Analog optical positioning sensor, method, and circuit
A sensor, method and integrated circuit for optically sensing the relative displacement of an object. The sensor may generate optical patterns of light and employ a multielement photodetector to detect the light and output corresponding analog signals proportional to the light detected. The sensor may achieve a sample rate that is orders of magnitude greater than conventional systems. The sensor may also achieve image resolution that is orders of magnitude greater than conventional systems. The sensor is useful for applications including the measurement of linear displacement and rotation, force, torque, or strain with respect to multiple degrees of freedom.
1. A sensor for measuring a relative displacement, the sensor comprising:
a pattern projector that generates a patterned light and is mechanically coupled to a first structure;
an image forming system that forms a focused image of the patterned light on a multielement photodetector;
the multielement photodetector that is coupled to a second structure, wherein the multielement photodetector comprises a plurality of photodetectors that generate respective analog input signals that are proportional to an amount of light received from the focused image that is incident on a respective photodetector; and
analog circuitry that outputs an analog signal that is proportional to the relative displacement of the first structure and the second structure by performing mathematical operations on the respective analog input signals of the plurality of photodetectors using analog circuit components.
2. The sensor of claim 1 , wherein a pattern of the patterned light is selected based on the respective analog input signals of the plurality of photodetectors.
3. The sensor of claim 2 , wherein the pattern is selected using a machine learning algorithm.
4. The sensor of claim 1 , wherein the plurality of photodetectors includes four or more photodetectors.
5. The sensor of claim 1 , wherein the relative displacement is measured with respect to six degrees of freedom.
6. The sensor of claim 1 , wherein the pattern projector comprises organic LEDs (OLEDs).
7. The sensor of claim 1 , wherein the plurality of photodetectors are arranged as concentric circles to form the multielement photodetector.
8. The sensor of claim 1 , wherein the pattern projector and the multielement photodetector are mechanically coupled via a transparent elastic member.
9. A method for determining a relative displacement of a first structure and a second structure, the method comprising:
generating, by a pattern projector, a patterned light, wherein the pattern projector is mechanically coupled to the first structure;
forming, by an image forming system, a focused image of the patterned light on a multielement photodetector, wherein the multielement photodetector that is coupled to the second structure,
generating, by a plurality of photodetectors that comprise the multielement photodetector, respective analog input signals that are proportional to an amount of light received from the focused image that is incident on a respective photodetector; and
performing, by analog circuitry, mathematical operations on the respective analog input signals of the plurality of photodetectors to generate an analog signal that is proportional to the relative displacement of the first structure and the second structure.
10. The method of claim 9 , wherein a pattern of the patterned light is selected based on the respective analog input signals of the plurality of photodetectors.
11. The method of claim 10 , wherein the pattern is selected using a machine learning algorithm.
12. The method of claim 9 , wherein the plurality of photodetectors includes four or more photodetectors.
13. The method of claim 9 , wherein the relative displacement is measured with respect to six degrees of freedom.
14. The method of claim 9 , wherein the pattern projector comprises organic LEDs (OLEDs).
15. The method of claim 9 , wherein the plurality of photodetectors are arranged as concentric circles to form the multielement photodetector.
16. The method of claim 9 , wherein the pattern projector and the multielement photodetector are mechanically coupled via a transparent elastic member.
17. An application specific integrated circuit (ASIC) for determining a relative displacement of a first structure and a second structure, wherein the ASIC is configured to execute a method comprising:
causing a pattern projector to generate a patterned light that is focused on a plurality of photodetectors that comprise a multielement photodetector, wherein the pattern projector is mechanically coupled to the first structure and the multielement photodetector that is coupled to the second structure;
performing, by analog circuitry, mathematical operations on respective analog input signals of the plurality of photodetectors, wherein the respective analog input signals are proportional to an amount of light received from the patterned light that is incident on a respective photodetector; and
generating an analog signal that is proportional to the relative displacement of the first structure and the second structure based on the mathematical operations.
18. The ASIC of claim 17 , wherein a pattern of the patterned light is selected based on the respective analog input signals of the plurality of photodetectors.
19. The ASIC of claim 17 , wherein the relative displacement is measured with respect to six degrees of freedom.
20. The ASIC of claim 17 , wherein the plurality of photodetectors are arranged as concentric circles to form the multielement photodetector.