Image sensor
An image sensor includes a semiconductor layer including a first section and a second section, the semiconductor layer having a first surface and a second surface that face each other, a device isolation layer in the semiconductor layer and defining a plurality of pixels; a first grid pattern on the first surface of the semiconductor layer over the first section; and a light-shield pattern on the first surface of the semiconductor layer over the second section. A top surface of the first grid pattern is located at a first level, a top surface of the light-shield pattern is located at a second level, the first level is lower than the second level, and the first and second levels are defined with respect to the first surface of the semiconductor layer.
1. An image sensor, comprising:
a semiconductor layer including a first section and a second section around the first section, the semiconductor layer having a first surface and a second surface that face each other;
a device isolation layer in the semiconductor layer and defining a plurality of pixels;
a grid pattern on the first surface of the semiconductor layer and over the first section of the semiconductor layer, the grid pattern including at least two layers comprising a metal layer and an organic material layer;
a light-shield pattern on the first surface of the semiconductor layer and over the second section of the semiconductor layer; and
a color filter on the first surface of the semiconductor layer;
wherein the organic material layer is disposed on the metal layer and on the light-shield pattern, and
wherein the organic material layer on the light-shield pattern at least partially covers a lateral surface and a top surface of the light-shield pattern, and extends along the lateral surface and the top surface of the light-shield pattern.
2. The image sensor of claim 1 , wherein a thickness of the grid pattern is greater than a thickness of the light-shield pattern.
3. The image sensor of claim 1 , wherein a thickness of the metal layer is less than a thickness of the light-shield pattern.
4. The image sensor of claim 1 , wherein the metal layer includes Ti and the light-shield pattern includes W.
5. The image sensor of claim 1 , wherein a refractive index of the organic material layer is less than 1.4.
6. The image sensor of claim 1 , further comprising:
an anti-reflection layer on the first surface of the semiconductor layer and on the device isolation layer and the plurality of pixels,
wherein the grid pattern, the light-shield pattern and the color filter are on the anti-reflection layer, and
wherein the anti-reflection layer includes at least one of a hafnium oxide layer and an aluminum oxide layer.
7. The image sensor of claim 1 , wherein the semiconductor layer further includes a pad section including a plurality of pads for interconnecting the image sensor with an external device,
wherein the metal layer of the grid pattern is electrically connected to at least one of the pads via the light-shielding pattern and a connection line disposed on the second surface of the semiconductor layer.
8. The image sensor of claim 1 , wherein the pixels comprise:
a plurality of first pixels in the first section of the semiconductor layer; and
a plurality of second pixels in the second section of the semiconductor layer,
the image sensor further comprising a plurality of first photoelectric conversion devices in the first pixels, and a plurality of second photoelectric conversion devices in the second pixels,
wherein the grid pattern is vertically overlapped with the device isolation layer, and the light-shield pattern vertically overlapped with the second photoelectric conversion devices.
9. The image sensor of claim 1 , wherein the metal layer covers the lateral surface of the light-shield pattern and is sandwiched between the lateral surface of the light-shield pattern and the organic material layer.
10. An image sensor, comprising:
a semiconductor layer including a first section and a second section around the first section, the semiconductor layer having a first surface and a second surface that face each other;
a device isolation layer in the semiconductor layer and defining a plurality of pixels;
an anti-reflection layer on the first surface of the semiconductor layer and on the device isolation layer and the plurality of pixels;
a grid pattern on the anti-reflection layer over the first section, the grid pattern including at least two layers comprising a metal layer and an organic material layer; and
a light-shield pattern on the anti-reflection layer over the second section,
wherein the organic material layer is disposed on the metal layer and on the light-shield pattern, and
wherein the organic material layer on the light-shield pattern at least partially covers a lateral surface and a top surface of the light-shield pattern, and extends along the lateral surface and the top surface of the light-shield pattern.
11. The image sensor of claim 10 , wherein a thickness of the grid pattern is greater than a thickness of the light-shield pattern.
12. The image sensor of claim 11 , wherein a thickness of the metal layer is less than the thickness of the light-shield pattern.
13. The image sensor of claim 12 , wherein a thickness of the organic material layer is greater than the thickness of the metal layer.
14. The image sensor of claim 10 , wherein the metal layer includes Ti and the light-shield pattern includes W.
15. The image sensor of claim 10 , further comprising a color filter on the grid pattern,
wherein the organic material layer has a refractive index lower than that of the color filter.
16. The image sensor of claim 15 , wherein the refractive index of the organic material layer is less than 1.4.
17. The image sensor of claim 10 , wherein the metal layer covers the lateral surface of the light-shield pattern and is sandwiched between the lateral surface of the light-shield pattern and the organic material layer.
18. An image sensor, comprising:
a semiconductor layer including a first section and a second section around the first section, the semiconductor layer having a first surface and a second surface that face each other;
a device isolation layer in the semiconductor layer and defining a plurality of pixels;
a grid pattern on the first surface of the semiconductor layer over the first section and on the device isolation layer, the grid pattern including at least two layers comprising a metal layer and an organic material layer; and
a light-shield pattern on the first surface of the semiconductor layer over the second section,
wherein the organic material layer is disposed on the metal layer and on the light-shield pattern, and
wherein the organic material layer on the light-shield pattern at least partially covers a lateral surface and a top surface of the light-shield pattern, and extends along the lateral surface and the top surface of the light-shield pattern.
19. The image sensor of claim 18 , further comprising a color filter on the first surface of the semiconductor layer over the first section and on the grid pattern.
20. The image sensor of claim 18 , wherein a thickness of the grid pattern is greater than a thickness of the light-shield pattern.