IP Library Granted Patent US 12,597,872
Granted Patent B2
US 12,597,872 · App. 18/443,441 · Granted Apr 7, 2026

Electrostatic chuck and method of manufacturing the same

Inventors: Shunya Miyazaki (Fukuoka, JP); Jun Shiraishi (Fukuoka, JP); Yutaka Momiyama (Fukuoka, JP); Ikuo Itakura (Fukuoka, JP)
Assignee: TOTO LTD.
H02N13/00C23C16/458
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,597,872
App. No.
18/443,441
Granted
Apr 7, 2026
Kind
B2
Abstract

An electrostatic chuck includes: a dielectric substrate on which at least one first gas hole is formed; a base plate on which at least one second gas hole is formed; and a joining layer which is provided between the dielectric substrate and the base plate and which is formed of an insulating material. A first opening being an end of the at least one first gas hole is formed on a surface of the dielectric substrate. A second opening being an end of the at least one second gas hole is formed at a position which differs from the at least one first opening on a surface of the base plate. A communication groove is formed on the surface of the base plate.

Claims (54)

1 . An electrostatic chuck, comprising:

a dielectric substrate on which at least one first gas hole is formed;

a base plate on which at least one second gas hole is formed; and

a joining layer which is provided between the dielectric substrate and the base plate and which is formed of an insulating material, wherein

at least one first opening being an end of the at least one first gas hole is formed on a surface of the dielectric substrate on a side of the joining layer,

at least one second opening being an end of the at least one second gas hole is formed at a position which differs from the at least one first opening on a surface of the base plate on a side of the joining layer,

a communication groove which communicates the at least one first opening and the at least one second opening with each other is formed on the surface of the base plate on the side of the joining layer, and

an insulator film provided on an inner surface of the communication groove of the base plate.

2 . The electrostatic chuck according to claim 1 , wherein the at least one first opening comprises a plurality of first openings, the at least one second opening comprises a plurality of second openings, and the at least one second opening is communicated with the plurality of first openings via the communication groove.

3 . The electrostatic chuck according to claim 1 , wherein the insulator film is a film formed by spraying.

4 . The electrostatic chuck according to claim 1 , wherein the joining layer is a layer created by curing a solid adhesive sheet.

5 . A method of manufacturing an electrostatic chuck, comprising the steps of:

preparing a dielectric substrate on which at least one first gas hole and at least one first opening being an end of the at least one first gas hole are formed;

preparing a base plate on which at least one second gas hole and a communication groove which connects to at least one second opening being an end of the at least one second gas hole are formed;

forming an insulating film on an inner surface of the communication groove of the base plate;

preparing a solid adhesive sheet which is an insulating member;

causing a surface of the dielectric substrate on which the at least one first opening is formed and a surface of the base plate on which the at least one second opening is formed to oppose each other so that the at least one first opening and the at least one second opening at mutually different positions are communicated with each other by the communication groove and sandwiching the adhesive sheet between the dielectric substrate and the base plate; and

curing the adhesive sheet.

6 . An electrostatic chuck, comprising:

a dielectric substrate on which at least one first gas hole is formed;

a base plate on which at least one second gas hole is formed; and

a joining layer which is provided between the dielectric substrate and the base plate and which is formed of an insulating material, wherein

at least one first opening being an end of the at least one first gas hole is formed on a surface of the dielectric substrate on a side of the joining layer,

at least one second opening being an end of the at least one second gas hole is formed at a position which differs from the at least one first opening on a surface of the base plate on a side of joining layer,

a communication groove which communicates the at least one first opening and the at least one second opening with each other is formed on the surface of the dielectric substrate on the side of the joining layer, and

an insulator film provided on the surface of the base plate on the side of the joining layer that faces the communication groove.

7 . The electrostatic chuck according to claim 6 , wherein the at least one first opening comprises a plurality of first openings, the at least one second opening comprises a plurality of second openings, and the at least one second opening is communicated with the plurality of first openings via the communication groove.

8 . The electrostatic chuck according to claim 6 , wherein the insulator film is a film formed by spraying.

9 . The electrostatic chuck according to claim 6 , wherein the joining layer is a layer created by curing a solid adhesive sheet.

10 . A method of manufacturing an electrostatic chuck, comprising the steps of:

preparing a dielectric substrate on which at least one first gas hole and a communication groove which connects to at least one first opening being an end of the at least one first gas hole are formed;

preparing a base plate on which at least one second gas hole and at least one second opening being an end of the at least one second gas hole are formed;

forming an insulator film on a surface of the base plate on the side of the joining layer that faces the communication groove;

preparing a solid adhesive sheet which is an insulating member;

causing a surface of the dielectric substrate on which the at least one first opening is formed and a surface of the base plate on which the at least one second opening is formed to oppose each other so that the at least one first opening and the at least one second opening at mutually different positions are communicated with each other by the communication groove and sandwiching the adhesive sheet between the dielectric substrate and the base plate; and

curing the adhesive sheet.

