IP Library › Patent Application 18237487
Patent Application
App. No. 18/237,487

ONE COMPONENT THERMALLY CONDUCTIVE AMBIENT TEMPERATURE CURABLE MATERIALS

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Quick Facts
Patent No.
US None
App. No.
18/237,487
Abstract

A moisture-curable thermally conductive material is provided in a one-component dispensable form and curable in situ. The material is formed from a non-silicone resin and exhibits a thermal conductivity of at least 1.0 W/m*K to effectively dissipate thermal energy from an electronic component heat source. The material is dispensable from a single-component dispensing system and is stable in storage.

Claims (35)

1 . A moisture-curable thermally conductive material, comprising:

a non-silicone resin including a reactive silyl group;

thermally conductive particulate filler; and

a diluent having a viscosity of less than 1000 cP at 25° C.,

wherein the thermally conductive material exhibits a thermal conductivity of at least 1.0 W/m*K and a pre-cured viscosity of more than 300 Pa*s at 1 s −1 and 25° C. and less than 300 Pa*s at 1500 s −1 and 25° C., and is curable in less than 72 hours at 25° C. in the presence of water to a hardness of less than 80 Shore OO at 25° C.

2 . The moisture-curable thermally conductive material of claim 1 being dispensable as a coherent mass through an orifice.

3 . The moisture-curable thermally conductive material of claim 1 , including a catalyst selected for facilitating condensation-type cross-linking of the non-silicone resin.

4 . The moisture-curable thermally conductive material of claim 3 , wherein the catalyst includes an organotin or an organobismuth compound.

5 . The moisture-curable thermally conductive material of claim 3 , including a thickening agent.

6 . The moisture-curable thermally conductive material of claim 3 , including a water scavenger.

7 . The moisture-curable thermally conductive material of claim 5 , including:

less than 20 wt % of the non-silicone resin including the reactive silyl group;

from 60-95 wt % of the thermally conductive particulate filler;

less than 20 wt % of the diluent;

less than 1 wt % of the thickening agent; and

less than 0.5 wt % of the catalyst.

8 . The moisture-curable thermally conductive material of claim 7 wherein the presence of water includes about 0.1 wt % water.

9 . The moisture-curable thermally conductive material of claim 8 wherein the reactive silyl group includes one or more of dimethoxysilane, trimethoxysilane, and triethoxysilane.

10 . The moisture-curable thermally conductive material of claim 8 wherein the non-silicone resin includes a flexible backbone, including polyether or polyacrylate.

11 . The moisture-curable thermally conductive material of claim 9 being curable in less than 24 hours at 25° C. in the presence of water.

12 . The moisture-curable thermally conductive material of claim 10 wherein the diluent has a viscosity of less than 200 cP at 25° C.

13 . An electronic apparatus, comprising:

an electronic component; and

the moisture-curable thermally conductive material of claim 1 thermally coupled to the electronic component.

14 . The electronic apparatus of claim 12 , wherein the moisture-curable thermally conductive material is coated on the electronic component.

15 . A method for forming a thermal interface on a surface, the method comprising:

(a) providing in a single container as a one-part dispensable mass:

(i) a non-silicone resin including a reactive silyl group;

(ii) thermally conductive particulate filler; and

(iii) a diluent,

wherein the dispensable mass exhibits a viscosity of more than 300 Pa*s at 1 s −1 and 25° C., and less than 300 Pa*s at 1500 s −1 and 25° C.;

(b) dispensing at least part of the dispensable mass through an orifice onto the surface; and

(c) curing the resin in the presence of water to form the thermal interface with a thermal conductivity of at least 1.0 W/m*K and a hardness of less than 80 Shore OO.

16 . The method for forming a thermal interface as in claim 15 wherein the thermal interface exhibits a hardness of at least 50 Shore OO.

17 . The method for forming a thermal interface as in claim 15 wherein the silyl group includes at least one hydrolyzable group on the silicon atom.