Chamber port assembly
Methods and apparatus for a substrate processing system includes a chamber port assembly configured to connect between respective first and second chambers of a substrate processing system. The chamber port assembly includes a body with openings disposed on opposing sides of the body and a tunnel extending between the openings to facilitate passage of a substrate between the first and second chambers through the tunnel; an inlet port in the body; a manifold in fluid communication with the inlet port and having an outlet in fluid communication with the tunnel; and a sensor port in the body in communication with the tunnel.
1 . A chamber port assembly configured to connect between respective first and second chambers of a substrate processing system, the chamber port assembly comprising:
a body with openings disposed on opposing sides of the body and a tunnel extending between the openings to facilitate passage of a substrate between the first and second chambers through the tunnel;
an inlet port in the body;
a manifold in fluid communication with the inlet port and having an outlet in fluid communication with the tunnel;
a sensor port in the body in communication with the tunnel; and
a slit valve coupled to the body, the slit valve configured to selectively close the tunnel, the slit valve located in the tunnel between the openings of the body, wherein the slit valve is spaced from the openings of the body.
2 . The chamber port assembly of claim 1 , further comprising:
another inlet port in the body; and
another manifold in fluid communication with the another inlet port and having another outlet in fluid communication with the tunnel.
3 . The chamber port assembly of claim 1 , further comprising a sensor coupled to the sensor port, the sensor configured to sense at least one condition proximate to the tunnel.
4 . The chamber port assembly of claim 3 , wherein the sensor is at least one of a residual gas analyzer or a particle detector.
5 . The chamber port assembly of claim 3 , wherein the sensor is configured to detect and analyze residual gases and particles while purge gas is provided into the chamber port assembly via the manifold.
6 . The chamber port assembly of claim 3 , wherein the sensor is at least one of a temperature sensor, or an image sensor.
7 . The chamber port assembly of claim 1 , wherein the outlet of the manifold is configured to direct fluid towards one of the opposing sides of the body.
8 . The chamber port assembly of claim 1 , wherein the manifold includes a plurality of outlets that are equally spaced.
9 . The chamber port assembly of claim 1 , wherein the manifold includes a plurality of outlets that are not equally spaced.
10 . A substrate processing system, comprising:
a first chamber;
a second chamber; and
the chamber port assembly of claim 1 connected between the first chamber and the second chamber.
11 . The substrate processing system of claim 10 , further comprising a remote plasma source connected to the inlet port of the chamber port assembly.
12 . The substrate processing system of claim 10 , further comprising a sensor coupled to the sensor port, the sensor configured to sense at least one condition proximate to the tunnel.
13 . The substrate processing system of claim 12 , further comprising a controller configured to receive sensor data associated with the at least one condition and regulate, based at least on the sensor data, fluid flow through the inlet port.
14 . A method for a substrate processing system, the method comprising:
flowing a fluid through an inlet port in a body of a chamber port assembly configured to connect between a first and a second chamber of the substrate processing system, the chamber port assembly comprising:
a body with openings disposed on opposing sides of the body and a tunnel extending between the openings to facilitate passage of a substrate between the first and second chambers through the tunnel; and
a slit valve coupled to the body, the slit valve configured to selectively close the tunnel, the slit valve located in the tunnel between the openings of the body, wherein the slit valve is spaced from the openings of the body;
distributing the fluid into the tunnel through a manifold connected to the inlet port, the manifold having an outlet in fluid communication with the tunnel; and
sensing, through a sensor port in the body, at least one condition proximate the tunnel as the fluid is distributed into the tunnel.
15 . The method of claim 14 , wherein the sensing includes detecting and analyzing residual gases and particles from a substrate passing through the tunnel.
16 . The method of claim 14 , wherein sensing includes capturing images of a substrate as the substrate passes through the tunnel.
17 . The method of claim 14 , wherein sensing includes sensing a temperature of a substrate passing through the tunnel.
18 . The method of claim 14 , wherein the fluid includes at least one of a gas or a plasma.
19 . The method of claim 14 , further comprising regulating a flow of the fluid based on the at least one sensed condition.