IP Library Granted Patent US 12,324,180
Granted Patent B2
US 12,324,180 · App. 18/471,263 · Granted Jun 3, 2025

Integrated design for III-Nitride devices

Inventors: Yifeng Wu (Goleta, CA); John Kirk Gritters (Santa Barbara, CA)
Assignee: Transphorm Technology, Inc.
H10D30/475H01L23/481H10D62/8503
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Quick Facts
Patent No.
US 12,324,180
App. No.
18/471,263
Granted
Jun 3, 2025
Kind
B2
Abstract

A semiconductor device comprises a III-N device and a Field Effect Transistor (FET). The III-N device comprises a substrate on a first side of a III-N material structure, a first gate, a first source, and a first drain on a side of the III-N material structure opposite the substrate. The FET comprises a second semiconductor material structure, a second gate, a second source, and a second drain, and the second source being on an opposite side of the second semiconductor material structure from the second drain. The second drain of the FET is directly contacting and electrically connected to the first source of the III-N devices, and a via-hole is formed through a portion of the III-N material structure exposing a portion of the top surface of the substrate and the first gate is electrically connected to the substrate through the via-hole.

Claims (19)

1. An electronic component, comprising:

an enhancement-mode transistor;

a depletion-mode transistor comprising a conductive substrate; and

a package comprising a conductive structural package base, the package enclosing both the enhancement-mode transistor and the depletion-mode transistor; wherein

a drain electrode of the depletion-mode transistor is electrically connected to a drain lead of the package, a gate electrode of the enhancement-mode transistor is electrically connected to a gate lead of the package, a source electrode of the enhancement-mode transistor is electrically connected to the conductive structural package base; wherein

a gate electrode of the depletion-mode transistor is electrically connected to the conductive substrate by a conductive via, wherein the conductive substrate is directly contacting and electrically connected to the conductive structural package base, and the conductive structural package base is electrically connected to a source lead of the package.

2. The electronic component of claim 1 , wherein the gate electrode of the depletion-mode transistor is electrically connected to the source lead of the package without an external gate wire connector.

3. The electronic component of claim 1 , wherein the depletion-mode transistor comprises a III-N material structure on the conductive substrate.

4. The electronic component of claim 3 , wherein the gate electrode of the depletion-mode transistor is on an opposite side of the III-N material structure from the conductive substrate, and the conductive via extends through the III-N material structure to the conductive substrate.

5. The electronic component of claim 4 , wherein the conductive via is outside of an active region of the depletion-mode transistor.

6. The electronic component of claim 1 , wherein a drain electrode of the enhancement-mode transistor directly contacts and is electrically connected to a source electrode of the depletion-mode transistor, and the enhancement-mode transistor is at least partially over an active region of the depletion-mode transistor.

7. The electronic component of claim 6 , wherein the source electrode of the enhancement-mode transistor is coupled to the gate electrode of the depletion-mode transistor through the conductive substrate.

8. The electronic component of claim 6 , wherein the enhancement-mode transistor has a lower breakdown voltage than the depletion-mode transistor.

9. The electronic component of claim 3 , wherein the III-N material structure comprises a III-N buffer layer, a III-N channel layer, and a III-N barrier layer, wherein the buffer layer is doped with iron, magnesium, or carbon.

10. The electronic component of claim 9 , wherein a compositional difference between the III-N barrier layer and the III-N channel layer causes a lateral 2DEG channel to be induced in the III-N channel layer.

11. The electronic component of claim 9 , wherein the bandgap of the III-N barrier layer is greater than the bandgap of the III-N channel layer.

12. The electronic component of claim 4 , comprising an insulator layer of the depletion-mode transistor formed over the III-N material structure, a source pad of the depletion-mode transistor formed on the insulator layer, and wherein a top surface of the gate electrode of the depletion mode transistor is lower than a bottom surface of the source pad of the depletion mode transistor.

13. The electronic component of claim 12 , wherein a portion of the insulator layer is between the gate electrode and the III-N material structure.

14. The electronic component of claim 12 , wherein the gate electrode extends across a width of a 2DEG channel in the III-N material structure, and the conductive via is positioned to a side of the 2DEG channel such that the 2DEG channel is continuous between the source electrode and the drain electrode.

