IP Library Granted Patent US 12,360,183
Granted Patent B2
US 12,360,183 · App. 18/551,098 · Granted Jul 15, 2025

Magnetoresistive element and magnetic sensor device having a high sensitivity and low zero-field offset-shift

Inventors: Jeffrey Childress (San Jose, CA); Andrey Timopheev (Vif, FR)
Assignee: Allegro MicroSystems, LLC
G01R33/098
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,360,183
App. No.
18/551,098
Granted
Jul 15, 2025
Kind
B2
Abstract

A magnetoresistive element has a tunnel barrier layer included between a ferromagnetic reference layer having a fixed reference magnetization and a ferromagnetic sense layer having a free sense magnetization. The sense magnetization has a ferromagnetic material composition and a stable vortex configuration in the absence of an applied magnetic field. The ferromagnetic material composition varies across the thickness of the sense layer from a composition with higher magnetization near the tunnel barrier layer to a composition with lower magnetization away from the tunnel barrier layer, such that the sense magnetization and ferromagnetic exchange strength of the sense layer are higher near the tunnel barrier layer than away from the tunnel barrier layer.

Claims (22)

1. A magnetoresistive element comprising a tunnel barrier layer included between a ferromagnetic reference layer having a fixed reference magnetization and a ferromagnetic sense layer having a free sense magnetization;

the sense layer comprising a ferromagnetic material composition and a stable vortex configuration in the absence of an applied magnetic field;

the ferromagnetic material composition varies across the thickness of the sense layer from a composition with higher magnetization near the tunnel barrier layer to a composition with lower magnetization away from the tunnel barrier layer, such that the free sense magnetization and ferromagnetic exchange strength of the sense layer are higher near the tunnel barrier layer than away from the tunnel barrier layer,

wherein the free sense magnetization in a first portion of the sense layer near the tunnel barrier layer is at least 30% higher than the free sense magnetization in a second portion of the sense layer away from the tunnel barrier layer;

wherein a concentration of CoFe relative to NiFe is higher in the first portion and lower in the second portion; and

wherein the first portion has a thickness of 75% of the thickness of the sense layer.

2. The magnetoresistive element according to claim 1 , wherein the ferromagnetic material composition comprises a composition gradient across the thickness of the sense layer.

3. The magnetoresistive element according to claim 1 , wherein the sense layer comprises a multilayer structure including a first sublayer, near the tunnel barrier layer and having a composition with higher magnetization, and a second sublayer, away from the tunnel barrier layer and having a composition with lower magnetization.

4. The magnetoresistive element according to claim 3 , wherein the multilayer structure comprises more than two sublayers.

5. The magnetoresistive element according to claim 3 , wherein each of the first and second sublayers has a constant composition across the thickness of the sublayer, said constant composition varying between the different sublayers.

6. The magnetoresistive element according to claim 3 , wherein at least one of the first and second sublayers has a composition that varies across the thickness of the sublayer.

7. The magnetoresistive element according to claim 1 , wherein the first and second portions correspond to a third of the ferromagnetic sense layer thickness.

8. The magnetoresistive element according to claim 1 , wherein the ferromagnetic material composition comprises a CoFe, CoFeB or NiFe based alloy.

9. The magnetoresistive element according to claim 8 , wherein ferromagnetic material composition comprises a CoFe and NiFe-based alloy; and wherein the concentration of CoFe relative to NiFe is higher near the tunnel barrier layer and lower away from the tunnel barrier layer.

10. The magnetoresistive element according to claim 1 , comprising an interface layer between the sense layer and the tunnel barrier layer, the interface layer comprising a CoFe or CoFeB alloy, where B refers to Boron, and having a thickness between 1 nm and 3 nm.

11. Magnetic sensor device comprising a plurality of magnetoresistive elements, each magnetoresistive element comprising a tunnel barrier layer included between a ferromagnetic reference layer having a fixed reference magnetization and a ferromagnetic sense layer having a free sense magnetization;

the sense layer comprising a ferromagnetic material composition and a stable vortex configuration in the absence of an applied magnetic field;

the ferromagnetic material composition varies across the thickness of the sense layer from a composition with higher magnetization near the tunnel barrier layer to a composition with lower magnetization away from the tunnel barrier layer, such that the sense magnetization and ferromagnetic exchange strength of the sense layer are higher near the tunnel barrier layer than away from the tunnel barrier layer;

characterized in that, the free sense magnetization in a first portion of the sense layer near the tunnel barrier layer is at least 30% higher than the free sense magnetization in a second portion of the sense layer away from the tunnel barrier layer;

wherein a concentration of CoFe relative to NiFe is higher in the first portion and lower in the second portion; and

wherein the first portion has a thickness of 75% of the thickness of the sense layer.

12. The magnetic sensor device according to claim 11 , arranged in a half-bridge or a full-bridge configuration.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 18, 2024
From: CROCUS TECHNOLOGY SA
To: ALLEGRO MICROSYSTEMS, LLC
Reel/Frame 066350/0669 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2023
From: CHILDRESS, JEFFREY; TIMOPHEEV, ANDREY
To: CROCUS TECHNOLOGY SA
Reel/Frame 065309/0794 →
Priority Claims (1)
EP 21315043 · Mar 19, 2021 · regional
Continuity (1)
Related Publication 20240168108A1 · May 23, 2024
References Cited (12)
US 20080068007A1 · Hoshiya · 2008 [cited by examiner]
US 20090189601A1 · Okada · 2009 [cited by examiner]
US 20090219754A1 · Fukumoto · 2009 [cited by applicant]
US 20100316890A1 · Choi · 2010 [cited by applicant]
US 20100320550A1 · Abraham · 2010 [cited by examiner]
US 20170330070A1 · Sengupta · 2017 [cited by examiner]
US 20200333407A1 · Reimann · 2020 [cited by examiner]
EP 3726237A2 · 2020 [cited by applicant]
EP 3862769A1 · 2021 [cited by applicant]
International Search Report issued in corresponding International PCT Application No. PCT/IB2022/052318; Mailing Date: Jun. 15, 2022. [cited by applicant]
Written Opinion issued in corresponding International PCT Application No. PCT/IB2022/052318; Mailing Date: Jun. 15, 2022. [cited by applicant]
Korean Voluntary Amendment (with Machine English Translation from Espacenet.com) filed on Jan. 16, 2025 for Korean Application No. 10-2023-7031793; 12 Pages. [cited by applicant]