sized silver particles are selected from silver flakes or approximately spherical silver particles.
3 . The self-densifying interconnection of claim 1 , wherein the substrate includes a layer of silver or gold having a thickness of approximately 0.1 to 0.3 micron.
4 . A trimodal self-densifying silver interconnection paste comprising
10-60 weight percent of approximately micron-sized matrix silver particles with average particle size from 0.1 micron to 15 microns;
10-60 weight percent of bonding silver nanoparticles, the bonding silver nanoparticles having core silver nanoparticles with a core nanoparticle size of approximately 10-100 nanometers, the core silver nanoparticles having a capping polymeric layer including a silver salt precursor dissolved or suspended therein, the silver salt precursor forming surface silver nanoparticles adhering to the surface of the core silver nanoparticles having a particle size from approximately 10 to approximately 100 nanometers;
10-20 weight percent of at least one reductive solvent;
0.1-1 wt % of anti-oxidization reducing agents;
wherein the trimodal self-densifying silver interconnection paste has a porosity below 25%.
5 . The trimodal silver interconnection paste of claim 4 , further comprising 0.1-1 weight percent of a non-conductive filler.
6 . The trimodal silver interconnection paste of claim 4 , wherein the approximately micron-sized matrix silver particles are selected from silver flakes or approximately spherical silver particles.
7 . The trimodal silver interconnection paste of claim 4 , wherein the capping polymeric layer is polyvinyl pyrrolidone.
8 . The trimodal silver interconnection paste of claim 4 , wherein the silver salt is selected from one or more of silver nitrate, silver chloride, silver acetate, or silver sulfate.
9 . The trimodal silver interconnection paste of claim 4 , wherein the at least one reductive solvent is selected from one or more or ethylene glycol, diethylene glycol, triethylene glycol and polyethylene glycol.
10 . The trimodal silver interconnection paste of claim 4 , wherein the anti-oxidization reducing agent is selected from one or more of citric acid, caffeic acid, malic acid, or a dicarboxylic acid.
11 . The trimodal silver interconnection paste of claim 5 , wherein the non-conductive filler is selected from one or more of SiC, SiO 2 or Al 2 O 3 , ZrO 2 , silicone resin microsphere particles, or other ceramic and polymer particles that are stable at sintering temperature.