SHIELDED APPARATUS FOR ION ENERGY ANALYSIS OF PLASMA PROCESSES
An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising a substrate, a plurality of ion energy sensors each having associated control circuitry disposed in the substrate, and a conductive enclosure disposed in the substrate and surrounding each ion energy sensor and associated control circuitry such that the substrate at least partially surrounds the conductive enclosure.
1 . An apparatus for obtaining ion energy distribution measurements in a plasma processing system comprising:
a substrate;
a plurality of ion energy sensors each having associated control circuitry disposed in the substrate; and
a conductive enclosure disposed in the substrate and surrounding each ion energy sensor and associated control circuitry such that the substrate at least partially surrounds the conductive enclosure.
2 . The apparatus of claim 1 , wherein the substrate is non-conductive.
3 . The apparatus of claim 1 , wherein the substrate is conductive.
4 . The apparatus of claim 3 , further comprising an insulating layer between the substrate and the conductive enclosure.
5 . The apparatus of claim 1 , wherein the substrate is semi-conducting.
6 . The apparatus of claim 5 , wherein the substrate is silicon.
7 . The apparatus of claim 5 , further comprising a semi-conducting cover on a surface of the substrate.
8 . The apparatus of claim 7 , wherein the semi-conducting cover is silicon or Germanium.
9 . The apparatus of claim 7 , wherein the ion energy sensors measure energy distribution at a first surface of the substrate and a cover is provided at a second surface of the substrate opposite to the first surface.
10 . The apparatus of claim 2 , further comprising an RF antenna disposed in the substrate outside of the conductive enclosure.
11 . The apparatus of claim 10 , wherein the RF antenna is connected to the control circuitry.
12 . The apparatus of claim 10 , wherein the RF antenna is disposed in the non-conductive substrate.
13 . The apparatus of claim 12 , wherein each ion energy sensor and associated control circuitry are provided on a circuit board.