IMAGING SYSTEM HARDWARE
A sample holder includes a first member featuring a first retaining mechanism configured to retain a first substrate that includes a sample, a second member featuring a second retaining mechanism configured to retain a second substrate that includes a reagent medium, and an alignment mechanism connected to at least one of the first and second members, and configured to align the first and second members such that the sample contacts at least a portion of the reagent medium when the first and second members are aligned.
1 . (canceled)
2 . A device comprising:
a first member comprising a first surface configured to support a first substrate comprising a sample region;
a first retaining mechanism configured to retain the first substrate on the first surface of the first member;
a second member comprising a second surface configured to support a second substrate;
a second retaining mechanism configured to retain the second substrate on the second surface of the second member; and
an alignment mechanism connecting the first member and the second member,
wherein the alignment mechanism is configured to allow relative movement of the first member and the second member between an open configuration and a closed configuration,
wherein at least one of the first member or the second member comprises an aperture, and
wherein the first member, the second member, and the alignment mechanism are arranged such that, in the closed configuration:
the first surface is substantially parallel to and faces the second surface;
the first surface is disposed at a distance from the second surface;
the first substrate is disposed at a distance from the second substrate when the first substrate is retained on the first surface and the second substrate is retained on the second surface; and
the aperture is aligned with the sample region of the first substrate when the first substrate is retained on the first surface.
3 . The device of claim 2 , wherein at least one of:
the first retaining mechanism comprises a recess dimensioned to receive the first substrate, or
the second retaining mechanism comprises a recess dimensioned to receive the second substrate.
4 . The device of claim 2 , wherein at least one of:
the first retaining mechanism is configured to apply a force to the first substrate to maintain contact between the first substrate and the first member, or
the second retaining mechanism is configured to apply a force to the second substrate to maintain contact between the second substrate and the second member.
5 . The device of claim 4 , wherein the first retaining mechanism comprises one or more clips configured to apply the force to a surface of the first substrate.
6 . The device of claim 2 , wherein at least one of the first member or the second member comprises an additional aperture that is aligned with the sample region of the first substrate when (i) the first substrate is retained on the first surface and (ii) the first and second members are aligned by the alignment mechanism.
7 . The device of claim 2 , comprising an adjustment mechanism connected to the first member and configured to translate the first substrate in at least one direction parallel to the first surface.
8 . The device of claim 2 , wherein the first member, the second member, and the alignment mechanism are arranged such that, in the closed configuration, the first substrate is disposed between 50 microns and 1 mm from the second substrate, measured in a direction orthogonal to the first surface, when the first substrate is retained on the first surface and the second substrate is retained on the second surface.
9 . The device of claim 2 , wherein, in the closed configuration, the first surface is disposed between 50 microns and 500 microns from the second surface.
10 . The device of claim 2 , wherein the relative movement of the first member and the second member comprises a relative rotation of the first member and the second member.
11 . The device of claim 2 , wherein:
the first member is connected to the alignment mechanism; and
the second member is connected to the alignment mechanism.
12 . The device of claim 2 , wherein the relative movement of the first member and the second member comprises a movement of the first member or the second member in a direction orthogonal to the first surface or the second surface, respectively.
13 . The device of claim 2 , comprising a spacing member.
14 . The device of claim 13 , wherein the spacing member is positioned between the first member and the second member to maintain the first surface at the distance from the second surface.
15 . The device of claim 13 , wherein the spacing member is coupled to the first member or the second member.
16 . A device comprising:
a first member comprising:
a first surface configured to support a first substrate comprising a sample region, and
first means for retaining the first substrate on the first surface;
a second member comprising:
a second surface configured to support a second substrate, and
second means for retaining the second substrate on the second surface; and
an alignment mechanism connecting the first member and the second member, wherein:
the alignment mechanism is configured to allow relative movement of the first member and the second member between an open configuration and a closed configuration,
at least one of the first member or the second member comprises an aperture, and
the first member, the second member, and the alignment mechanism are arranged such that, in the closed configuration:
the first surface is substantially parallel to and facing the second surface;
the first surface is disposed at a distance from the second surface; and
the first substrate is disposed at a distance from the second substrate when the first substrate is retained on the first surface and the second substrate is retained on the second surface; and
the aperture is aligned with the sample region of the first substrate when the first substrate is retained on the first surface.
17 . The device of claim 16 , comprising means for adjusting the distance of the first surface from the second surface in a direction orthogonal to the first surface.
18 . The device of claim 17 , wherein the means for adjusting comprises a linear actuator.
19 . The device of claim 16 , wherein at least one of:
the first means for retaining comprises a recess dimensioned to receive the first substrate, or
the second means for retaining comprises a recess dimensioned to receive the second substrate.
20 . The device of claim 19 , wherein at least one of the recess dimensioned to receive the first substrate or the recess dimensioned to receive the second substrate comprises first and second edges that are parallel to each other.
21 . The device of claim 16 , wherein at least one of:
the first means for retaining is configured to apply a force to the first substrate to maintain contact between the first substrate and the first member, or
the second means for retaining is configured to apply a force to the second substrate to maintain contact between the second substrate and the second member.
22 . The device of claim 16 , wherein at least one of the first member or the second member comprises an additional aperture that is aligned with the sample region of the first substrate when (i) the first substrate is retained and (ii) the first and second members are aligned by the alignment mechanism.
23 . The device of claim 16 , comprising an adjustment mechanism connected to the first member and configured to translate the first substrate in at least one direction parallel to the first surface.
24 . The device of claim 16 , comprising a spacing member.
25 . The device of claim 24 , wherein the spacing member is positioned between the first member and the second member to maintain the first surface at the distance from the second surface.
26 . The device of claim 24 , wherein the spacing member is coupled to the first member or the second member.