Robust image-to-design alignment for dram
Methods and systems for alignment for semiconductor applications are provided. One method includes determining different align-to-design offsets for multiple instances of an alignment target formed on a specimen by separately aligning images of the multiple instances of the alignment target generated by an imaging subsystem to a rendered image for the alignment target with different alignment methods, respectively. The method also includes identifying the multiple instances having a difference between the different align-to-design offsets below a predetermined threshold. In addition, the method includes determining a runtime align-to-design offset for the alignment target from the different align-to-design offsets determined for only the identified multiple instances. That runtime align-to-design offset can then be used in a process performed on the specimen with an imaging subsystem.
1. A system configured for determining an offset for use in a process performed on a specimen, comprising:
an imaging subsystem configured for generating images of a specimen; and
a computer subsystem configured for:
determining first and second align-to-design offsets for multiple instances of an alignment target by separately aligning images of the multiple instances of the alignment target formed on the specimen and generated by the imaging subsystem to a rendered image for the alignment target with first and second alignment methods, respectively;
identifying the multiple instances having a difference between the first and second align-to-design offsets below a predetermined threshold;
determining a runtime align-to-design offset for the alignment target from the first and second align-to-design offsets determined for only the identified multiple instances; and
storing the runtime align-to-design offset for use in a process performed on the specimen with the imaging subsystem.
2. The system of claim 1 , wherein determining the runtime align-to-design offset comprises clustering the first and second align-to-design offsets.
3. The system of claim 1 , wherein one of the first and second alignment methods comprises normalized cross correlation.
4. The system of claim 1 , wherein one of the first and second alignment methods comprises projection-based normalized cross correlation.
5. The system of claim 1 , wherein the predetermined threshold is defined in pixels.
6. The system of claim 1 , wherein the process comprises generating runtime alignment target images for the multiple instances of the alignment target with the imaging subsystem, and wherein during the process the computer subsystem is further configured for determining first and second runtime-to-setup offsets for the multiple instances of the alignment target by separately aligning the runtime alignment target images to a setup alignment target image with the first and second alignment methods, respectively, identifying a subset of the multiple instances having a difference between the first and second runtime-to-setup offsets below an additional predetermined threshold, determining a final runtime-to-setup offset for the alignment target from the first and second runtime-to-setup offsets determined for only the identified subset of the multiple instances, and determining a runtime-to-design offset based on the final runtime-to-setup offset and the runtime align-to-design offset.
7. The system of claim 6 , wherein determining the final runtime-to-setup offset comprises clustering the first and second runtime-to-setup offsets.
8. The system of claim 6 , wherein the additional predetermined threshold is defined in pixels.
9. The system of claim 6 , wherein during the process the computer subsystem is further configured for identifying care areas in images of the specimen generated by the imaging subsystem during the process based on the runtime-to-design offset.
10. The system of claim 6 , wherein the computer subsystem is further configured for storing one or more of the images of the multiple instances of the alignment target for use as the setup alignment target image.
11. The system of claim 1 , wherein the multiple instances of the alignment target are formed in a dynamic random access memory device portion of the specimen.
12. The system of claim 1 , wherein the multiple instances of the alignment target are formed in a conjunction block of a memory device area formed on the specimen.
13. The system of claim 1 , wherein the multiple instances of the alignment target are formed in a boundary region between a sense amplifier block and a bulk cell block of a memory device area formed on the specimen.
14. The system of claim 1 , wherein the multiple instances of the alignment target are formed in a boundary region between a sub-wordline driver block and a bulk cell block of a memory device area formed on the specimen.
15. The system of claim 1 , wherein the computer subsystem is further configured for generating the rendered image for the alignment target from a design for the specimen.
16. The system of claim 1 , wherein the process is an inspection process.
17. The system of claim 1 , wherein the imaging subsystem is a light-based imaging subsystem.
18. The system of claim 1 , wherein the imaging subsystem is an electron beam imaging subsystem.
19. A non-transitory computer-readable medium, storing program instructions executable on a computer system for performing a computer-implemented method for determining an offset for use in a process performed on a specimen, wherein the computer-implemented method comprises:
determining first and second align-to-design offsets for multiple instances of an alignment target formed on a specimen by separately aligning images of the multiple instances of the alignment target generated by an imaging subsystem to a rendered image for the alignment target with first and second alignment methods, respectively;
identifying the multiple instances having a difference between the first and second align-to-design offsets below a predetermined threshold;
determining a runtime align-to-design offset for the alignment target from the first and second align-to-design offsets determined for only the identified multiple instances; and
storing the runtime align-to-design offset for use in a process performed on the specimen with the imaging subsystem.
20. A computer-implemented method for determining an offset for use in a process performed on a specimen, comprising:
determining first and second align-to-design offsets for multiple instances of an alignment target formed on a specimen by separately aligning images of the multiple instances of the alignment target generated by an imaging subsystem to a rendered image for the alignment target with first and second alignment methods, respectively;
identifying the multiple instances having a difference between the first and second align-to-design offsets below a predetermined threshold;
determining a runtime align-to-design offset for the alignment target from the first and second align-to-design offsets determined for only the identified multiple instances; and
storing the runtime align-to-design offset for use in a process performed on the specimen with the imaging subsystem, wherein determining the first and second align-to-design offsets, identifying the multiple instances, determining the runtime align-to-design offset, and storing the runtime align-to-design offset are performed by a computer system.