Exposure apparatus, control method of exposure apparatus, information processing apparatus, information processing method, and article manufacturing method

1. An apparatus comprising:

an optical system configured to project a pattern of an original onto a substrate;

an adjustment unit configured to adjust imaging characteristics of the projection optical system; and

a control unit configured to predict, using a prediction formula, fluctuation of the imaging characteristics caused by the optical system absorbing exposure energy, and control the adjustment unit based on a result of the prediction,

wherein

the control unit is configured to

measure, in a period spanning a plurality of lots, the imaging characteristics, after completion of setting of an exposure condition for a next lot, at a timing before exposure of a leading substrate in the lot and a timing before exposure of a subsequent predetermined substrate, and

decide a prediction coefficient in the prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots,

the prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots, and

the control unit is configured to decide the term of the polynomial function such that a fitting residual falls within an allowable range.

2. The apparatus according to claim 1 , wherein

the control unit decides the prediction coefficient in the prediction formula each time the measurement is performed.

3. The apparatus according to claim 1 , wherein

the imaging characteristics include at least one of magnification, focus, distortion, field curvature, and astigmatism.

4. The apparatus according to claim 1 , wherein

the control unit controls the adjustment unit so as to cancel the predicted fluctuation of the imaging characteristics.

5. The apparatus according to claim 1 , wherein

the measurement is aerial image measurement.

6. A control method of an apparatus that performs a process of exposing a substrate via an optical system while predicting, using a prediction formula, fluctuation of imaging characteristics of the optical system caused by the optical system absorbing exposure energy, and adjusting the imaging characteristics of the optical system based a result of the prediction, the method comprising:

measuring, in a period spanning a plurality of lots, the imaging characteristics, after completion of setting of an exposure condition for a next lot, at a timing before exposure of a leading substrate in the lot and a timing before exposure of a subsequent predetermined substrate, and

deciding a prediction coefficient in the prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots,

wherein

the prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots, and

in the deciding, the term of the polynomial function is decided such that a fitting residual falls within an allowable range.

7. The method according to claim 6 , wherein

the deciding is performed each time the measuring is performed.

8. The method according to claim 6 , wherein

the characteristics include at least one of magnification, focus, distortion, field curvature, and astigmatism.

9. The method according to claim 6 , wherein

the characteristics are adjusted so as to cancel the predicted fluctuation of the characteristics.

10. The method according to claim 6 , wherein

the measurement is aerial image measurement.

11. An apparatus comprising

a processing unit configured to predict, using a prediction formula, fluctuation of characteristics caused by an optical system, which is configured to project a pattern of an original onto a substrate, absorbing exposure energy,

wherein

the processing unit is configured to

measure, in a period spanning a plurality of lots, the imaging characteristics, after completion of setting of an exposure condition for a next lot, at a timing before exposure of a leading substrate in the lot and a timing before exposure of a subsequent predetermined substrate, and

decide a prediction coefficient in the prediction formula to fit the prediction formula to measurement data obtained by the measurement in the period spanning the plurality of lots,

the prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots, and

the processing unit decides the term of the polynomial function such that a fitting residual falls within an allowable range.

12. The apparatus according to claim 11 , wherein the processing unit decides the prediction coefficient in the prediction formula each time the measurement is performed.

13. The apparatus according to claim 11 , wherein the imaging characteristics include at least one of magnification, focus, distortion, field curvature, and astigmatism.

14. A method of predicting, using a prediction formula, fluctuation of imaging characteristics of an optical system caused by the optical system absorbing exposure energy, the method comprising:

acquiring, in a period spanning a plurality of lots, data concerning the imaging characteristics, after completion of setting of an exposure condition for a next lot, at a timing before exposure of a leading substrate in the lot and a timing before exposure of a subsequent predetermined substrate, and

deciding a prediction coefficient in the prediction formula to fit the prediction formula to the data concerning the imaging characteristics acquired in the acquiring in the period spanning the plurality of lots,

wherein

the prediction formula is a polynomial function including a term representing a change in measurement value of the imaging characteristics caused by changing at least one of an illumination mode and an original between lots, and

in the deciding, the term of the polynomial function is decided such that a fitting residual falls within an allowable range.

15. The method according to claim 14 , wherein the predicting decides the prediction coefficient in the prediction formula each time the measurement is performed.

16. The method according to claim 14 , wherein the imaging characteristics include at least one of magnification, focus, distortion, field curvature, and astigmatism.

17. A method comprising:

acquiring, in a period spanning a plurality of lots, data concerning characteristics of an optical system, which is caused by the optical system absorbing exposure energy, after completion of setting of an exposure condition for a next lot, at a timing before exposure of a leading substrate in the lot and a timing before exposure of a subsequent predetermined substrate;

deciding a prediction coefficient in a prediction formula to fit the prediction formula, which is used to predict fluctuation of the imaging characteristics, to the data concerning the imaging characteristics acquired in the acquiring in the period spanning the plurality of lots;

predicting the fluctuation of the imaging characteristics using the prediction formula;

exposing a substrate via the optical system while adjusting the imaging characteristics based on a prediction result in the predicting; and

developing the substrate exposed in the exposing,

wherein an article is manufactured from the substrate developed in the developing.

18. The method according to claim 17 , wherein the predicting decides the prediction coefficient in the prediction formula each time the measurement is performed.

19. The method according to claim 17 , wherein the imaging characteristics include at least one of magnification, focus, distortion, field curvature, and astigmatism.