RESIN COMPOSITION FOR NON-CONDUCTIVE FILM WITH EXCELLENT HIGH TEMPERATURE PROPERTIES FOR 3D TSV PACKAGES
The disclosure relates to compositions for forming films and the use of said films in three-dimension through-silicon-via (3D TSV) packages. In certain aspects, the disclosure relates to compositions comprising one or more resins, one or more imidazoles with latent thermal activity, one or more inorganic fillers, and one or more additives, to B-stage films prepared from the disclosed compositions, and to cured films obtained after cure of the disclosed compositions.
1 . A composition comprising:
one or more resins selected from the group consisting of maleimide-containing resins, nadimide-containing resins, itaconimide-containing resins, epoxy resins, (meth)acrylate-containing resins, and phenolic-containing resins,
one or more imidazoles with latent thermal activity,
one or more inorganic fillers, and
one or more additives selected from the group consisting of adhesion promoters and film formers,
wherein:
after the composition forms a film, the film has the following physical properties:
a Tg of >200° C. as measured by dynamic mechanical analysis (DMA),
a storage modulus at 25° C. of <6.5 GPa,
a storage modulus at 250° C.>0.1 GPa, and
a coefficient of thermal expansion (CTE)<250 ppm/ºC.
2 . The composition of claim 1 , wherein, after the composition forms a film, the film has the following physical properties:
a Tg of >230° C. as measured by dynamic mechanical analysis (DMA),
a storage modulus at 25° C. of <5 GPa,
a storage modulus at 230° C.>0.3 GPa, and
a coefficient of thermal expansion (CTE)<120 ppm/ºC.
3 . The composition of claim 1 , wherein the imidazole with latent activity is an imidazole comprising at least two electron withdrawing groups.
4 . The composition of claim 1 , wherein the imidazole is a substituted imidazole comprising an electron-withdrawing group on the 2-position and comprises a substituent on the 4-position, a substituent on the 5-position, and/or a substituent on the nitrogen at the 1-position.
5 . The composition of claim 1 , wherein the imidazole comprises at least two electron-withdrawing groups independently selected from organic groups that reduce electron density on the imidazole ring and/or attenuate the reactivity of the imidazole.
6 . The composition of claim 1 , wherein the imidazole comprises at least two electron-withdrawing groups independently selected from the group consisting of substituted or unsubstituted aryl groups, cyano (—CN), halide (—X), —CHO, —COOH, —NR 1 R 2 , wherein each of R 1 and R 2 is independently a hydrogen atom or a substituted or unsubstituted alkyl group, alkyl groups substituted with one or more groups independently selected from cyano (—CN), halide (—X)—CHO, —COOH, and —NR 1 R 2 , wherein each of R 1 and R 2 is independent selected from a hydrogen atom or a substituted or unsubstituted alkyl group, and oxygen-containing groups.
7 . The composition of claim 1 , wherein the imidazole comprises at least two electron-withdrawing groups independently selected from hydroxymethyl and phenyl.
8 . The composition of claim 1 , wherein the imidazole is represented by
wherein:
R 1 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
R 2 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
R 3 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, and
R 4 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
provided that the imidazole comprises at least two electron withdrawing groups.
9 . The composition of claim 8 , wherein R 2 is selected from the group consisting of C 1-6 alkyl and C 6 aryl.
10 . The composition of claim 1 , wherein the maleimide-containing resin is a compound represented by
wherein:
each R is independently selected from the group consisting of H and substituted or unsubstituted alkyl;
each m is independently selected from the group consisting of 0, 1, 2, 3, or 4; and
n is 0, 1, 2, 3, 4, or 5, or is a compound represented by
wherein n is 0, 1, 2, 3, 4, or 5.
11 . The composition of claim 1 , wherein the (meth)acrylate resin is represented by
wherein n is 0, 1, 2, 3, 4, or 5.
12 . The composition of claim 1 , wherein the epoxy resin is a compound represented by
wherein n is 0, 1, 2, 3, 4, or 5, and m is 0, 1, 2, 3, 4, or 5.
