IP Library Granted Patent US 12,652,745
Granted Patent B2
US 12,652,745 · App. 18/612,019 · Granted Jun 9, 2026

System and method for generating and containing a plasma

Inventor: Jack A. Hunt (Covert, MI)
H05H1/36H05H1/40H05H1/48
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Quick Facts
Patent No.
US 12,652,745
App. No.
18/612,019
Granted
Jun 9, 2026
Kind
B2
Abstract

A novel plasma generation and containment system includes a first electrode, a second electrode, a power source, and an electromagnet. The first electrode and the second electrode are electrically coupled via a wire to form an open circuit. The voltage is asserted on the open circuit to form a spark between the first electrode and the second electrode to form a closed circuit. Then, a current is asserted on the closed circuit to form a plasma between the first electrode and the second electrode. The electromagnet provides a magnetic field to contain and compress the plasma.

Claims (30)

1 . A system comprising:

an annular electrode;

a second electrode disposed within an interior of said annular electrode, said annular electrode and said second electrode defining a space therebetween;

a plasma generator configured to initiate a high energy plasma within said space;

a magnet configured to generate a magnetic field that permeates said space and at least partially confines said plasma within said space;

a current source coupled to provide electrical current between said annular electrode and said second electrode and through said plasma to maintain said plasma; and

a voltage source coupled to assert a voltage across said annular electrode and said second electrode, said voltage being sufficient to form a spark between said annular electrode and said second electrode; and wherein

said current source is operative, after said spark is formed, to

provide said current through a conductive path provided by said spark,

provide a DC voltage across said annular electrode and said second electrode, and

superimpose an AC voltage on said DC voltage, whereby said high energy plasma is maintained.

2 . The system of claim 1 , wherein said current source is coupled to provide said current in a manner that facilitates feedback of noise from said plasma into said current source.

3 . The system of claim 1 , wherein said magnetic field is aligned with an axis passing through said space, said axis being perpendicular to a transverse plane of said annular electrode.

4 . The system of claim 1 , wherein said magnet includes a plurality of circumferential windings around said annular electrode.

5 . The system of claim 1 , wherein said annular electrode includes a plurality of cylindrical elements arranged in side-by-side fashion around the inner surface of said annular electrode, with central axes of said cylindrical elements oriented parallel to one another.

6 . The system of claim 1 , further comprising a fuel system configured to introduce fuel into said plasma.

7 . The system of claim 6 , further comprising a heat exchanger disposed to absorb thermal energy generated by said plasma and configured to transfer said thermal energy to another system.

8 . The system of claim 7 , further comprising a generator operative to utilize said thermal energy to generate electrical power.

9 . The system of claim 8 , further comprising an electrical storage system, coupled to receive said electrical power, store at least a portion of said electrical power, and provide said electrical power to said current source.

10 . The system of claim 6 , wherein said fuel is a waste product.

11 . The system of claim 1 , further comprising a sample chamber disposed with respect to said plasma such that material within the sample chamber is exposed to high energy particles from said plasma.

12 . The system of claim 1 , further comprising at least one fluid inlet disposed to introduce a gas flow into said space.

13 . The system of claim 1 , wherein said plasma generator includes a transformer, said transformer capable of providing 40 kV at 1 amp.

14 . The system of claim 13 , wherein said transformer includes a single primary winding.

15 . The system of claim 1 , wherein said current source includes a capacitor set coupled to discharge across said space when a conductive path is provided between said annular electrode and said second electrode.

16 . The system of claim 15 , wherein said capacitor set is capable of supplying at least 1000 V at 200 amps.

17 . The system of claim 15 , wherein said current source further comprises:

a rectifier for providing DC power to said capacitor set; and

a low pass filter coupled between said rectifier and said capacitor set.

18 . The system of claim 15 , wherein said current source further comprises an RLC (resistor-inductor-capacitor) circuit coupled to assert an AC voltage on said DC voltage provided by said capacitor set.

Continuity (6)
Continuation 17244072 · Apr 29, 2021
Continuation 16287271 · Feb 27, 2019
Continuation PCTUS2017049178 · Aug 29, 2017
Provisional Application 62551474 · Aug 29, 2017
Provisional Application 62380935 · Aug 29, 2016
Related Publication 20240414833A1 · Dec 12, 2024
References Cited (3)
US 2944140A · Giannini · 1960 [cited by examiner]
US 4678888A · Camacho · 1987 [cited by examiner]
US 5852927A · Cohn · 1998 [cited by examiner]