Assignments (3)
SECURITY INTEREST Recorded Mar 1, 2024
From: TRANSPHORM TECHNOLOGY, INC.; TRANSPHORM, INC.
To: RENESAS ELECTRONICS AMERICA INC.
Reel/Frame 066713/0531 →
MERGER AND CHANGE OF NAME Recorded Oct 10, 2023
From: TRANSPHORM INC.; TRANSPHORM TECHNOLOGY, INC.
To: TRANSPHORM TECHNOLOGY, INC.
Reel/Frame 066039/0225 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 10, 2023
From: WU, YIFENG; GRITTERS, JOHN KIRK
To: TRANSPHORM INC.
Reel/Frame 065173/0009 →
Continuity (3)
Continuation 17047602
Provisional Application 62821946 · Mar 21, 2019
Related Publication 20240014312A1 · Jan 11, 2024
References Cited (231)
US 6476431B1 · Ohno et al. · 2002 [cited by applicant]
US 6825559B2 · Mishra et al. · 2004 [cited by applicant]
US 7291872B2 · Hikita et al. · 2007 [cited by applicant]
US 7339207B2 · Murata et al. · 2008 [cited by applicant]
US 7795642B2 · Suh et al. · 2010 [cited by applicant]
US 7825435B2 · Machida et al. · 2010 [cited by applicant]
US 7838907B2 · Shiraishi · 2010 [cited by applicant]
US 7851825B2 · Suh et al. · 2010 [cited by applicant]
US 7875907B2 · Honea et al. · 2011 [cited by applicant]
US 7884394B2 · Wu et al. · 2011 [cited by applicant]
US 7898004B2 · Wu et al. · 2011 [cited by applicant]
US 7915643B2 · Suh et al. · 2011 [cited by applicant]
US 7915645B2 · Briere · 2011 [cited by applicant]
US 7939391B2 · Suh et al. · 2011 [cited by applicant]
US 7965126B2 · Honea et al. · 2011 [cited by applicant]
US 7972915B2 · Chen et al. · 2011 [cited by applicant]
US 7982242B2 · Goto · 2011 [cited by applicant]
US 8003975B2 · Ueda et al. · 2011 [cited by applicant]
US 8138529B2 · Wu · 2012 [cited by applicant]
US 8178898B2 · Ikeda et al. · 2012 [cited by applicant]
US 8193562B2 · Suh et al. · 2012 [cited by applicant]
US 8237198B2 · Wu et al. · 2012 [cited by applicant]
US 8289065B2 · Honea et al. · 2012 [cited by applicant]
US 8344424B2 · Suh et al. · 2013 [cited by applicant]
US 8389977B2 · Chu et al. · 2013 [cited by applicant]
US 8390000B2 · Chu et al. · 2013 [cited by applicant]
US 8431965B2 · Takemae · 2013 [cited by applicant]
US 8455931B2 · Wu · 2013 [cited by applicant]
US 8493129B2 · Honea et al. · 2013 [cited by applicant]
US 8508281B2 · Honea et al. · 2013 [cited by applicant]
US 8519438B2 · Mishra et al. · 2013 [cited by applicant]
US 8530996B2 · Shono · 2013 [cited by applicant]
US 8531232B2 · Honea et al. · 2013 [cited by applicant]
US 8536622B2 · Takemae et al. · 2013 [cited by applicant]
US 8541815B2 · Takemae et al. · 2013 [cited by applicant]
US 8541818B2 · Wu et al. · 2013 [cited by applicant]
US 8569124B2 · Akiyama et al. · 2013 [cited by applicant]
US 8581300B2 · Yamada · 2013 [cited by applicant]
US 8592974B2 · Wu · 2013 [cited by applicant]
US 8598937B2 · Lal et al. · 2013 [cited by applicant]
US 8603880B2 · Yamada · 2013 [cited by applicant]
US 8614464B2 · Jeon et al. · 2013 [cited by applicant]
US 8624662B2 · Parikh et al. · 2014 [cited by applicant]
US 8633517B2 · Kamada · 2014 [cited by applicant]
US 8633518B2 · Suh et al. · 2014 [cited by applicant]
US 8643062B2 · Parikh et al. · 2014 [cited by applicant]
US 8648643B2 · Wu · 2014 [cited by applicant]
US 8664927B2 · Shono · 2014 [cited by applicant]
US 8675326B2 · Shono · 2014 [cited by applicant]
US 8692294B2 · Chu et al. · 2014 [cited by applicant]
US 8716141B2 · Dora et al. · 2014 [cited by applicant]
US 8742459B2 · Mishra et al. · 2014 [cited by applicant]
US 8742460B2 · Mishra et al. · 2014 [cited by applicant]
