EASILY CRUSHABLE ELECTRODEPOSITED COPPER
A highly pure electrodeposited copper comprising copper and unavoidable impurities, wherein the purity is at least 6N, the content of Ag included as an impurity is 0.2 ppm or less, the amount of included nonmetal inclusions with a particle size of 0.5-20 μm is 20,000/g or less, the average particle size in an electrodeposition cross section is in the range of 40-400 μm, the maximum particle size in the electrodeposition cross section is in the range of 300-2,700 μm, the average particle size in the electrodeposition surface is in the range of 25-150 μm, and the maximum particle size in the electrodeposition surface is in the range of 100-450 μm. As a result, the present invention provides a highly pure electrodeposited copper that has excellent crushability while suppressing the occurrence of lumps.
1 . A high-purity electrodeposited copper comprising copper and inevitable impurities, wherein the high-purity electrodeposited copper has:
a purity of 6N or more;
an amount of Ag contained as an impurity of 0.2 ppm or less;
a number of contained nonmetallic inclusions with a grain size of 0.5 μm or more and 20 μm or less of 20,000 or less per gram;
an average grain size of an electrodeposition cross section in a range of 40 to 400 μm;
a maximum grain size of an electrodeposition cross section in a range of 300 to 2700 μm;
an average grain size on an electrodeposited surface in a range of 25 to 150 μm; and
a maximum grain size on an electrodeposited surface in a range of 100 to 450 μm.
2 . The high-purity electrodeposited copper according to claim 1 , wherein the average grain size of the electrodeposition cross section is in a range of 50 to 350 μm, and the maximum grain size of the electrodeposition cross section is in a range of 450 to 2500 μm.
3 . The high-purity electrodeposited copper according to claim 1 , wherein the average grain size on the electrodeposited surface is in a range of 65 to 115 μm, and the maximum grain size on the electrodeposited surface is in a range of 150 to 350 μm.
4 . The high-purity electrodeposited copper according to claim 1 , wherein the elements contained as impurities are 0.1 ppm or less of Ag, 0.05 ppm or less of Br, and 5 ppm or less of Cl.
5 . The high-purity electrodeposited copper according to claim 1 , wherein the number of the contained nonmetallic inclusions with a grain size of 0.5 μm or more and 20 μm or less is 15,000 or less per gram.
6 . The high-purity electrodeposited copper according to claim 1 , wherein the high-purity electrodeposited copper is highly crushable high-purity electrodeposited copper.
7 . The high-purity electrodeposited copper according to claim 2 , wherein the high-purity electrodeposited copper is highly crushable high-purity electrodeposited copper.
8 . The high-purity electrodeposited copper according to claim 3 , wherein the high-purity electrodeposited copper is highly crushable high-purity electrodeposited copper.
9 . The high-purity electrodeposited copper according to claim 4 , wherein the high-purity electrodeposited copper is highly crushable high-purity electrodeposited copper.
10 . The high-purity electrodeposited copper according to claim 5 , wherein the high-purity electrodeposited copper is highly crushable high-purity electrodeposited copper.