IP Library › Granted Patent US 12,546,022
Granted Patent B2
US 12,546,022 · App. 18/484,937 · Granted Feb 10, 2026

Film, film forming method, and surface-coated material

Inventors: Koji Wada (Kobe, JP); Haruyuki Nakanishi (Nagoya, JP)
Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHA
C25D9/04C25D5/003C25D7/12C25D11/00C25D11/34C25D17/002C25D17/10H01M4/32H01M4/48H01M4/662
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Quick Facts
Patent No.
US 12,546,022
App. No.
18/484,937
Granted
Feb 10, 2026
Kind
B2
Abstract

A film that contains Ni 2 O 3 H as a main component.

Claims (4)

1 . A film consisting of Ni 2 O 3 H, wherein the film has a thickness from 100 nm and 200 nm.

2 . A surface-coated material comprising:

the film according to claim 1 ; and

a Ni material in which at least a part of a surface is coated with the film.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2023
From: WADA, KOJI; NAKANISHI, HARUYUKI
To: TOYOTA JIDOSHA KABUSHIKI KAISHA
Reel/Frame 065187/0091 →
Priority Claims (1)
JP 2020-151421 · Sep 9, 2020 · national
Continuity (2)
Division 17467681 · Sep 7, 2021
Related Publication 20240044033A1 · Feb 8, 2024
References Cited (7)
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JP 2000323139A · 2000 [cited by applicant]
JP 2011233423A · 2011 [cited by applicant]
JP 2019046644A · 2019 [cited by applicant]
Chu et al, A.H. Chu et al.2020 IOP Conf. Ser.: Earth Environ. Sci. 508 012192 (Year: 2020). [cited by applicant]
Meier et al, Journal of Applied Electrochemistry 10 (1980) pp. 611-621) (Year: 1980). [cited by applicant]
Olivier Guiader and Patrick Bernard 2018 J. Electrochem. Soc. 165 A396 (Year: 2018). [cited by applicant]