US 8766711B2 · Takemae · 2014 [cited by applicant]
US 8772842B2 · Dora · 2014 [cited by applicant]
US 8773176B2 · Miyazaki et al. · 2014 [cited by applicant]
US 8786327B2 · Honea et al. · 2014 [cited by applicant]
US 8803246B2 · Wu et al. · 2014 [cited by applicant]
US 8816497B2 · Wu · 2014 [cited by applicant]
US 8816751B2 · Honea et al. · 2014 [cited by applicant]
US 8836301B2 · Shono · 2014 [cited by applicant]
US 8836308B2 · Shono · 2014 [cited by applicant]
US 8836380B2 · Takemae · 2014 [cited by applicant]
US 8841702B2 · Mishra et al. · 2014 [cited by applicant]
US 8847283B2 · Kamada et al. · 2014 [cited by applicant]
US 8853742B2 · Yoshioka et al. · 2014 [cited by applicant]
US 8860495B2 · Lal et al. · 2014 [cited by applicant]
US 8878248B2 · Ishiguro et al. · 2014 [cited by applicant]
US 8878571B2 · Takemae · 2014 [cited by applicant]
US 8883581B2 · Ohki · 2014 [cited by applicant]
US 8890206B2 · Yamada · 2014 [cited by applicant]
US 8890314B2 · Wu · 2014 [cited by applicant]
US 8895421B2 · Parikh et al. · 2014 [cited by applicant]
US 8895423B2 · Dora · 2014 [cited by applicant]
US 8901604B2 · Mishra et al. · 2014 [cited by applicant]
US 8912839B2 · Honea et al. · 2014 [cited by applicant]
US 8933489B2 · Kikkawa · 2015 [cited by applicant]
US 8952750B2 · Wu · 2015 [cited by applicant]
US 8957453B2 · Yamada et al. · 2015 [cited by applicant]
US 8962409B2 · Tomabechi · 2015 [cited by applicant]
US 8987833B2 · McDonald · 2015 [cited by examiner]
US 9006787B2 · Yamada · 2015 [cited by applicant]
US 9035356B2 · Yamada · 2015 [cited by applicant]
US 9041067B2 · Briere · 2015 [cited by examiner]
US 9041435B2 · Honea et al. · 2015 [cited by applicant]
US 9041465B2 · Bouisse · 2015 [cited by applicant]
US 9053964B2 · Jeon et al. · 2015 [cited by applicant]
US 9059076B2 · Wu et al. · 2015 [cited by applicant]
US 9059136B2 · Kamada et al. · 2015 [cited by applicant]
US 9087718B2 · Lal · 2015 [cited by applicant]
US 9087812B2 · Briere · 2015 [cited by applicant]
US 9093366B2 · Mishra et al. · 2015 [cited by applicant]
US 9099351B2 · Nishimori et al. · 2015 [cited by applicant]
US 9099545B2 · Akiyama et al. · 2015 [cited by applicant]
US 9099564B2 · Saito · 2015 [cited by applicant]
US 9111961B2 · Chu et al. · 2015 [cited by applicant]
US 9136107B2 · Katani et al. · 2015 [cited by applicant]
US 9142550B2 · Prechtl et al. · 2015 [cited by applicant]
US 9142638B2 · Yamada · 2015 [cited by applicant]
US 9142658B2 · Kikkawa et al. · 2015 [cited by applicant]
US 9147760B2 · Mishra et al. · 2015 [cited by applicant]
US 9165766B2 · Keller et al. · 2015 [cited by applicant]
US 9171730B2 · Chowdhury et al. · 2015 [cited by applicant]
US 9171836B2 · Lal et al. · 2015 [cited by applicant]
US 9171910B2 · Wu et al. · 2015 [cited by applicant]
US 9184243B2 · Briere · 2015 [cited by examiner]
US 9184275B2 · Mishra et al. · 2015 [cited by applicant]
US 9190295B2 · Wu · 2015 [cited by applicant]
US 9196716B2 · Mishra et al. · 2015 [cited by applicant]
US 9209176B2 · Wu et al. · 2015 [cited by applicant]
US 9224671B2 · Parikh et al. · 2015 [cited by applicant]
US 9224721B2 · Wu · 2015 [cited by applicant]
US 9224805B2 · Mishra et al. · 2015 [cited by applicant]
US 9231075B2 · Yamada · 2016 [cited by applicant]
US 9244848B2 · Boyd et al. · 2016 [cited by applicant]
US 9245992B2 · Keller et al. · 2016 [cited by applicant]
US 9245993B2 · Keller et al. · 2016 [cited by applicant]
US 9257424B2 · Hirler · 2016 [cited by applicant]
