IP Library Granted Patent US 12,289,039
Granted Patent B2
US 12,289,039 · App. 18/396,718 · Granted Apr 29, 2025

High-frequency power supply system

Inventors: Yuya Ueno (Osaka, JP); Yuichi Hasegawa (Osaka, JP)
Assignee: DAIHEN Corporation
H02M1/0003
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Quick Facts
Patent No.
US 12,289,039
App. No.
18/396,718
Granted
Apr 29, 2025
Kind
B2
Abstract

A high-frequency power supply system according to the present disclosure includes a first power supply, a second power supply, a first matcher, and a second matcher. The second power supply performs pulse modulation of repeating an ON operation of outputting a second forward wave voltage and an OFF operation of not outputting the second forward wave voltage. The first power supply performs frequency modulation control in a second power supply ON period, and performs frequency offset control of outputting a forward wave voltage having a fundamental frequency obtained by adding an offset frequency to a fundamental frequency in a second power supply OFF period.

Claims (10)

1. A high-frequency power supply system comprising:

a first power supply capable of outputting a first forward wave voltage having a first fundamental frequency;

a second power supply capable of outputting a second forward wave voltage having a second fundamental frequency lower than the first fundamental frequency;

a first matcher connected between the first power supply and a load, the first matcher performing a first matching operation of matching an impedance on a side of the first power supply to an impedance on a side of the load by adjusting a variable value of a variable element, the first matcher including the variable element; and

a second matcher connected between the second power supply and the load, the second matcher performing a second matching operation of matching an impedance of the second power supply to an impedance of the load by adjusting a variable value of a variable element, the second matcher including the variable element, wherein

the second power supply performs pulse modulation of repeating an ON operation of outputting the second forward wave voltage and an OFF operation of not outputting the second forward wave voltage,

the first matcher performs, in a second power supply ON period in which the ON operation is performed, the first matching operation using a reflection coefficient or the impedance on the side of the load calculated based on information detected in the second power supply ON period, and maintains, in a second power supply OFF period in which the OFF operation is performed, the variable value of the variable element adjusted by the first matching operation in the second power supply ON period without change, and

the first power supply performs frequency modulation control in the second power supply ON period, searches for an optimum value of an offset frequency in order to perform frequency offset control of outputting a third forward wave voltage having a third fundamental frequency obtained by adding the offset frequency to the first fundamental frequency in the second power supply OFF period, and performs the frequency offset control using the optimum value of the offset frequency obtained by the searching after the searching.

