Manufacturing method of display device
A manufacturing method of a display device includes forming a lower electrode, forming an insulating layer overlapping the lower electrode, forming a first aluminum layer above the insulating layer, cooling the first aluminum layer, forming a second aluminum layer on the first aluminum layer, forming a thin film above the second aluminum layer, forming a partition including a lower portion and an upper portion, forming an organic layer located on the lower electrode, and forming an upper electrode which is located on the organic layer and is in contact with the lower portion of the partition.
1 . A manufacturing method of a display device, comprising:
forming a lower electrode above a substrate;
forming an insulating layer overlapping the lower electrode;
forming a first aluminum layer above the insulating layer;
cooling the first aluminum layer;
forming a second aluminum layer on the first aluminum layer;
forming a thin film above the second aluminum layer;
forming a partition comprising a lower portion including the first aluminum layer and the second aluminum layer and an upper portion including the thin film and protruding from a side surface of the lower portion by applying etching to the first aluminum layer, the second aluminum layer and the thin film;
forming an organic layer located on the lower electrode; and
forming an upper electrode which is located on the organic layer and is in contact with the lower portion of the partition.
2 . The manufacturing method of claim 1 , wherein
each of the first aluminum layer and the second aluminum layer is formed by continuous sputtering so as to have a thickness greater than or equal to 200 nm but less than or equal to 500 nm.
3 . The manufacturing method of claim 2 , wherein
cooling the first aluminum layer is performed by extracting a processing substrate in which the first aluminum layer is formed from a chamber.
4 . The manufacturing method of claim 1 , wherein
each of the first aluminum layer and the second aluminum layer is formed of pure aluminum.
5 . The manufacturing method of claim 1 , wherein
a metal layer is formed on the insulating layer before forming the first aluminum layer,
the first aluminum layer is formed on the metal layer,
the metal layer is etched at the same time as the etching of the first aluminum layer, and
the upper electrode is in contact with a side surface of each of the metal layer and the first aluminum layer.
6 . The manufacturing method of claim 1 , wherein
the insulating layer is formed of an inorganic material.