Pillar structures
A chemical reactor implemented on a substrate is described. The chemical reactor includes at least one channel for transporting a liquid and/or gas during operation of the chemical reactor. The channel comprises pillar structures perpendicular to the bottom of the channel having a transverse section parallel to the bottom that is substantially rectangular and wherein the pillar structures are provided with a porous layer of substantially homogeneous thickness applied via electrochemical anodising.
1 . A chemical reactor implemented on a substrate, the chemical reactor comprising:
at least one channel for transporting a fluid during operation of the chemical reactor
wherein the channel includes an ordered set of pillar structures perpendicular to the bottom of the channel,
wherein the pillar structures have;
a transverse section parallel to the bottom that is substantially rectangular,
a width perpendicular to an average flow direction of the fluid in the channel,
a length along the average flow direction of the fluid in the channel, and
a width-to-length ratio greater than 2 to 1, and
wherein the pillar structures are provided with a porous layer of substantially homogeneous thickness applied via electrochemical anodizing, and
wherein the pillar structures are positioned such that a position of a sub-channel between two pillar structures in the average flow direction from a row does not correspond to a position of a sub-channel between two pillar structures in a subsequent row.
2 . A chemical reactor according to claim 1 , wherein a thickness of the porous layer on an outside of the pillar structures varies no more than 10%, along the perimeter of the pillar structures.
3 . A chemical reactor according to claim 1 , wherein the pillar structures are microfabricated pillar structures.
4 . A chemical reactor according to claim 1 , wherein the pillar structures are microfabricated silicon-based pillar structures.
5 . A chemical reactor according to claim 1 , wherein the length is greater than two times the thickness of the porous layer on the non-porous core of the pillar structures.
6 . A chemical reactor according to claim 5 , wherein the length of the pillar structures is at least three times the thickness of the porous layer on the non-porous core of the pillar structures.
7 . A chemical reactor according to claim 1 , wherein the porous layer is formed by removing material on the basis of an electric current applied through the core of the pillars.
8 . A chemical reactor according to claim 1 , wherein the porous layer is formed by growing the porous layer conformably with an outer circumference of the pillars.
9 . A chemical reactor according to claim 8 , wherein the porous layer is grown at a fixed speed, a speed that is equal at all times at all points on the surface of the pillars, or a fixed speed that is equal at all times at all points on the surface of the pillars.
10 . A chemical reactor according to claim 1 , wherein the chemical reactor comprises a chromatographic column.
11 . A chemical reactor according to claim 1 , wherein the chemical reactor is a chromatography system.
12 . A chemical reactor according to claim 11 , wherein the chromatography system is a high-performance liquid chromatography system.
13 . A method for producing a chemical reactor implemented on a substrate, the method comprising:
providing a substrate having at least one channel for transporting a fluid during operation of the chemical reactor, wherein the channel comprises pillar structures which are perpendicular to the bottom of the channel and which have a transverse section parallel to the bottom which is substantially rectangular, the pillar structures having a width perpendicular to an average flow direction of the fluid in the channel, a length along the average flow direction of the fluid in the channel, and a width-to-length ratio greater than 2 to 1, the pillar structures positioned such that a position of a sub-channel between two pillar structures in the average flow direction from a row does not correspond to a position of a sub-channel between two pillar structures in a subsequent row; and
of generating a porous layer of substantially uniform thickness on the pillar structures by electrochemical anodizing.
14 . The method of claim 13 , wherein generating the porous layer by electrochemical anodizing includes removing material based on an electric current applied through a core of the pillar structures.
15 . The method of claim 14 , wherein the electric current is applied orthogonally to an outer sheath of the pillars.