11 . An electrostatic chuck, comprising:

a dielectric substrate on which at least one first gas hole is formed;

a base plate on which at least one second gas hole is formed; and

a joining layer which is provided between the dielectric substrate and the base plate and which is formed of an insulating material, wherein

at least one first opening being an end of the at least one first gas hole is formed on a surface of the dielectric substrate on a side of the joining layer,

at least one second opening being an end of the at least one second gas hole is formed at a position which differs from the at least one first opening on a surface of the base plate on a side of the joining layer,

a communication path which communicates the at least one first opening and the at least one second opening with each other is formed on the joining layer, and

an insulator film provided on the surface of the base plate on the side of the joining layer.

12 . The electrostatic chuck according to claim 11 , wherein the at least one first opening comprises a plurality of first openings, the at least one second opening comprises a plurality of second openings, and the at least one second opening is communicated with the plurality of first openings via the communication path.

13 . The electrostatic chuck according to claim 11 , wherein the insulator film is a film formed by spraying.

14 . The electrostatic chuck according to claim 11 , wherein the joining layer is a layer created by curing a solid adhesive sheet on which the communication path has been formed in advance.

15 . A method of manufacturing an electrostatic chuck, comprising the steps of:

preparing a dielectric substrate on which at least one first gas hole is formed;

preparing a base plate on which at least one second gas hole is formed;

forming an insulator film on the surface of the base plate on the side of the joining layer;

preparing a solid adhesive sheet which is an insulating member and on which a communication path has been formed in advance;

causing a surface of the dielectric substrate on which at least one first opening being an end of the at least one first gas hole is formed and a surface of the base plate on which at least one second opening being an end of the at least one second gas hole is formed to oppose each other and sandwiching the adhesive sheet between the dielectric substrate and the base plate so that the at least one first opening and the at least one second opening at mutually different positions are communicated with each other by the communication path; and

curing the adhesive sheet.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 13, 2024
From: MIYAZAKI, SHUNYA; SHIRAISHI, JUN; MOMIYAMA, YUTAKA; ITAKURA, IKUO
To: TOTO LTD.
Reel/Frame 067723/0214 →
Priority Claims (3)
JP 2023-025982 · Feb 22, 2023 · national
JP 2023-025984 · Feb 22, 2023 · national
JP 2023-025986 · Feb 22, 2023 · national
Continuity (1)
Related Publication 20240283379A1 · Aug 22, 2024
References Cited (30)
US 6494955B1 · Lei et al. · 2002 [cited by applicant]
US 6639783B1 · Shamouilian · 2003 [cited by examiner]
US 8525418B2 · Morita · 2013 [cited by examiner]
US 10512125B2 · Kitagawa · 2019 [cited by examiner]
US 10832931B2 · Mangalore et al. · 2020 [cited by applicant]
US 11201076B2 · Hayahara · 2021 [cited by examiner]
US 11728145B2 · Satake · 2023 [cited by examiner]
US 20050105243A1 · Lee · 2005 [cited by examiner]
US 20060076108A1 · Holland et al. · 2006 [cited by applicant]
US 20100002355A1 · Morooka · 2010 [cited by applicant]
US 20130021717A1 · Singh · 2013 [cited by applicant]
US 20130308244A1 · Shiraiwa · 2013 [cited by examiner]
US 20200243355A1 · Makabe · 2020 [cited by applicant]
US 20210272834A1 · Takayama · 2021 [cited by applicant]
JP H06112302A · 1994 [cited by applicant]
JP H09148420A · 1997 [cited by applicant]
JP 2002093894A · 2002 [cited by applicant]
JP 2004006505A · 2004 [cited by applicant]
JP 2005203426A · 2005 [cited by applicant]
JP 2007035878A · 2007 [cited by applicant]
JP 2010016363A · 2010 [cited by applicant]
JP 2014522103A · 2014 [cited by applicant]
JP 2018107313A · 2018 [cited by applicant]
JP 2020120081A · 2020 [cited by applicant]
JP 2021141116A · 2021 [cited by applicant]
JP 2022048089A · 2022 [cited by applicant]
JP 2022176701A · 2022 [cited by applicant]
KR 1020060052119A · 2006 [cited by applicant]
KR 1020110099974A · 2011 [cited by applicant]
KR 1020170015382A · 2017 [cited by applicant]