IP Library Granted Patent US 12,204,005
Granted Patent B2
US 12,204,005 · App. 18/251,296 · Granted Jan 21, 2025

Magnetoresistive sensor element having a wide linear response and robust nominal performance and manufacturing method thereof

Inventors: Jeffrey Childress (San Jose, CA); Nikita Strelkov (Meylan, FR); Andrey Timopheev (Vif, FR)
Assignee: Allegro MicroSystems, LLC
G01R33/098G01R33/0052G01R33/093H01F1/0009
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Quick Facts
Patent No.
US 12,204,005
App. No.
18/251,296
Granted
Jan 21, 2025
Kind
B2
Abstract

A magnetoresistive element for a magnetic sensor, the magnetoresistive element including a tunnel barrier layer between a reference layer having a fixed reference magnetization and a sense layer having a free sense magnetization, wherein the sense magnetization includes a stable vortex configuration. The magnetoresistive element further includes a reference pinning layer in contact with the reference layer and pining the reference magnetization by exchange-bias at a first blocking temperature. The magnetoresistive element further includes a sense pinning layer in contact with the sense layer and pining the sense magnetization by exchange-bias at a second blocking temperature lower that the first blocking temperature. Additionally, a method for manufacturing the magnetoresistive element.

Claims (23)

1. A magnetoresistive element for a magnetic sensor, the magnetoresistive element comprising a tunnel barrier layer included between a reference layer having a fixed reference magnetization and a sense layer having a free sense magnetization;

the sense magnetization comprising a stable vortex configuration in the absence of an applied magnetic field;

the magnetoresistive element further comprising a reference pinning layer in contact with the reference layer and pining the reference magnetization by exchange-bias at a first blocking temperature; and

a sense pinning layer in contact with the sense layer and pining the sense magnetization by exchange-bias at a second blocking temperature lower that the first blocking temperature,

wherein the sense layer has a thickness between 15 nm and 80 nm, and

wherein the strength of exchange-bias between the sense pinning layer and the sense layer is between 2×10 −8 J/cm 2 and 4×10 −8 J/cm 2 .

2. The magnetoresistive element according to claim 1 , wherein the sense pinning layer is configured such that the strength of exchange-bias between the sense pinning layer and the sense layer is lower than the strength of exchange-bias between the reference pinning layer and the reference layer.

3. The magnetoresistive element according to claim 1 , wherein the sense layer comprises a CoFe, NiFe or CoFeB based alloy.

4. The magnetoresistive element according to claim 1 , wherein the reference pinning layer or the sense pinning layer comprise, or are formed of, an antiferromagnetic material.

5. The magnetoresistive element according to claim 4 , wherein the reference pinning layer or the sense pinning layer comprise an alloy based on Ir and Mn, Fe and Mn; Pt and Mn, Ni and Mn, Cr, NiO or FeO.

6. A magnetic sensor comprising a plurality of the magnetoresistive elements according to claim 1 .

7. A method for manufacturing a magnetoresistive element comprising a tunnel barrier layer included between a reference layer having a fixed reference magnetization and a sense layer having a free sense magnetization;

the sense magnetization comprising a stable vortex configuration in the absence of an applied magnetic field;

the magnetoresistive element further comprising a reference pinning layer in contact with the reference layer and pining the reference magnetization by exchange-bias at a first blocking temperature; and

a sense pinning layer in contact with the sense layer and pining the sense magnetization by exchange-bias at a second blocking temperature lower that the first blocking temperature;

wherein the sense layer has a thickness between 15 nm and 80 nm, and the strength of exchange-bias between the sense pinning layer and the sense layer is between 2×10 −8 J/cm 2 and 4×10 −8 J/cm 2 ;

the method comprising:

depositing the reference pinning layer, reference layer, tunnel barrier layer, sense layer, and sense pinning layer, wherein the sense pinning layer is configured such that the magnitude of the exchange-bias generated in the sense layer by the sense pinning layer is between 2×10 −8 J/cm 2 and 4×10 −8 J/cm 2 ;

annealing the magnetoresistive element with an applied external magnetic field at an annealing temperature higher than the first blocking temperature; and

annealing the magnetoresistive element in the absence of an applied external magnetic field at an annealing temperature higher than the second blocking temperature and lower than the first blocking temperature.

8. The method according to claim 7 ,

comprising forming the magnetoresistive element including depositing the reference pinning layer and depositing the sense pinning layer;

wherein the reference layer is deposited on the reference pinning layer and the sense layer is deposited on the sense pinning layer.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 18, 2024
From: CROCUS TECHNOLOGY SA
To: ALLEGRO MICROSYSTEMS, LLC
Reel/Frame 066350/0669 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 2, 2023
From: CHILDRESS, JEFFREY; STRELKOV, NIKITA; TIMOPHEEV, ANDREY
To: CROCUS TECHNOLOGY SA
Reel/Frame 063501/0535 →
Priority Claims (1)
EP 20315443 · Nov 3, 2020 · regional
Continuity (1)
Related Publication 20240019509A1 · Jan 18, 2024
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