2. The high-frequency power supply system according to claim 1 , wherein

after the optimum value of the offset frequency is obtained by the searching, the first matcher performs the first matching operation in the second power supply ON period and the second power supply OFF period, based on load information calculated in the second power supply ON period and the second power supply OFF period.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 27, 2023
From: UENO, YUYA; HASEGAWA, YUICHI
To: DAIHEN CORPORATION
Reel/Frame 065957/0397 →
Priority Claims (1)
JP 2022-212630 · Dec 28, 2022 · national
Continuity (1)
Related Publication 20240223063A1 · Jul 4, 2024
References Cited (91)
US 9947514B2 · Radomski et al. · 2018 [cited by applicant]
US 10304669B1 · Coumou et al. · 2019 [cited by applicant]
US 11536755B2 · Fisk, II · 2022 [cited by examiner]
US 12148596B2 · Hasegawa · 2024 [cited by examiner]
US 20060151591A1 · Matsuno · 2006 [cited by applicant]
US 20070170997A1 · Matsuno · 2007 [cited by applicant]
US 20080129407A1 · Matsuno · 2008 [cited by applicant]
US 20130213573A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130213934A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214682A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214683A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20130214828A1 · Valcore, Jr. et al. · 2013 [cited by applicant]
US 20140009073A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140091875A1 · Shimomoto et al. · 2014 [cited by applicant]
US 20140167613A1 · Fong et al. · 2014 [cited by applicant]
US 20140172335A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140195033A1 · Lyndaker et al. · 2014 [cited by applicant]
US 20140210508A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214350A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214351A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140214395A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140265852A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140305589A1 · Valcore, Jr. et al. · 2014 [cited by applicant]
US 20140354173A1 · Matsuno · 2014 [cited by applicant]
US 20150048740A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150069912A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150091440A1 · Marakhtanov et al. · 2015 [cited by applicant]
US 20150091441A1 · Marakhtanov et al. · 2015 [cited by applicant]
US 20150122420A1 · Konno et al. · 2015 [cited by applicant]
US 20150214012A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20150244342A1 · Shimomoto et al. · 2015 [cited by applicant]
US 20150311041A1 · Valcore, Jr. et al. · 2015 [cited by applicant]
US 20160005573A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160044775A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160172162A1 · Fong et al. · 2016 [cited by applicant]
US 20160189937A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160233058A1 · Marakhtanov et al. · 2016 [cited by applicant]
US 20160240356A1 · Howald et al. · 2016 [cited by applicant]
US 20160259872A1 · Howald et al. · 2016 [cited by applicant]
US 20160268100A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160276137A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160307736A1 · Howald et al. · 2016 [cited by applicant]
US 20160307738A1 · Marakhtanov et al. · 2016 [cited by applicant]
US 20160308560A1 · Howald et al. · 2016 [cited by applicant]
US 20160322207A1 · Howald et al. · 2016 [cited by applicant]
US 20160336152A1 · Valcore, Jr. et al. · 2016 [cited by applicant]
US 20160343548A1 · Howald et al. · 2016 [cited by applicant]
US 20170032945A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170062187A1 · Radomski et al. · 2017 [cited by applicant]
US 20170084432A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170103872A1 · Howald et al. · 2017 [cited by applicant]
US 20170178864A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170178873A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20170194130A1 · Lyndaker et al. · 2017 [cited by applicant]
US 20170294293A1 · Howald et al. · 2017 [cited by applicant]
US 20170330732A1 · Valcore, Jr. et al. · 2017 [cited by applicant]
US 20180018418A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180033596A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180053632A1 · Fong et al. · 2018 [cited by applicant]
US 20180068834A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180294140A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20180323038A1 · Valcore, Jr. et al. · 2018 [cited by applicant]
US 20190057847A1 · Valcore, Jr. et al. · 2019 [cited by applicant]
US 20190214232A1 · Morii et al. · 2019 [cited by applicant]
US 20190272306A1 · Howald et al. · 2019 [cited by applicant]
US 20190288683A1 · Morii et al. · 2019 [cited by applicant]
US 20190318919A1 · Lyndaker et al. · 2019 [cited by applicant]
US 20200067545A1 · Howald et al. · 2020 [cited by applicant]
US 20200074034A1 · Valcore, Jr. et al. · 2020 [cited by applicant]
US 20200211824A1 · Morii · 2020 [cited by applicant]
US 20200212869A1 · Morii · 2020 [cited by applicant]
US 20200212893A1 · Morii · 2020 [cited by applicant]
US 20200218774A1 · Howald et al. · 2020 [cited by applicant]
US 20200243304A1 · Valcore, Jr. et al. · 2020 [cited by applicant]
US 20200412364A1 · Morii et al. · 2020 [cited by applicant]
US 20210281235A1 · Morii · 2021 [cited by applicant]
US 20220208519A1 · Hasegawa et al. · 2022 [cited by applicant]
US 20220277934A1 · Valcore, Jr. et al. · 2022 [cited by applicant]
JP 3183914B2 · 2001 [cited by applicant]
JP 4975291B2 · 2012 [cited by applicant]
JP 6084417B2 · 2017 [cited by applicant]
JP 6177012B2 · 2017 [cited by applicant]
JP 2017188434A · 2017 [cited by applicant]
JP 6312405B2 · 2018 [cited by applicant]
JP 2018536295A · 2018 [cited by applicant]
JP 6773283B2 · 2020 [cited by applicant]
JP 6898338B2 · 2021 [cited by applicant]
JP 2022102688A · 2022 [cited by applicant]
JP 7105184B2 · 2022 [cited by applicant]
JP 7105185B2 · 2022 [cited by applicant]
JP 7112952B2 · 2022 [cited by applicant]
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