US 9257547B2 · Fichtenbaum et al. · 2016 [cited by applicant]
US 9293458B2 · Parikh et al. · 2016 [cited by applicant]
US 9293561B2 · Mishra et al. · 2016 [cited by applicant]
US 9299822B2 · Kikkawa · 2016 [cited by applicant]
US 9318593B2 · Wu et al. · 2016 [cited by applicant]
US 9343440B2 · McDonald · 2016 [cited by examiner]
US 9343560B2 · Suh et al. · 2016 [cited by applicant]
US 9349805B2 · Ito et al. · 2016 [cited by applicant]
US 9356017B1 · Siemieniec et al. · 2016 [cited by applicant]
US 9362903B2 · Wu et al. · 2016 [cited by applicant]
US 9373699B2 · Chu et al. · 2016 [cited by applicant]
US 9397089B2 · Pan et al. · 2016 [cited by applicant]
US 9401341B2 · Wu · 2016 [cited by applicant]
US 9406674B2 · Briere · 2016 [cited by applicant]
US 9425268B2 · Minoura et al. · 2016 [cited by applicant]
US 9437707B2 · Mishra et al. · 2016 [cited by applicant]
US 9437708B2 · Mishra et al. · 2016 [cited by applicant]
US 9443849B2 · Wu et al. · 2016 [cited by applicant]
US 9443938B2 · Mishra et al. · 2016 [cited by applicant]
US 9490324B2 · Mishra et al. · 2016 [cited by applicant]
US 9496137B2 · Chu et al. · 2016 [cited by applicant]
US 9502401B2 · Léomant · 2016 [cited by examiner]
US 9520491B2 · Chowdhury et al. · 2016 [cited by applicant]
US 9536803B2 · Sheridan · 2017 [cited by examiner]
US 9536966B2 · Ogino · 2017 [cited by applicant]
US 9536967B2 · Kikkawa et al. · 2017 [cited by applicant]
US 9537425B2 · Honea · 2017 [cited by applicant]
US 9543940B2 · Wang et al. · 2017 [cited by applicant]
US 9590060B2 · Lal · 2017 [cited by applicant]
US 9590494B1 · Zhou et al. · 2017 [cited by applicant]
US 9607876B2 · Lidow et al. · 2017 [cited by applicant]
US 9620616B2 · Yamada et al. · 2017 [cited by applicant]
US 9634100B2 · Mishra et al. · 2017 [cited by applicant]
US 9640648B2 · Kikkawa · 2017 [cited by applicant]
US 9654004B1 · Deligianni et al. · 2017 [cited by applicant]
US 9660640B2 · Wang et al. · 2017 [cited by applicant]
US 9685323B2 · Keller et al. · 2017 [cited by applicant]
US 9685338B2 · Minoura et al. · 2017 [cited by applicant]
US 9690314B2 · Honea et al. · 2017 [cited by applicant]
US 9735095B2 · Padmanabhan · 2017 [cited by examiner]
US 9741702B2 · Wu · 2017 [cited by examiner]
US 9818686B2 · Wu et al. · 2017 [cited by applicant]
US 9818840B2 · Kikkawa · 2017 [cited by applicant]
US 9831315B2 · Chu et al. · 2017 [cited by applicant]
US 9842922B2 · Mishra et al. · 2017 [cited by applicant]
US 9847394B2 · Prechtl et al. · 2017 [cited by applicant]
US 9865719B2 · Keller et al. · 2018 [cited by applicant]
US 9899998B2 · Honea et al. · 2018 [cited by applicant]
US 9935190B2 · Wu et al. · 2018 [cited by applicant]
US 9941399B2 · Mishra et al. · 2018 [cited by applicant]
US 9991373B1 · Birner et al. · 2018 [cited by applicant]
US 9991884B2 · Wang · 2018 [cited by examiner]
US 10043896B2 · Mishra et al. · 2018 [cited by applicant]
US 10043898B2 · Lal · 2018 [cited by applicant]
US 10063138B1 · Zhou et al. · 2018 [cited by applicant]
US 10680069B2 · Haeberlen et al. · 2020 [cited by applicant]
US 10991722B2 · Lee et al. · 2021 [cited by applicant]
US 11088688B2 · Pala · 2021 [cited by applicant]
US 20120223321A1 · Lin et al. · 2012 [cited by applicant]
US 20120256190A1 · McDonald · 2012 [cited by examiner]
US 20130009165A1 · Park et al. · 2013 [cited by applicant]
US 20130088280A1 · Lal et al. · 2013 [cited by applicant]
US 20130321082A1 · Yamada · 2013 [cited by applicant]
US 20140042452A1 · Pendharkar et al. · 2014 [cited by applicant]
