Cleaning apparatus for a recording head includes a liquid application head to apply a liquid to a nozzle formation surface of the recording head
A cleaning apparatus for a recording head that ejects ink onto a recording medium, including a liquid application head to apply a liquid to a nozzle formation surface of the recording head and a liquid removal unit to remove the liquid from the nozzle formation surface. The liquid application head has a liquid application member having flexibility and a first surface on an upstream side in a liquid application direction, a second surface crossing the first surface, and a third surface on a downstream side in the liquid application direction, the first an second surfaces contacting the nozzle formation surface, the third surface and the nozzle formation surface having a gap therebetween, and a liquid supply member having a supply flow path to supply the liquid to the nozzle formation surface. A liquid application width of the liquid application head is narrower than a width of the nozzle formation surface.
1 . A cleaning apparatus for a recording head that ejects ink onto a recording medium, the cleaning apparatus comprising:
a liquid application head configured to apply a liquid to a nozzle formation surface of the recording head; and
a liquid removal unit configured to remove the liquid from the nozzle formation surface,
wherein the liquid application head has a liquid application member having flexibility and having a first surface on an upstream side in a liquid application direction, a second surface crossing the first surface, and a third surface on a downstream side in the liquid application direction, the first surface and the second surface contacting the nozzle formation surface, the third surface and the nozzle formation surface having a gap therebetween, and a liquid supply member having a supply flow path configured to supply the liquid to the nozzle formation surface, and
wherein a liquid application width of the liquid application head is narrower than a width of the nozzle formation surface, and a liquid removal width of the liquid removal unit is wider than the liquid application width of the liquid application head in a direction perpendicular to the liquid application direction.
2 . The cleaning apparatus according to claim 1 , wherein
the first surface of the liquid application head has a longer contact length with respect to the nozzle formation surface than the second surface.
3 . The cleaning apparatus according to claim 1 , wherein
the liquid application member has a tip end portion formed into a taper shape in cross section to be expanded as being distant from the surfaces contacting the nozzle formation surface.
4 . The cleaning apparatus according to claim 1 , wherein
the liquid application head further includes a liquid application member cover configured to cover the liquid application member, and
the liquid application member is held between the liquid supply member and the liquid application member cover.
5 . The cleaning apparatus according to claim 1 , wherein
the liquid application head and the liquid removal unit move with respect to the recording head while being in contact with the nozzle formation surface to perform cleaning.
6 . The cleaning apparatus according to claim 5 , wherein
the liquid application head and the liquid removal unit concurrently move with respect to the recording head.
7 . The cleaning apparatus according to claim 5 , wherein
the liquid application head and the liquid removal unit separately move with respect to the recording head.
8 . The cleaning apparatus according to claim 1 , wherein
the liquid application head is arranged on the upstream side in the liquid application direction with respect to the liquid removal unit.
9 . The cleaning apparatus according to claim 1 , wherein
the liquid removal unit is a wiping-off member configured to wipe off the nozzle formation surface.
10 . The cleaning apparatus according to claim 9 , wherein
the wiping-off member is a blade extending in a direction perpendicular to the liquid application direction.
11 . The cleaning apparatus according to claim 10 , wherein
the wiping-off member includes a plurality of blades.
12 . The cleaning apparatus according to claim 11 , wherein
the nozzle formation surface of the recording head has an unevenness shape, and
the plurality of blades are arranged in accordance with the unevenness shape.
13 . The cleaning apparatus according to claim 1 , further comprising an urging member configured to urge the liquid application member to the nozzle formation surface.