Granted Patent B2

US 12,575,017 · App. 18/749,281 · Granted Mar 10, 2026

Inventor: Nikolay Suslov (Roswell, GA)

Assignee: Plasma Surgical, Inc.

H05H1/46H05H1/02H05H1/54H05H2242/22

Abstract

Claims (45)

1 . A plasma generating device, comprising:

an active chamber having an inlet;

a gas inlet configured to supply a gas flow to the active chamber, the gas flow having adjustable parameters;

an anode and a cathode configured to establish an electric arc in the active chamber to generate a plasma flow from the gas flow; and

an outlet configured to discharge the gas flow or the plasma flow according to a predetermined sequence to control heating of a portion of tissue by:

discharging, during a first period of time and when the electric arc is established, the plasma flow with a first energy flux to treat the portion of tissue; and

discharging, during a second period of time and after at least one of the adjustable parameters of the gas flow is adjusted, the gas flow or the plasma flow with a second energy flux lower than the first energy flux.

2 . The plasma generating device of claim 1 , wherein during the first period of time, the plasma flow discharged has a first shape with a first active zone,

during the second period of time, the plasma flow is discharged having a second shape with a second active zone smaller than the first active zone.

3 . The plasma generating device of claim 1 , wherein discharging the plasma flow during the first period of time predominantly causes vaporization of liquid from the portion of tissue, discharging the plasma flow during the second period of time predominantly causes heat diffusion inside the portion of tissue.

4 . The plasma generating device of claim 1 , wherein at least one of the adjustable parameters of the gas flow includes a flow rate of the gas flow.

5 . The plasma generating device of claim 4 , wherein the flow rate of the gas flow is higher during the first period of time than the second period of time to cause the first energy flux to be higher than the second energy flux.

6 . The plasma generating device of claim 4 , wherein a ratio of the flow rate of the gas flow to a diameter of the outlet is less than or equal to 100.

7 . The plasma generating device of claim 1 , wherein the plasma flow discharged during the first period of time has a first temperature and the plasma flow discharged during the second period of time has a second temperature, the first temperature is no greater than 20,000 K and the second temperature is no greater than 10,000 K.

8 . A plasma generating device, comprising:

an active chamber having an inlet;

a gas inlet configured to supply a gas flow to the active chamber;

an anode and a cathode configured to establish an electric arc in the active chamber in response to being energized by current having a controlled pattern to generate a plasma flow from the gas flow; and

an outlet configured to discharge the plasma flow to control heating of a portion of tissue by:

discharging, during a first period of time, the plasma flow with a first shape to treat a portion of tissue, the first shape having a first active zone; and

discharging, during a second period of time and after adjusting the controlled pattern of the current, the plasma flow with a second shape, the second shape having a second active zone smaller than the first active zone.

9 . The plasma generating device of claim 8 , wherein the plasma generating device is configured to adjust one or more parameters of the gas flow to adjust an energy flux of the plasma flow discharged from the outlet.

10 . The plasma generating device of claim 8 , wherein the plasma flow discharged during the first period of time has a first energy flux and the plasma flow discharged during the second period of time has a second energy flux lower than the first energy flux.

11 . The plasma generating device of claim 9 , wherein at least one of the adjustable parameters of the gas flow includes a flow rate of the gas flow, a ratio of the flow rate of the gas flow to a diameter of the outlet is less than or equal to 100.

12 . The plasma generating device of claim 8 , wherein during the first period of time, the plasma generating device is configured to generate a current pattern between the anode and the cathode such the electric arc heats the gas flow with a predetermined temperature profile, the current pattern including oscillations between a base level and a pulse level.

13 . The plasma generating device of claim 12 , wherein the current pattern is a first current pattern including oscillations between a first base level and a first pulse level, and the predetermined temperature profile is a first predetermined temperature profile,

during the second period of time, the plasma generating device is configured to generate a second current pattern between the anode and the cathode such that the electric arc heats the gas flow with a second predetermined temperature profile, the second current pattern including oscillations between a second base level lower than the first base level and a second pulse level lower than the first pulse level.

14 . A method, comprising:

generating a first current pattern configured to generate a first plasma flow from a plasma generating device having a first energy flux and a predetermined shape, the first current pattern including oscillations between a first base level and first pulse level;

applying the first plasma flow from the plasma generating device to the tissue;

generating a second current pattern to generate a second plasma flow from the plasma generating device having a second energy flux lower than the first energy flux, the second current pattern including oscillations between a second base level and a second pulse level, the second base level lower than the first base level and the second pulse level lower than the first pulse level; and

applying the second plasma flow from the plasma generating device to the tissue.

15 . The method of claim 14 , wherein the predetermined shape is a first predetermined shape with a first active zone, wherein the second plasma flow has a second predetermined shape with a second active zone smaller than the first active zone.

16 . The method of claim 14 , wherein the first current pattern causes the first plasma flow to alternate between a first base temperature and a first pulse temperature, and the second current pattern causes the second plasma flow to alternate between a second base temperature and a second pulse temperature.

17 . The method of claim 14 , wherein the first current pattern includes oscillations having a current pulse resolution between 0.1 ms to about 0.2 ms, the second current pattern includes oscillations having a current pulse resolution between about 0.1 microseconds (μs) and about 1 μs.

18 . The method of claim 14 , wherein a root mean square of current having at least one of the first current pattern or the second current pattern is about 12 Amps (A) to about 15 A.

19 . The method of claim 14 , wherein the applying the first plasma flow from the plasma generating device causes at least one of (i) coagulation of the tissue or (ii) vaporization of the tissue without heat diffusion, and applying the second plasma flow from the plasma generating device controls an amount of heat diffusion inside the tissue.

20 . A method, comprising:

generating a first current pattern configured to generate a first output from a plasma generating device having a first energy flux and a predetermined shape, the first current pattern including oscillations between a first set of current levels,

applying the first output from the plasma generating device to tissue to cause coagulation of the tissue;

generating a second current pattern configured to generate a second output from the plasma generating device having a second energy flux lower than the first energy flux; and

applying the second output from the plasma generating device to the tissue to prevent overheating of the tissue.

21 . The method of claim 20 , wherein the first output from the plasma generating device is a plasma flow and the second output is a gas flow.

22 . The method of claim 20 , wherein the first output is a first plasma flow and the second output is a second plasma flow, the first current pattern causes the first plasma flow to alternate between a first base temperature and a first pulse temperature, and the second current pattern causes the second plasma flow to alternate between a second base temperature and a second pulse temperature.

23 . The method of claim 20 , wherein a root mean square of current having at least one of the first current pattern or the second current pattern is about 12 Amps (A) to about 15 A.

Assignments (2)

Continuity (5)

References Cited (400)