US 20140225162A1 · Briere · 2014 [cited by applicant]
US 20140264431A1 · Lal · 2014 [cited by applicant]
US 20150162326A1 · Lin et al. · 2015 [cited by applicant]
US 20160064313A1 · Denison et al. · 2016 [cited by applicant]
US 20160079223A1 · Wu · 2016 [cited by applicant]
US 20190296112A1 · Yoshimochi · 2019 [cited by examiner]
US 20200135766A1 · Dutta et al. · 2020 [cited by applicant]
JP 2015056564 · 2015 [cited by applicant]
TW 201603239 · 2016 [cited by applicant]
TW 201714307 · 2017 [cited by applicant]
TW 201909423 · 2019 [cited by applicant]
Office Action in Japanese Appln. No. 2021-556408, dated Feb. 6, 2024, 8 pages (with English translation). [cited by applicant]
Barr et al., “High Voltage GaN Switch Reliability,” WIPDA Conference, Atlanta, GA, Nov. 2018, 7 pages. [cited by applicant]
Chu et al., “1200-V Normally Off GaN-on-Si Field-effect Transistors with Low Dynamic On-Resistance,” IEEE Electron Device Letters, 2011, 32(5):632-634. [cited by applicant]
Coffie et al., “Unpassivated p-GaN/AlGaN/GaN HEMTs with 7.1 W/mm at 10 GhZ,” Electronic Letters, 2003, 39(19):1419-1420. [cited by applicant]
Coffie, “Characterizing and Suppressing DC-to-RF Dispersion in AlGaN/GaN High Electron Mobility Transistors,” 2003, PhD Thesis, University of California, Santa Barbara, 169 pages. [cited by applicant]
Dora et al., “High Breakdown Voltage Achieved on AlGaN/GaN HEMTs with Integrated Slant Field Plates,” IEEE Electron Device Letters, 2006, 27(9):713-715. [cited by applicant]
Dora et al., “ZrO2 Gate Dielectrics Produced by Ultraviolet Ozone Oxidation for GaN and AlGaN/GaN Transistors,” J. Vac. Sci. Technol. B, 2006, 24(2)575-581. [cited by applicant]
Dora, “Understanding Material and Process Limits for High Breakdown Voltage AlGaN/GaN HEMTs,” PhD Thesis, University of California, Santa Barbara, Mar. 2006, 157 pages. [cited by applicant]
Extended European Search Report in European Appln. No. 20774117.4, dated May 8, 2023, 11 pages. [cited by applicant]
Huang and Cuadra, “Preventing GaN Device VHF Oscillation,” APEC 2017 Industry Session, Mar. 2017, 25 pages. [cited by applicant]
Keller et al., “GaN—GaN Junctions with Ultrathin AlN Interlayers: Expanding Heterojunction Design,” Applied Physics Letters, 2002, 80(23):4387-4389. [cited by applicant]
Mishra et al., “AlGaN/GaN HEMTs—An Overview of Device Operation and Applications,” Proceedings of the IEEE, 2002, 90(6):1022-1031. [cited by applicant]
Office Action in Taiwanese Appln. No. 109109618, dated Jul. 13, 2023, 11 pages (with English Search Report). [cited by applicant]
Parikh et al., “650 Volt GaN Commercialization Reaches Automotive Standards,” ECS Transactions, 2017, 80(7):17-28. [cited by applicant]
Parikh et al., “Commercialization of High 600V GaN-on-Silicon Power HEMTs and Diodes,” 2013 IEEE, 5 pages. [cited by applicant]
Parikh, “Driving the Adoption of High-voltage Gallium Nitride Filed-effect Transistors,” IEEE Power Electronics Magazine, Sep. 2017, 3 pages. [cited by applicant]
Shen, “Advanced Polarization-based Design of AlGaN/GaN HEMTs,” Jun. 2004, PhD Thesis, University of California, Santa Barbara, 192 pages. [cited by applicant]
Smith and Barr, “Reliability Lifecycle of GaN Power Devices,” Transphorm Inc., Mar. 2017, 8 pages. [cited by applicant]
Suh et al. “High-Breakdown Enhancement-mode AlGaN/GaN HEMTs with Integrated Slant Field-Plate,” Electron Devices Meeting, 2006, IEDM '06 International, 3 pages. [cited by applicant]
