SEMICONDUCTOR PACKAGE HAVING WETTABLE FLANKS AND RELATED METHODS
Implementations of methods of forming semiconductor packages may include coupling a plurality of die to a pad carrier that includes a carrier and a plurality of pads, wire bonding the plurality of die to the plurality of pads, applying a mold compound over the plurality of die, removing the carrier, and singulating a plurality of semiconductor packages.
1 . A method of forming a semiconductor package comprising:
coupling a plurality of die to a pad carrier, the pad carrier comprising a carrier and a plurality of pads;
wire bonding the plurality of die to the plurality of pads;
applying a mold compound over the plurality of die;
removing the carrier; and
singulating a plurality of semiconductor packages.
2 . The method of claim 1 , wherein each pad of the plurality of pads comprises an etch stop layer directly coupled to the carrier, a solderable layer directly coupled to the etch stop layer, and a wire bondable layer directly coupled to the solderable layer.
3 . The method of claim 1 , wherein the semiconductor package comprises a multi-chip module package.
4 . The method of claim 1 , wherein the plurality of pads form a plurality of wettable flanks in each semiconductor package of the plurality of semiconductor packages.
5 . The method of claim 1 , wherein the semiconductor package comprises a chip-on-lead package.
6 . A method of forming a semiconductor package comprising:
coupling a plurality of die to a pre-plated pad carrier, the pre-plated pad carrier comprising a metal carrier and a plurality of pre-plated pads;
wire bonding the plurality of die to the plurality of pre-plated pads;
applying a mold compound over the plurality of die;
removing the metal carrier; and
singulating a plurality of semiconductor packages;
wherein each pre-plated pad of the plurality of pre-plated pads comprises a solderable layer coupled between the metal carrier and a wire bondable layer.
7 . The method of claim 6 , wherein the wire bondable layer is directly coupled to the solderable layer.
8 . The method of claim 6 , wherein the wire bondable layer overhangs the solderable layer and forms a mold lock.
9 . The method of claim 6 , wherein the solderable layer of the plurality of pads is exposed on at least two sides of each semiconductor package of the plurality of semiconductor packages.
10 . The method of claim 6 , wherein each pre-plated pad further comprises an etch stop layer coupled between the solderable layer and the metal carrier.
11 . The method of claim 6 , wherein the metal carrier is removed through a grinding process.
12 . The method of claim 6 , wherein the metal carrier is removed through an etching process.
13 . The method of claim 6 , wherein the wire bondable layer overhangs the solderable layer on at least 3 sides and forms a mold lock.
14 . A method of forming a semiconductor package comprising:
forming a pre-plated pad carrier by:
patterning a first layer of photoresist coupled over a metal carrier;
electroplating a first metal layer over the metal carrier;
patterning a second layer of photoresist coupled over the first layer of photoresist;
electroplating a second metal layer over the first metal layer; and
removing both the first layer of photoresist and the second layer of photoresist, wherein the first metal layer and the second metal layer forms a plurality of pre-plated pads;
coupling a plurality of die to the plurality of pre-plated pads;
wire bonding the plurality of die to the plurality of pre-plated pads;
applying a mold compound over the plurality of die;
removing the metal carrier; and
singulating a plurality of semiconductor packages.
15 . The method of claim 14 , further comprising electroplating an etch stop layer directly to the metal carrier, wherein the first metal layer is electroplated over the etch stop layer.
16 . The method of claim 14 , wherein the second metal layer of the pre-plated pad carrier overhangs the first metal layer of the pre-plated pad carrier.
17 . The method of claim 14 , wherein the plurality of semiconductor packages are between 0.90 mm and 0.30 mm thick.
18 . The method of claim 14 , wherein the plurality of pre-plated pads form wettable flanks exposed on two sides of each semiconductor package of the plurality of semiconductor packages.
19 . The method of claim 14 , wherein the plurality of semiconductor packages comprise quad-flat no-leads packages.
20 . The method of claim 14 , wherein the second metal layer comprises one of silver or NiPdAu.