13 . The composition of claim 1 , wherein, after the composition forms a film, the film has the following physical properties:
a differential scanning calorimetry (DSC) onset temperature from 130° C. to 250° C. as measured by DSC with a 10° C./min ramping rate, and
a minimum film melt viscosity from 10 Pa·s to 10,000 Pa·s as measured using a DHR2 rheometer with a 10° C./min ramping rate in N 2 .
14 . The composition of claim 1 , wherein, after the composition forms a film, the film has the following physical properties:
a differential scanning calorimetry (DSC) onset temperature from 150° C. to 190° C. as measured by DSC with a 10° C./min ramping rate, and
a minimum film melt viscosity from 400 Pa·s to 7,000 Pa·s as measured using a DHR2 rheometer with a 10° C./min ramping rate in N 2 .
15 . The composition of claim 1 , wherein, after the composition forms a film, the film has a ΔT from the DSC onset temperature to the DSC peak temperature that is less than 20° C. or less than 15° C.
16 . The composition of claim 1 , wherein, after the composition forms a film, the film has a ΔT from the DSC onset temperature to the DSC peak temperature that is less than 10° C. or less than 5° C.
17 . A method of preparing a cured film, the method comprising
providing a composition according to claim 1 ;
casting the composition into a film; and
exposing the cast film to elevated temperature to cure the film.
18 . A method of preparing a cured film, the method comprising
providing a composition comprising
one or more resins selected from the group consisting of maleimide-containing resins, nadimide-containing resins, itaconimide-containing resins, epoxy resins, (meth)acrylate-containing resins, and phenolic-containing resins,
one or more imidazoles with latent thermal activity,
one or more inorganic fillers, and
one or more additives selected from the group consisting of adhesion promoters and film formers;
casting the composition into a film; and
exposing the cast film to elevated temperature to cure the film.
19 . The method according to claim 18 , wherein the one or more imidazoles with latent thermal activity is one or more imidazoles comprising at least two electron withdrawing groups.
20 . The method according to claim 18 , wherein the one or more imidazoles is represented by
wherein:
R 1 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
R 2 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl,
R 3 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, and
R 4 is selected from the group consisting of H, substituted or unsubstituted alkyl, substituted or unsubstituted alkenyl, substituted or unsubstituted alkynyl, substituted or unsubstituted aryl, and substituted or unsubstituted heteroaryl, provided that the imidazole comprises at least two electron withdrawing groups.
21 . The method according to claim 18 , wherein R 2 is selected from the group consisting of C 1 -6 alkyl and C 6 aryl.
22 . The method according to claim 18 , wherein the maleimide-containing resin is a compound represented by
wherein:
each R is independent selected from the group consisting of H and substituted or unsubstituted alkyl;
each m is independent selected from the group consisting of 0, 1, 2, 3, or 4; and
n is 0, 1, 2, 3, 4, or 5, or is a compound represented by
wherein n is 0, 1, 2, 3, 4, or 5.
23 . The method according to claim 18 , wherein the (meth)acrylate resin is represented by
wherein n is 0, 1, 2, 3, 4, or 5.
24 . The method according to claim 18 , wherein the epoxy resin is a compound represented by
wherein n is 0, 1, 2, 3, 4, or 5, and m is 0, 1, 2, 3, 4, or 5.
25 . A cured film prepared according to the method of claim 18 .
26 . A film prepared according to the method of claim 18 , wherein the film has the following physical properties:
a Tg of >200° C. as measured by dynamic mechanical analysis (DMA),
a storage modulus at 25° C. of <6.5 GPa,
a storage modulus at 250° C.>0.1 GPa, and
a coefficient of thermal expansion (CTE)<250 ppm/° C.
27 . A film prepared according to the method of claim 18 , wherein the film has the following physical properties:
a Tg of >230° C. as measured by dynamic mechanical analysis (DMA),
a storage modulus at 25° C. of <5 GPa,
a storage modulus at 230° C.>0.3 GPa, and
a coefficient of thermal expansion (CTE)<120 ppm/° C.
28 . The film of claim 25 , wherein the film is an underfill film.
29 . The film of claim 25 , wherein the film is a wafer-level underfill film (WAUF).