Methods of forming a staircase structure
Methods of improving adhesion between a photoresist and conductive or insulating structures. The method comprises forming a slot through at least a portion of alternating conductive structures and insulating structures on a substrate. Portions of the conductive structures or of the insulating structures are removed to form recesses in the conductive structures or in the insulating structures. A photoresist is formed over the alternating conductive structures and insulating structures and within the slot. Methods of improving adhesion between a photoresist and a spin-on dielectric material are also disclosed, as well as methods of forming a staircase structure.
1. A method of forming a staircase structure, comprising:
forming tiers of alternating conductive structures and insulating structures;
removing portions of the tiers to form a slot in a peripheral region of the alternating conductive structures and insulating structures, the slot extending vertically through the tiers in the peripheral region;
removing portions of one of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot without removing portions of another of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot; and
forming a fill material within the slot.
2. The method of claim 1 , wherein forming a fill material within the slot further comprises forming the fill material over the tiers.
3. The method of claim 1 , wherein removing portions of one of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot comprises forming substantially vertical sidewalls of the conductive structures in the peripheral region, the substantially vertical sidewalls of the conductive structures in the peripheral region not aligned with substantially vertical sidewalls of the insulating structures in the peripheral region.
4. The method of claim 1 , wherein removing portions of one of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot comprises forming substantially vertical sidewalls of the insulating structures in the peripheral region, the substantially vertical sidewalls of the insulating structures in the peripheral region not aligned with substantially vertical sidewalls of the conductive structures in the peripheral region.
5. The method of claim 1 , wherein forming a fill material within the slot comprises forming the fill material within the slot and between opposing sidewalls of the conductive structures and opposing sidewalls of the insulating structures.
6. A method of forming a staircase structure, comprising:
forming a slot in a peripheral region through tiers of alternating conductive structures and insulating structures in the peripheral region, the slot defined by sidewalls of the conductive structures and insulating structures and extending vertically through the tiers;
selectively removing portions of one of the conductive structures or the insulating structures in the peripheral region adjacent the slot to form recesses in the peripheral region laterally adjacent to the one of the conductive structures or the insulating structures in the peripheral region, respectively; and
at least partially filling the recesses and the slot with a fill material.
7. The method of claim 6 , wherein selectively removing portions of one of the conductive structures or the insulating structures in the peripheral region adjacent the slot to form recesses in the peripheral region comprises forming sidewalls of the one of the conductive structures or the insulating structures in the peripheral region not substantially aligned with sidewalls of an other of the conductive structures or the insulating structures in the peripheral region.
8. The method of claim 6 , wherein selectively removing portions of one of the conductive structures or the insulating structures in the peripheral region adjacent the slot to form recesses in the peripheral region laterally adjacent to the one of the conductive structures or the insulating structures in the peripheral region comprises forming the recesses in the conductive structures in the peripheral region laterally adjacent to the slot.
9. The method of claim 6 , wherein selectively removing portions of one of the conductive structures or the insulating structures in the peripheral region adjacent the slot to form recesses in the peripheral region laterally adjacent to the one of the conductive structures or the insulating structures in the peripheral region comprises forming the recesses in the insulating structures in the peripheral region laterally adjacent to the slot.
10. The method of claim 6 , further comprising repeatedly removing a portion of the fill material to form a mask and using the mask to remove a portion of the underlying conductive structures and insulating structures to form stairs of the staircase structure defined by the underlying conductive structures and insulating structures.
11. The method of claim 10 , wherein using the mask to remove a portion of the underlying conductive structures and insulating structures comprises defining contact regions of the stairs of the staircase structure.
12. The method of claim 11 , further comprising forming contact structures on the contact regions of the stairs of the staircase structure.
13. A method of forming a staircase structure, comprising:
forming a slot in a peripheral region through tiers of conductive structures and insulating structures in the peripheral region;
selectively removing portions of one of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot, a width of the one of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot less than a width of the other of the conductive structures or the insulating structures in the peripheral region laterally adjacent to the slot; and
forming a fill material in the slot in the peripheral region, a width of the fill material laterally adjacent to the one of the conductive structures or the insulating structures in the peripheral region greater than a width of the fill material laterally adjacent to the other of the conductive structures or the insulating structures in the peripheral region.
14. The method of claim 13 , wherein forming a slot in a peripheral region through tiers of conductive structures and insulating structures in the peripheral region comprises forming a length of the slot to be less than a length of the one of the conductive structures or the insulating structures in the peripheral region.
15. The method of claim 13 , wherein forming a fill material in the slot in the peripheral region comprises at least partially filling the slot with the fill material.
16. The method of claim 13 , wherein forming a fill material in the slot in the peripheral region comprises forming the fill material laterally adjacent to the one of the conductive structures or the insulating structures in the peripheral region at a width greater than a width of the fill material laterally adjacent to the other of the conductive structures or the insulating structures in the peripheral region.
17. The method of claim 13 , further comprising treating surfaces of at least one of the conductive structures or the insulating structures.
18. The method of claim 13 , further comprising forming inorganic spacers on surfaces of at least one of the conductive structures or the insulating structures.