CLEAN WORKPIECE LOADER AND EDGE PROTECTION HOLDER FOR WET CHEMICAL SEMICONDUCTOR PROCESSING
An apparatus for loading and transport of fragile flexible workpieces for use in wet chemical semiconductor processing is described. A loader aligns a workpiece in a frame while maintaining minimal physical contact. A holder precisely positions at least two edges of the workpiece, while providing workpiece edge protection and straightening on the remaining two edges. The holder allows fluid processing of both faces of the workpiece while allowing a shield or agitation plate to be positioned close to the faces of the workpiece.
1 . A workpiece holder for holding a substantially planar, quadrilateral workpiece in a processing chamber of a wet semiconductor processing system, the workpiece holder being adapted for insertion into and removal from the processing chamber while holding the workpiece,
wherein the workpiece holder comprises:
first and second lateral supports,
first and second flexing grippers arranged at respective first and second lateral supports, the flexing grippers movable between a closed configuration in which they contact and restrain respective first and second opposing edges of the workpiece in use, and an open configuration in which the flexing grippers are opened sufficiently to allow the workpiece to be inserted into the flexing grippers in a direction substantially parallel to the first and second lateral supports during a loading operation, and
an edge protector extending in use between the first and second lateral supports.
2 . The workpiece holder of claim 1 , wherein the first and second flexing grippers comprise electrical contacts for applying electrical current to respective first and second opposing edges of the workpiece in use.
3 . The workpiece holder of claim 1 , where the edge protection guide comprises an elongate U-shaped channel for receiving the workpiece in use.
4 . The workpiece holder of claim 3 , comprising a plurality of guiding projections positioned along the length of the U-shaped channel, on each opposing side of the U-shaped channel, to guide the workpiece into the U-shaped channel during the loading operation.
5 . The workpiece holder of claim 4 , where the guiding projections positioned on a first side of the U-shaped channel interleave with the guiding projections positioned on a second, opposing, side of the U-shaped channel along the length of the U-shaped channel.
6 . The workpiece holder of claim 1 , wherein the edge protector is insulative so that no current is supplied to the workpiece via the edge protector in use.
7 . The workpiece holder of claim 6 , where the edge protector is fabricated from a thermoplastic selected from the group comprising high-density polyethylene and polyetheretherketone.
8 . The workpiece holder of claim 6 , where the edge protector is fabricated from stainless steel coated with a fluorinated polymer selected from the group comprising Viton, polytetrafluoroethylene and ethylene chlorotrifluoroethylene.
9 . The workpiece holder of claim 1 , comprising a header member connecting the first and second lateral supports, the arrangement being such that in use, the header member and the first and second lateral supports surround three edges of the workpiece.
10 . The workpiece holder of claim 9 , wherein the edge protector is arranged parallel to the header member and proximate thereto.
11 . The workpiece holder of claim 9 , wherein the edge protector is arranged parallel to the header member and spaced therefrom, the arrangement being such that in use, the header member, the first and second lateral supports and the edge protector surround all four edges of the workpiece.
12 . The workpiece holder of claim 10 , comprising a second edge protector, the second edge protector being arranged parallel to the header member and spaced therefrom, the arrangement being such that in use, the first edge protector, the first and second lateral supports and the second edge protector surround all four edges of the workpiece.
13 . A semiconductor processing system for processing a substantially planar, quadrilateral workpiece while loaded into the workpiece holder of claim 1 , the system comprising:
a processing chamber for wet chemical etch, cleaning or electrodeposition, and
a workpiece loader for loading the workpiece into the workpiece holder during the loading operation.
14 . The semiconductor processing system of claim 13 , wherein the loader comprises a contact portion configured to contact the workpiece at a periphery of the workpiece.
15 . The semiconductor processing system of claim 13 , wherein the loader comprises edge clamps for straightening the workpiece during loading into the workpiece holder.
16 . The semiconductor processing system of claim 16 , when loaded with the workpiece holder of claim 4 , wherein the edge clamps interleave with the guiding projections.