Wang et al., “Investigation of Driver Circuits for GaN HEMTs in Leaded Packages,” Workshop on Wide Bandgap Power Devices and Applications (WiPDA), 2014 IEEE, pp. 81-87. [cited by applicant]
Wang et al., “Paralleling GaN HEMTs for Diode-free Bridge Power Converters,” 2015 IEEE Applied Power Electronics Conference and Exposition (APEC), Charlotte, NC, 2015, pp. 752-758. [cited by applicant]
Wang, et al., “Design and Implementation of a High-efficiency Three-level Inverter Using GaN HEMTs,” PCIM Europe 2015, May 19-21, 2015, Nuremberg, Germany, 7 pages. [cited by applicant]
Wu et al., “A 97.8% Efficient GaN HEMT Boost Converter with 300-W Output Power at 1 MHz,” Electronic Device Letters, 2008, IEEE, 29(8):824-826. [cited by applicant]
Wu et al., “Advances in Reliability and Operation Space of High-voltage GaN Power Devices on Si Substrates,” (2014) IEEE, 3 pages. [cited by applicant]
Wu et al., “High-frequency, GaN Diode-free Motor Drive Inverter with Pure Sine Wave Output,” PCIM Europe 2012, Conference Digest, pp. 40-43. [cited by applicant]
Wu et al., “kV-Class GaN-on-Si HEMTs Enabling 99% Efficiency Converter at 800 V and 100 kHz,” IEEE Transactions on Power Electronics, 2014, 29(6):2634-2637. [cited by applicant]
Wu et al., “Total GaN Solution to Electrical Power Conversion,” the 69th IEEE Device Research Conference, Conference Digest, Jun. 20-22, 2011, pp. 217-218. [cited by applicant]
Wu, “AlGaN/GaN Microwave Power High-Mobility Transistors,” PhD Thesis, University of California, Santa Barbara, Jul. 1997, 134 pages. [cited by applicant]
Wu, “Paralleling High-speed GaN Power HEMTs for Quadrupled Power Output,” Applied Power Electronics Conference and Exposition (APEC), 2013, pp. 211-214. [cited by applicant]
Xu et al., “Investigation of 600 V GaN HEMTs for High Efficiency and High Temperature Applications,” Applied Power Electronics Conference and Exposition (APEC), Apr. 2014, pp. 131-136. [cited by applicant]
Zhang et al., “Common-mode Circulating Current Control of Paralleled Interleaved Three phase Two-level Voltage-source Converters with Discontinuous Space-vector Modulation,” IEEE Transactions on Power Electronics, Dec. … [cited by applicant]
Zhang et al., “Evaluation of 600 V Cascode GaN HEMT in Device Characterization and All-GaN-based LLC Resonant Converter,” In Proc. Energy Conversion Congress and Exposition (ECCE), Sep. 2013 IEEE, pp. 3571-3578. [cited by applicant]
Zhang et al., “Gate Drive Design Considerations for High Voltage Cascode GaN HEMT,” Applied Power Electronics Conference and Exposition (APEC), Mar. 2014, pp. 1484-1489. [cited by applicant]
Zhang et al., “Impact of Interleaving on AC Passive Components of Paralleled Three phase Voltage-source Converters,” IEEE Transactions on Industry Applications, May/Jun. 2010, 46(3):1042-1054. [cited by applicant]
Zhang, “High Voltage GaN HEMTs with Low On-resistance for Switching Applications,” PhD Thesis, University of California, Santa Barbara, Sep. 2002, 166 pages. [cited by applicant]
Zhou and Wu, “99% Efficiency True-bridgeless Totem-pole PFC Based on GaN HEMTs,” PCIM Europe May 14-16, 2013, pp. 1017-1022. [cited by applicant]
Zhou et al., “High-efficiency True Bridgeless Totem Pole PFC Based on GaN HEMTs: Design Challenges and Cost-effective Solution,” PCIM Europe 2015, pp. 1482-1489. [cited by applicant]
Zuk and Campeau, “How to Design with GaN in 1 Hour!,” APEC 2017 Exhibitor Session, Mar. 2017, 24 pages. [cited by applicant]